1. Characterization Enhancements in Resist Photospeed
- Author
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Randolph Joseph Smith, Nicholas K. Eib, Willard E. Conley, and Marina V. Plat
- Subjects
Materials science ,Renewable Energy, Sustainability and the Environment ,business.industry ,Condensed Matter Physics ,Reflectivity ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,Characterization (materials science) ,Anti-reflective coating ,Optics ,Resist ,law ,Materials Chemistry ,Electrochemistry ,Optoelectronics ,business ,Thick photoresist ,Layer (electronics) ,Refractive index - Abstract
Current photospeed testing methods are based on dose to clear (E 0 ) or resist contrast (γ 10 ). Either method is inadequate for controlling sensitivity to within ±1.5%. We investigated various methods for improving these photospeed tests. Ranked in order of decreasing importance are: (i) controlling standing waves (reflectivity); (ii) choice of developer, (iii) develop time; and (iv) exposure pattern. Reflectiuty can be controlled by careful attention to resist thickness, addition of a bottom antireflective layer, addition of a low refractive index layer (AquaTar), or by using a thick photoresist. Moreover, we can utilize the whole dissolution curve rather than the one-point determination of the E 0 test
- Published
- 1994
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