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GaN-based Schottky barrier diodes (SBDs) with single-crystal Al barriers grown by plasmaassisted molecular beam epitaxy are fabricated. Examined using in-situ reflection high-energy electron diffractions, ex-situ high-resolution x-ray diffractions, and high-resolution transmission electron microscopy, it is determined that epitaxial Al grows with its [111] axis coincident with the [0001] axis of the GaN substrate without rotation. In fabricated SBDs, a 0.2V barrier height enhancement and 2 orders of magnitude reduction in leakage current are observed in single crystal Al/GaN SBDs compared to conventional thermal deposited Al/GaN SBDs. The strain induced piezoelectric field is determined to be the major source of the observed device performance enhancements. [ABSTRACT FROM AUTHOR]

The authors present a detailed investigation of defects generated during catastrophic optical damage (COD) in high-power 650 nm AlGaInP lasers using microphotoluminescence (μ-PL) mapping, focused ion beam (FIB) microscopy, and deep-etching techniques. High-resolution μ-PL images demonstrated that during COD, nonradiative dark line defects (DLDs) originate from the front mirror of the laser and propagate in several branches into the laser perpendicular to the output facet. Furthermore, FIB microscopy identified the epitaxial layers affected by COD, revealing that DLDs are confined to the active region. In addition, deep etching confirmed that these defects have a noncrystalline nature. [ABSTRACT FROM AUTHOR]