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Your search keyword '"Tuominen, Marko"' showing total 2 results
Start Over Author "Tuominen, Marko" Journal solid state technology
2 results on '"Tuominen, Marko"'

1. Diffusion barrier material for Cu metallization using ALD-[WN.sub.x][C.sub.y]. (Deposition)

Author

Li, Wei-Min, Tuominen, Marko, Haukka, Suvi, Sprey, Hessel, and Raaijmakers, Ivo J.

Subjects
Semiconductor industry, Semiconductor industry -- Materials -- Production management
Abstract

OVERVIEW Currently, PVD-Ta-based thin films are the most commonly used materials as a diffusion barrier in the semiconductor industry. The maturity of the process makes it hard to replace or […]

Published
2003

2. Diffusion barrier material for Cu metallization using ALD-WN[subx]C[suby].

Author

Wei-Men Li, Tuominen, Marko, Haukka, Suvi, Sprey, Hessel, and Raajimakers, Ivo J.

Subjects
*THIN films, *DIFFUSION, *SEMICONDUCTOR industry, *TERNARY superconductors
Abstract

Examines the function of PVD-Titanium based thin films as commonly used materials in diffusion barrier in semiconductor industry. Presentation of the atomic layer deposition; Capabilities of the low resistivity ternary material.

Published
2003

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