Influence of co-sputtering AlB2 to TaB2 on stoichiometry of non-reactively sputtered boride thin films

MLA

Hu, Chun, et al. Influence of Co-Sputtering AlB2 to TaB2 on Stoichiometry of Non-Reactively Sputtered Boride Thin Films. 2024. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsoai&AN=edsoai.on1442971963&authtype=sso&custid=ns315887.

APA

Hu, C., Lin, S., Podsednik, M., Mraz, S., Wojcik, T., Limbeck, A., Koutna, N., & Mayrhofer, P. H. (2024). Influence of co-sputtering AlB2 to TaB2 on stoichiometry of non-reactively sputtered boride thin films.

Chicago

Hu, Chun, Shuyao Lin, M. Podsednik, Stanislav Mraz, T. Wojcik, A. Limbeck, Nikola Koutna, and Paul H. Mayrhofer. 2024. “Influence of Co-Sputtering AlB2 to TaB2 on Stoichiometry of Non-Reactively Sputtered Boride Thin Films.” http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsoai&AN=edsoai.on1442971963&authtype=sso&custid=ns315887.