1. Thickness dependence of X-ray absorption and photoemission in Fe thin films on Si(0 0 1)
- Author
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Gao, Xingyu, Qi, Dongchen, Tan, Swee Ching, Wee, A.T. S., Yu, Xiaojiang, and Moser, Herbert O.
- Subjects
- *
ELECTRON spectroscopy , *ELECTRON emission , *PHOTOEMISSION , *ABSORPTION - Abstract
Abstract: To investigate the initial growth of Fe films on Si(0 0 1) and the Fe/Si interface, Fe films at various thicknesses have been systematically studied by soft X-ray absorption spectroscopy (XAS) and X-ray photoemission spectroscopy (XPS). The Fe L edge XAS spectrum shows a strong thickness dependence with broader line-width for thinner films. Detailed analysis of the Fe absorption signal as a function of the thickness shows that the broad linewidth of Fe L edge XAS spectra is mostly contributed by the first Fe layer at the Fe/Si interface. In contrast to XAS, Fe 2p photoemission spectra for these films are identical. However, valence band photoemission also shows a strong thickness dependence. Comparing the valence band photoemission spectra of the thin Fe/Si(0 0 1) films with that of pure Si and the thickest Fe film, the difference spectra at all thicknesses show almost identical shape indicating the same origin: the Fe/Si interface. Thus, it is mainly the first Fe layer at Fe/Si layer that is reactive with the Si substrate changing its electronic structure. [Copyright &y& Elsevier]
- Published
- 2006
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