1. Epitaxial growth of phase-pure ε-Ga2O3 by halide vapor phase epitaxy
- Author
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Yuichi Oshima, Encarnación G. Víllora, Kiyoshi Shimamura, Satoshi Yamamoto, and Yoshitaka Matsushita
- Subjects
Crystallography ,Materials science ,Phase (matter) ,General Physics and Astronomy ,Halide ,Gallium chloride ,Texture (crystalline) ,Chemical vapor deposition ,Metalorganic vapour phase epitaxy ,Pole figure ,Epitaxy - Abstract
Epitaxial growth of e-Ga2O3 is demonstrated for the first time. The e-Ga2O3 films are grown on GaN (0001), AlN (0001), and β-Ga2O3 ( 2¯01) by halide vapor phase epitaxy at 550 °C using gallium chloride and O2 as precursors. X-ray ω-2θ and pole figure measurements prove that phase-pure e-Ga2O3 (0001) films are epitaxially grown on the three kinds of substrates, although some minor misoriented domains are observed. High temperature X-ray diffraction measurements reveal that the e-Ga2O3 is thermally stable up to approximately 700 °C. The optical bandgap of e-Ga2O3 is determined for the first time to be 4.9 eV.
- Published
- 2015
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