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2. Influence of Ionic Strength on the Deposition of Metal–Phenolic Networks

Author

Blaise L. Tardy, Joseph J. Richardson, Frank Caruso, Yunlu Dai, Pil J. Yoo, Irene Yarovsky, Junling Guo, Quinn A Besford, Kang Liang, Andrew J. Christofferson, Gwan H. Choi, Chien W. Ong, and Jiwei Cui

Subjects
Metal ions in aqueous solution, Inorganic chemistry, Ionic bonding, 02 engineering and technology, Surfaces and Interfaces, 010402 general chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, 0104 chemical sciences, Catalysis, Metal, chemistry.chemical_compound, chemistry, Ionic strength, visual_art, Tannic acid, Electrochemistry, visual_art.visual_art_medium, General Materials Science, Phenols, Thin film, ta216, 0210 nano-technology, Spectroscopy
Abstract

Metal–phenolic networks (MPNs) are a versatile class of self-assembled materials that are able to form functional thin films on various substrates with potential applications in areas including drug delivery and catalysis. Different metal ions (e.g., FeIII, CuII) and phenols (e.g., tannic acid, gallic acid) have been investigated for MPN film assembly; however, a mechanistic understanding of the thermodynamics governing MPN formation remains largely unexplored. To date, MPNs have been deposited at low ionic strengths (

Published
2017
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