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Nitrogen (N) doping engineering is considered a promising approach to achieve p-type conductivity of Ga2O3 films. However, the defect self-compensation effect has been a major obstacle in this field. In this work, we propose a straightforward and environmentally friendly strategy to obtain a doped surface on β-Ga2O3 films via nonthermal N plasma-based treatment. By substituting nitrogen with oxygen, acceptor impurity levels are formed near the valence band, and self-trapped exciton recombination occurs, thereby enhancing the luminescence effect related to acceptor defects. Meanwhile, although achieving stable p-type conduction with N dopant acceptors remains challenging, the surface conductive properties are enhanced by the defect compensation of oxygen vacancy (VO) donor defects. Therefore, detailed investigations into the surface defect compensation of N-doped Ga2O3 thin films are of great research potential for device applications. [ABSTRACT FROM AUTHOR]

A high-quality β-Ga2O3 film was grown on a (111) GaAs substrate using the metal organic chemical vapor deposition method. The band alignment of the β-Ga2O3/GaAs heterojunction interface was determined by x-ray photoelectron spectroscopy. The energy-band structure of β-Ga2O3/GaAs was constructed based on the binding energies of Ga 3d and As 3d core levels as well as valence band maximum values. The valence band offset was determined to be 3.50 ± 0.05 eV. As a consequence, a type-ΙΙ heterojunction with a conduction band offset of 0.12 ± 0.05 eV was determined in the present study. The accurate determination of the band alignment of the β-Ga2O3/GaAs heterojunction provided useful information for the application in β-Ga2O3/GaAs-based devices. [ABSTRACT FROM AUTHOR]