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1. Directed self-assembly patterning for forming fin field effect transistors

Author

Richard A. Farrell, Fee Li Lie, Michael A. Guillorn, Hoa Truong, Elliott Franke, Sean D. Burns, Matthew E. Colburn, Akiteru Ko, Mark Somervell, Nelson Felix, John C. Arnold, David Hetzer, Hsinyu Tsai, Stuart A. Sieg, Kafai Lai, Chi-Chun Liu, and Daniel P. Sanders

Subjects
Directed self assembly, Materials science, Fin, business.industry, Optoelectronics, Field-effect transistor, business
Published
2016

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