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The mutual optical intensity (MOI) model is extended to the simulation of the interference pattern produced by extreme ultraviolet lithography with partially coherent light. The partially coherent X-ray propagation through the BL08U1B beamline at Shanghai Synchrotron Radiation Facility is analysed using the MOI model and SRW (Synchrotron Radiation Workshop) method. The fringe intensity at the exposure area is not uniform but has similar envelope lines to Fresnel diffraction, which is explained by the diffraction from the finite grating modelled as a single aperture. By balancing the slit size and photon stop size, the fringe visibility, photon flux and intensity slope can be optimized. Further analysis shows that the effect of pink light on the aerial images is negligible, whereas the third-harmonic light should be considered to obtain a balance between high fringe visibility and high flux. Two grating interference exposure experiments were performed in the BL08U1B beamline. The aerial image depth showed that the polymethyl methacrylate photoresist depth was determined by the X-ray coherence properties.

The mutual optical intensity propagation of partially coherent light through a beamline is calculated for different aperture sizes and positions. The coherence, intensity and phase distribution can be extracted from the mutual optical intensity. The phase distribution depends on the aperture size and position. The results show that the widest flat phase distribution is obtained at the optimized aperture size and position. The aperture plays a more important role for partially coherent light than for incoherent light. The influence of the aperture size and position on the intensity and spot size at the focal plane is also analyzed. A way to obtain a balance between the flat phase distribution area, spot size and intensity for partially coherent light in the beamline is demonstrated.

Elliptical polarized undulators (EPUs) are broadly used in the soft X-ray energy range. They have the advantage of providing photons with both varied energy and polarization through adjustments to the value of the gap and/or shift magnet arrays in an undulator. Yet these adjustments may create a disturbance on the stability of the electron beam in a storage ring. To correct such a disturbance, it is necessary to establish a feed-forward table of key nodes in the gap-shift-defined two-dimensional parameter space. Such a table can only be scanned during machine-study time. For a free-walking mode, whereby an undulator is allowed to manoeuvre in the whole gap-shift space, all the key nodes need to be scanned at the expense of a large amount of machine-study time. This will greatly delay the employment of a full-polarization capable undulator (especially circularly polarized). By analyzing data-collecting patterns of user experiments, this paper defines a reduced set of key nodes in gap-shift parameter space, with the number of key nodes to be scanned for feed-forwarding scaled down to one-third of the original; and introduces a new walking mode for EPUs: confined-walking mode, whereby the undulator is manoeuvred only within the reduced set of key nodes. Such a mode is firstly realized on the EPUs at the DREAMLINE beamline at Shanghai Synchrotron Radiation Facility (SSRF). Under confined-walking mode, the undulator movements are stable and there is no obvious disturbance to the electron beam with the feed-forward system in operation. Successful experiments have been carried out using the circularly polarized light obtained via the new walking mode. This mode is expected to be applied to future EPUs at SSRF with the increasing requirements for various polarization modes.

A new spatially coherent beamline has been designed and constructed at the Shanghai Synchrotron Radiation Facility. Here, the design of the beamline is introduced and the spatial coherence is analyzed throughout the whole process by wave optics. The simulation results show good spatial coherence at the endstation and have been proven by experiment results.

The mutual optical intensity (MOI) model is extended to include the propagation of partially coherent radiation through non-ideal mirrors. The propagation of the MOI from the incident to the exit plane of the mirror is realised by local ray tracing. The effects of figure errors can be expressed as phase shifts obtained by either the phase projection approach or the direct path length method. Using the MOI model, the effects of figure errors are studied for diffraction-limited cases using elliptical cylinder mirrors. Figure errors with low spatial frequencies can vary the intensity distribution, redistribute the local coherence function and distort the wavefront, but have no effect on the global degree of coherence. The MOI model is benchmarked against HYBRID and the multi-electron Synchrotron Radiation Workshop (SRW) code. The results show that the MOI model gives accurate results under different coherence conditions of the beam. Other than intensity profiles, the MOI model can also provide the wavefront and the local coherence function at any location along the beamline. The capability of tuning the trade-off between accuracy and efficiency makes the MOI model an ideal tool for beamline design and optimization.

Variable-included-angle varied-line-spacing plane-grating monochromators (VIA-VPGM) have been applied to many beamlines because of the self-focusing and aberration-correction function of the varied-line-spacing grating. Unfortunately, to optimize the variable-line-spacing coefficient of the grating, the fixed-focus constant (C ff) has to be fixed first in the VIA-VPGM. In this way, some of the advantages of these monochromators are lost, such as the flexibility of choosing a different energy-resolving power by varying the C ff. In this work, a variable C ff optimization method is introduced for a VIA-VPGM. By adopting this method, the C ff could be arbitrarily selected in the VIA-VPGM.

The BL02B bending-magnet beamline at the Shanghai Synchrotron Radiation Facility (SSRF) has been constructed and is now operational for ambient-pressure photoelectron spectroscopy (APPES) and photon-in/photon-out spectroscopy (PIPOS) experimental use. Optical optimization was implemented for realization of high performance, e.g. photon flux, energy-resolving power and focus spot size. X-ray photoelectron spectroscopy experiments show that the energy range extends from 40 to 2000 eV. Argon, nitrogen and neon gas core-shell excitation spectra indicate energy-resolving powers of over 1.4 × 104 @ 244 eV, 1.0 × 104 @ 401 eV and 7.0 × 103 @ 867 eV, respectively. The measured photon flux is 1.3 × 1011 photons s−1 @ E/ΔE = 3700 at 244 eV at the expected sample position, for the SSRF electron energy of 3.5 GeV and electron current of 240 mA. The spot sizes are 177 µm × 23 µm and 150 µm × 46 µm at the APPES and PIPOS samples, respectively.

A new monochromator scheme is presented in which an extra-focus constant-included-angle varied-line-spacing cylindrical-grating monochromator (extra-focus CIA-VCGM) is conveniently combined with a variable-included-angle varied-line-spacing plane-grating monochromator (VIA-VPGM). This dual-mode solution delivers high performance in the energy range from vacuum ultraviolet (VUV) to soft X-ray. The resolving power and the efficiency of this dual-mode grating monochromator are analyzed in detail based on realistic parameters. Comparisons with the commonly used variable-included-angle plane-grating monochromator and normal-incidence monochromator (VIA-PGM/NIM) hybrid monochromator are made.

A new monochromator called an extra-focus constant-included-angle varied-line-spacing (VLS) cylindrical-grating monochromator (extra-focus CIA-VCGM) is described. This monochromator is based on the Hettrick–Underwood scheme where the plane VLS grating is replaced by a cylindrical one in order to zero the defocus at three reference photon energies in the vacuum-ultraviolet range. It has a simple mechanical structure and a fixed focus spot with high performance over a wide energy range. Furthermore, its mechanical compatibility with a standard VLS plane-grating monochromator allows convenient extension into the soft-X-ray range.

A detailed analysis of the effects of temperature excursions, instrumental mechanical motion and source position jitter on the energy-resolving power of beamline 02B at the Shanghai Synchrotron Radiation Facility (SSRF) is presented in this study. This beamline uses a bending-magnet-based source and includes a variable-line-spacing grating monochromator with additional optics. Expressions are derived for the monochromator output photon energy shifts for each of the performance challenges considered. The calculated results indicate that measured temperature excursions of ±1 K produce an energy shift of less than 11% of the system's energy resolution. Mechanical displacements and vibrations measured at amplitudes of less than 0.5 µm produce changes of less than 5%, while measured source location jitter results in a change of less than 10%. Spectroscopic test experiments at 250 and 400 eV provide energy resolutions of over 104. This analysis, combined with the measured results, confirms the operational stability of the beamline, indicating that it meets the performance requirements for experimental use.

Fast switching of X-ray polarization with a lock-in amplifier is a good method for acquiring weak signals from background noise for X-ray magnetic circular dichroism (XMCD) experiments. The usual way to obtain a beam with fast polarization switching is to use two series of elliptically polarized undulators (tandem twin EPUs). The two EPUs generate two individual beams. Each beam has a different polarization and is fast switched into the beamline. It is very important to ensure that the energy resolution, the flux and the spot size at the sample of the two beams are equal in XMCD experiments. However, it is difficult in beamline design because the distances from the two EPUs to the beamline optics are different and the beamline is not switchable. In this work, a beamline design without an entrance slit for fast polarization switching EPUs is discussed. The energy resolution of the two beams can be tuned to be equal by minor rotation of the optics in the monochromator. The flux of the two beams can be balanced through separation bladesX, Yin the exit slit, and by adjusting the position of theXblades along the beam. The spot size of the two beams can be adjusted to be equal by shifting the sample as well.

A new ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline has been designed and is under construction at the Shanghai Synchrotron Radiation Facility. The beamline has two branches: one dedicated to angle-resolved photoemission spectroscopy (ARPES) and the other to photoelectron emission microscopy (PEEM). The two branches share the same plane-grating monochromator, which is equipped with four variable-line-spacing gratings and covers the 20–2000 eV energy range. Two elliptically polarized undulators are employed to provide photons with variable polarization, linear in every inclination and circular. The expected energy resolution is approximately 10 meV at 1000 eV with a flux of more than 3 × 1010 photons s−1at the ARPES sample positions. The refocusing of both branches is based on Kirkpatrick–Baez pairs. The expected spot sizes when using a 10 µm exit slit are 15 µm × 5 µm (horizontal × vertical FWHM) at the ARPES station and 10 µm × 5 µm (horizontal × vertical FWHM) at the PEEM station. The use of plane optical elements upstream of the exit slit, a variable-line-spacing grating and a pre-mirror in the monochromator that allows the influence of the thermal deformation to be eliminated are essential for achieving the ultrahigh-energy resolution.

X-ray transmission through zinc wires of various diameters has been investigated systematically at different beam energies and sample-to-detector distances at the Shanghai Synchrotron Radiation Facility. This analysis shows that the experimentally measured transmission differs significantly from the theoretical estimation unless an appropriate point-spread function/line-spread function (PSF/LSF) is incorporated in the analysis. A number of other possible factors which may contribute to the observed inconsistencies were also assessed and these factors included higher harmonics and fluorescence; however, it was determined that these were not the dominant contributors underlying the inconsistencies. The investigation has demonstrated that the PSF/LSF is a major factor for consideration in quantitative X-ray micro-computed tomography.