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The growth mode of N-face GaN deposited on AlN(0001¯) by plasma-assisted molecular beam epitaxy has been investigated. Based on reflection high-energy electron diffraction experiments, we demonstrate that for appropriate Ga fluxes and substrate temperature, a self-regulated 1‐ML-thick Ga excess film can be formed on the growing surface. Depending on the presence of this Ga monolayer, the growth can proceed following either the Stranski–Krastanow or the Frank Van der Merwe growth modes, hence enabling the synthesis of either quantum dots or quantum wells.

We report on the effect of vertical correlation on GaN/AlN quantum dots grown by plasma-assisted molecular-beam epitaxy using the modified Stranski–Krastanow growth mode. When increasing the number of GaN periods, we observe a homogenization of the island distribution and a redshift of the luminescence line. This redshift is attributed to an increase of the quantum Stark effect due to the increase of the piezoelectric contribution to the internal electric field.

We have studied the surface kinetics of N-face GaN during molecular-beam epitaxial growth by investigating the Ga wetting and the surface morphology. In the case of N-face GaN, it is not possible to establish the self-regulated Ga bilayer that is used as a surfactant for molecular-beam-epitaxy growth of Ga-face GaN. Indeed, to prevent the accumulation of Ga droplets, growth of the N-face GaN must be performed with less than one monolayer of excess Ga on the growing surface. Optimum surface morphology is achieved when growth is performed at the Ga accumulation limit.

We have studied the effect of Mg doping on the surface kinetics of GaN during growth by plasma-assisted molecular-beam epitaxy. Mg tends to segregate on the surface of GaN, inhibiting the formation of the self-regulated Ga film which is used as a surfactant for the growth of undoped and Si-doped GaN. The growth window is hence significantly reduced. Higher growth temperatures lead to an enhancement of Mg segregation and an improvement of the surface morphology.

Morphological properties of Eu-doped GaN quantum dots grown by molecular beam epitaxy have been studied. Eu tends to segregate on the surface of AlN and GaN, leading to drastic changes in adatom kinetics. As a consequence, both size and density of Eu-doped GaN quantum dots strongly depend on the Eu flux used during the growth.

We investigate the photovoltaic performance of pseudomorphic In0.1Ga0.9N/GaN multiple-quantum well (MQW) solar cells as a function of the total active region thickness. An increase in the number of wells from 5 to 40 improves the short-circuit current and the open-circuit voltage, resulting in a 10-fold enhancement of the overall conversion efficiency. Further increasing the number of wells leads to carrier collection losses due to an incomplete depletion of the active region. Capacitance-voltage measurements point to a hole diffusion length of 48 nm in the MQW region.

We report experimental and theoretical results on interband and intersubband transitions in GaN quantum wells with strained AlN barriers. All of the samples are grown by molecular-beam epitaxy on sapphire (0001) substrates. The results show that even at room temperature, strong electron localization occurs in the plane of the quantum wells due to the combined effect of monolayer thickness fluctuations and the high internal field in the GaN layers. We also demonstrate that the intersubband absorption is systematically blueshifted in n-doped quantum wells with respect to nominally undoped samples as a result of strong many-body effects, namely the exchange interaction. The results for both undoped and doped quantum wells are in good agreement with simulations.

Epitaxial growth of quaternary AlGaInN compounds by plasma-assisted molecular beam epitaxy has been demonstrated. Two-dimensional growth is achieved under In excess, with an In film segregating at the growth front. The maximum In incorporation is significantly affected by the substrate temperature and the Al mole fraction of the alloy. This behavior has been attributed to the enhancement of In segregation due to the high binding energy of AlN compared to InN and GaN.

Metal-semiconductor-metal ultraviolet (UV) detectors with finger width and pitch ranging from 0.5 to 4 μm have been fabricated on GaN. A superlinear enhancement of responsivity is observed when scaling down, in agreement with a model that includes optical absorption and the variation of the space-charge regions with bias. No degradation is found in terms of UV/visible contrast or photocurrent linearity.

We report on the fabrication and characterization of low dark-current GaN metal–semiconductor–metal (MSM) photodiodes. Their quantum efficiency in the vacuum-ultraviolet range has been analyzed, demonstrating that these devices are an excellent choice for high-energy photodetection. Models to explain and control the performance as a function of residual doping and geometry are applied to GaN-based MSM photodiodes.

We report on the fabrication and characterization of AlGaN metal–semiconductor–metal photodiodes with sharp cutoff wavelengths from 365 to 310 nm. The detectors are visible blind, with an ultraviolet/visible contrast of about 4 orders of magnitude. The photocurrent scales linearly with optical power for photon energies both over and below the band gap, supporting the absence of photoconductive gain related to space-charge regions. No persistent photoconductivity effects have been detected. Time response is limited by the RC product of the measurement system, the transit time of the device being far below 10 ns. The normalized noise equivalent power at 28 V bias is lower than 17 pW/Hz1/2 in GaN detectors, and about 24 pW/Hz1/2 in Al0.25Ga0.75N photodiodes.

We present the fabrication and characterization of nonintentionally doped GaN and GaN:Mg Schottky metal–semiconductor–metal (MSM) photodetectors, grown on sapphire by metalorganic chemical vapor deposition. Low-leakage, Schottky contacts were made with Pt/Au. The devices are visible blind, with an ultraviolet/green contrast of about five orders of magnitude. The response times of the MSM devices were

Gold and nickel Schottky barrier photovoltaic detectors have been fabricated on Si-doped AlxGa1−xN layers (0⩽x⩽0.22) grown on sapphire by metalorganic vapor phase epitaxy. Responsivity is independent of the Schottky metal or diode size, and also of the incident power in the range measured (10 mW/m2–2 kW/m2). A higher visible rejection has been observed in the spectral response of Au photodiodes (>103). Time response is resistance-capacitance limited, with time constants as short as 14 ns in Al0.22Ga0.78N diodes. Low frequency noise studies are also presented, and detectivities of 6.1×107 and 1.2×107 mHz1/2 W−1 are determined in GaN/Au and Al0.22Ga0.78N/Au detectors, at −2 V bias.

THz intersubband transitions are reported down to 160 μm within AlGaN/GaN heterostructures following a 4-layer quantum well design. In such a geometry, the compensation of the polarization-induced internal electric field is obtained through creating a gradual increase in polarization field throughout the quantum “trough” generated by three low-Al-content layers. The intersubband transitions show tunable absorption with respect to doping level as well as geometrical variations which can be regulated from 53 to 160 μm. They also exhibit tunnel-friendly designs which can be easily integrated into existing intersubband device architectures.

International audience; We report on AlGaN/GaN multi-quantum-well structures displaying intersubband absorption in the THz spectral range. First, we theoretically analyze the weaknesses of the state-of-the-art GaN-based step-quantum-well architecture from an optoelectronic standpoint. We then propose a modified geometry with improved structural robustness considering the uncertainties associated to the growth. This later structure, consisting of 4-layer quantum wells, has been grown by plasma-assisted molecular-beam epitaxy and characterized structurally and optically. Low temperature absorption of samples with different Si doping levels confirms intersubband transitions in the far-infrared, centred at 28 μm.

The strong light-matter coupling regime and lasing in a GaN microcavity fabricated by incorporating a high optical quality GaN membrane inside an all-dielectric mirror cavity is demonstrated at room temperature. A nonlinear increase of the emission and line narrowing marks the onset of polariton lasing regime with significantly reduced threshold compared with previous reports for bulk GaN microcavity. This combination of low lasing thresholds and ease of fabrication allows incorporation of quantum wells and electrical contacts into the active region, paving the way for electrically driven room temperature (RT) polariton laser devices.

We report on ultrafast GaN/AlGaN waveguide quantum cascade detectors with a peak detection wavelength of 1.5 μm. Mesa devices with a size of 7 × 7 and 10 × 10 μm2 have been fabricated with radio-frequency impedance-matched access lines. A strong enhancement of the responsivity is reported by illuminating the waveguide facet, with respect to illumination of the top surface. The room temperature responsivity is estimated to be higher than 9.5 ± 2 and 7.8 ± 2 mA/W, while the −3dB frequency response is extracted to be 42 and 37.4 GHz for 7 × 7 and 10 × 10 μm2 devices, respectively.

The ultra fast carrier dynamic in GaN/AlGaN quantum cascade detector was investigated using a time-resolved bias-lead monitoring technique. It is demonstrated that the intrinsic speed limitation, governed by the carrier transit time, is smaller than 1 ps, corresponding to a frequency cut off above 200 GHz.

International audience; Photoluminescence (PL) studies of GaN/Al(x)Ga(1-x)N quantum dots (QDs) in nanowires demonstrate an efficient carrier confinement, resulting in thermally stable decay times up to 300 K. The evolution of the PL transition energy as a function of both the QD height and the Al mole fraction in the barriers, as well as the evolution of the decay time as a function of the QD height, point out that a built-in electric field is significantly smaller than the value expected from the spontaneous polarization discontinuity. This is explained by the uniaxial compressive strain resulting from the spontaneously formed Al-rich shell that envelops the QD stack

We report the observation of positive optical gain in silicon nanocrystals (Si-nc) embedded in silicon nitride measured by the variable stripe length technique. We evidence the onset of stimulated emission and report gain coefficients up to 52 cm(-1) at the highest excitation power (6.5 W/cm(2)). Photoluminescence dynamics presents two distinct recombination lifetimes in the nanosecond and the microsecond ranges. This was interpreted in terms of fast carrier trapping in nitrogen-induced localized states in the Si-nc surface and subsequent slow radiative recombination, suggesting that carrier trapping in radiative surface states plays a crucial role in the optical gain mechanism of Si-nc. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3607276]

We report on the development of a band gap-selective photochemical etching technique capable of producing 200 nm thick optical quality freestanding GaN membranes. The use of low electrolyte concentration combined with intense excitation by a laser source are shown to yield highly anisotropic etch profile with optical quality etched surfaces. Using this technique, high quality GaN microcavity is fabricated by embedding the GaN membrane inside an all-dielectric mirror cavity. In these structures, Bragg polariton photoluminescence is observed at room temperature.