1. Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors
- Author
-
Andrzej Bartnik, Alfio Torrisi, Lorenzo Torrisi, Przemyslaw Wachulak, Łukasz Węgrzyński, Henryk Fiedorowicz, Torrisi, A., Wachulak, P., Torrisi, L., Bartnik, A., Wegrzynski, L., and Fiedorowicz, H.
- Subjects
Risk ,Plasma diagnostic technique ,Nuclear and High Energy Physics ,'Water-window' ,EUV ,Gas-pufftarget ,SiC detector ,Nuclear Energy and Engineering ,Safety, Risk, Reliability and Quality ,Waste Management and Disposal ,Condensed Matter Physics ,Instrumentation ,‘water-window’ ,Science ,Extreme ultraviolet lithography ,Nanotechnology ,01 natural sciences ,010309 optics ,0103 physical sciences ,gas-puff target ,010302 applied physics ,Water window ,business.industry ,Detector ,Plasma ,Characterization (materials science) ,Reliability and Quality ,Optoelectronics ,Soft x-ray microscopy ,Safety ,business - Abstract
An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the ‘water window’ spectral range (λ= 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization.
- Published
- 2016
- Full Text
- View/download PDF