1. Growth of InN layers on Si (111) using ultra thin silicon nitride buffer layer by NPA-MBE
- Author
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Kumar, Mahesh, Rajpalke, Mohana K., Bhat, Thirumaleshwara N., Roul, Basanta, Sinha, Neeraj, Kalghatgi, A.T., and Krupanidhi, S.B.
- Subjects
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SEMICONDUCTORS , *MOLECULAR beam epitaxy , *SILICON nitride , *SUBSTRATES (Materials science) , *CRYSTALLIZATION , *BAND gaps , *LIGHT absorption , *RAMAN spectroscopy - Abstract
Abstract: Indium nitride (InN) epilayers have been successfully grown by nitrogen-plasma-assisted molecular beam epitaxy (NPA-MBE) on Si (111) substrates using different buffer layers. Growth of a (0001)-oriented single crystalline wurtzite–InN layer was confirmed by high resolution X-ray diffraction (HRXRD). The Raman studies show the high crystalline quality and the wurtzite lattice structure of InN films on the Si substrate using different buffer layers and the InN/β–Si3N4 double buffer layer achieves minimum FWHM of E 2 (high) mode. The energy gap of InN films was determined by optical absorption measurement and found to be in the range of ~0.73–0.78eV with a direct band nature. It is found that a double-buffer technique (InN/β–Si3N4) insures improved crystallinity, smooth surface and good optical properties. [Copyright &y& Elsevier]
- Published
- 2011
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