Cite
Defect evolution in GaN thin film heterogeneously integrated with CMOS-compatible Si(100) substrate by ion-cutting technology
MLA
Shi, H., et al. “Defect Evolution in GaN Thin Film Heterogeneously Integrated with CMOS-Compatible Si(100) Substrate by Ion-Cutting Technology.” Science China - Information Sciences 66(2023), 219403, 2023. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsoai&AN=edsoai.on1415628064&authtype=sso&custid=ns315887.
APA
Shi, H., Yi, A., Ding, J., Liu, X., Qin, Q., Yi, J., Hu, J., Wang, M., Cai, D., Wang, J., Xu, K., Mu, F., Suga, T., Heller, R., 0000-0003-4606-7203) Wang, M., 0000-0002-4885-799X) Zhou, S., Xu, W., Huang, K., You, T., & Ou, X. (2023). Defect evolution in GaN thin film heterogeneously integrated with CMOS-compatible Si(100) substrate by ion-cutting technology. Science China - Information Sciences 66(2023), 219403.
Chicago
Shi, H., A. Yi, J. Ding, X. Liu, Q. Qin, J. Yi, J. Hu, et al. 2023. “Defect Evolution in GaN Thin Film Heterogeneously Integrated with CMOS-Compatible Si(100) Substrate by Ion-Cutting Technology.” Science China - Information Sciences 66(2023), 219403. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsoai&AN=edsoai.on1415628064&authtype=sso&custid=ns315887.