1. Comparison of NBTI aging on adder architectures and ring oscillators in the downscaling technology nodes.
- Author
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Kükner, Halil, Weckx, Pieter, Morrison, Sébastien, Franco, Jacopo, Toledano-Luque, Maria, Cho, Moonju, Raghavan, Praveen, Kaczer, Ben, Jang, Doyoung, Miyaguchi, Kenichi, Bardon, Marie Garcia, Catthoor, Francky, Van der Perre, Liesbet, Lauwereins, Rudy, and Groeseneken, Guido
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RELIABILITY in engineering , *COMPUTER architecture , *THRESHOLD voltage , *RUN time systems (Computer science) , *INTEGRATED circuits - Abstract
Negative Bias Temperature Instability (NBTI) is one of the major time-dependent degradation mechanisms that impact the reliability of advanced deeply scaled CMOS technologies. NBTI can cause workload-dependent shifts on a transistor’s threshold voltage ( V TH ), and performance during its lifetime. This study presents a comparison of the NBTI aging on adder architectures and ring oscillators in the downscaling technology nodes. The first part of the study focuses on the NBTI-induced performance degradation of 32-bit adders (one of the most fundamental block of a processor’s arithmetic logic unit) from the points of architectural topology and workload dependency in the planar technologies (i.e. commercial 28 , 45 , 65 nm nodes), while the second part investigates the energy-delay product degradation of ring oscillators beyond the planar nodes (i.e. research-grade 14 , 10 , 7 nm FinFET technology nodes for several FET channel materials, e.g. Si, SiGe, Ge, InGaAs). Results show the tight coupling between the NBTI aging and the architectural topology, run-time workload, and technology choice. [ABSTRACT FROM AUTHOR]
- Published
- 2015
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