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Metalenses made of artificial sub-wavelength nanostructures have shown the capability of light focusing and imaging with a miniaturized size. Here, we report the demonstration of mass-producible amorphous silicon metalenses on a 12-inch glass wafer via the complementary metal-oxide-semiconductor compatible process. The measured numerical aperture of the fabricated metalens is 0.496 with a focusing spot size of 1.26 μm at the wavelength of 940 nm. The metalens is applied in an imaging system to test the imaging resolution. The minimum bar of the resolution chart with a width of 2.19 μm is clearly observed. Furthermore, the same system demonstrates the imaging of a fingerprint, and proofs the concept of using metalens array to reduce the system size for future compact consumer electronics.

Half-wave plate (HWP) is one of the key polarization controlling devices in optical systems. The conventional HWPs based on birefringent crystals are inherently bulky and difficult to be monolithically integrated with other optical components. In this work, metasurface-based HWPs with high compactness are demonstrated on a 12-inch silicon complementary metal-oxide-semiconductor platform. Three-dimensional finite difference time domain simulation is used to design the nanostructure and investigate the impact of fabrication process variation on the device performance. In addition, the cross- and co-polarization transmittance (Tcross and Tco) of the HWPs located at different wafer locations are characterized experimentally. The peak Tcross and valley Tco values of 0.69 ± 0.053 and 0.032 ± 0.005 are realized at the wavelength around 1.7 μm, respectively. This corresponds to a polarization conversion efficiency of 95.6% ± 0.8%.

Metasurface-based beam deflector, as an important optical element to bend the light propagation direction, has drawn a lot of interests in research to achieve miniaturization of devices and reduction of system complexity. Based on the 12-inch immersion lithography technology, in this work, an ultra-thin and large-area pixelated metasurface beam deflector with a footprint of 2500 × 2500 μm, formed by nanopillars with diameters from 221 to 396 nm, is demonstrated on a 12-inch glass wafer. The 21 × 21 array of deflectors is designed to bend the input light in different directions and to generate 441 random points. In addition, the layer transfer on the 12-inch glass wafer makes the device working in transmission mode at a 940-nm wavelength. The random point array generated from the experiment shows good match with the design. This pixelated metasurface beam deflector can generate random points simultaneously and has potential to make beam steering by switching each pixel of the beam deflector, which can be applied on motion detection, facial recognition, and light detection and ranging.