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Weak-antilocalization signatures in the magnetotransport properties of individual electrodeposited Bi Nanowires

Authors :
Marcano, N.
Sangiao, S.
Plaza, M.
Pérez García, Lucas
Fernández Pacheco, A.
Córdoba, R.
Sánchez, M. C.
Morellón, L.
Ibarra, M. R.
De Teresa, J. M.
Marcano, N.
Sangiao, S.
Plaza, M.
Pérez García, Lucas
Fernández Pacheco, A.
Córdoba, R.
Sánchez, M. C.
Morellón, L.
Ibarra, M. R.
De Teresa, J. M.
Publication Year :
2010

Abstract

© American Institute of Physics. This work was supported by Spanish Ministry of Science (through Project Nos. MAT2007-65965-C02-02 and MAT2008-06567-C02) including FEDER funding and the Aragon Regional Government. N. Marcano and S. Sangiao acknowledge financial support from Spanish CSIC (JAE-doc program) and Spanish MEC (FPU program).<br />We study the electrical resistivity of individual Bi nanowires of diameter 100 nm fabricated by electrodeposition using a four-probe method in the temperature range 5-300 K with magnetic fields up to 90 kOe. Low-resistance Ohmic contacts to individual Bi nanowires are achieved using a focused ion beam to deposit W-based nanocontacts. Magnetoresistance measurements show evidence for weak antilocalization at temperatures below 10 K, with a phase-breaking length of 100 nm.<br />Ministerio de Ciencia e Innovación (MICINN)<br />FEDER<br />Aragon Regional Government<br />CSIC<br />Depto. de Física de Materiales<br />Fac. de Ciencias Físicas<br />TRUE<br />pub

Details

Database :
OAIster
Notes :
application/pdf, 0003-6951, English
Publication Type :
Electronic Resource
Accession number :
edsoai.on1450541255
Document Type :
Electronic Resource