Search

Your search keyword '"van Eijk, J."' showing total 19 results
Start Over Author "van Eijk, J." Publication Type Electronic Resources
19 results on '"van Eijk, J."'

1. Influence of personalized extended interval dosing on the natalizumab wearing-off effect - a sub-study of the NEXT-MS trial

Author

Toorop, A. A., Wessels, M. H.J., Gelissen, L. M.Y., Hoitsma, E., Zeinstra, E. M.P.E., van Rooij, L. C., van Munster, C. E.P., Vennegoor, A., Mostert, J. P., Wokke, B. H.A., Kalkers, N. F., Hoogervorst, E. L.J., van Eijk, J. J.J., Roosendaal, C. M., Kragt, J. J., Eurelings, M., van Genugten, J., Nielsen, J., Sinnige, L. G.F., Kloosterziel, M. E., Arnoldus, E. P.J., van Dijk, G. W., Bouvy, W. H., Strijbis, E. M.M., van Oosten, B. W., de Jong, B. A., Lissenberg-Witte, B. I., Rispens, T., Uitdehaag, B. M.J., Killestein, J., van Kempen, Z. L.E., Toorop, A. A., Wessels, M. H.J., Gelissen, L. M.Y., Hoitsma, E., Zeinstra, E. M.P.E., van Rooij, L. C., van Munster, C. E.P., Vennegoor, A., Mostert, J. P., Wokke, B. H.A., Kalkers, N. F., Hoogervorst, E. L.J., van Eijk, J. J.J., Roosendaal, C. M., Kragt, J. J., Eurelings, M., van Genugten, J., Nielsen, J., Sinnige, L. G.F., Kloosterziel, M. E., Arnoldus, E. P.J., van Dijk, G. W., Bouvy, W. H., Strijbis, E. M.M., van Oosten, B. W., de Jong, B. A., Lissenberg-Witte, B. I., Rispens, T., Uitdehaag, B. M.J., Killestein, J., and van Kempen, Z. L.E.

Abstract

Background and objectives: Wearing-off symptoms during natalizumab treatment in multiple sclerosis are characterized by an increase of MS-related symptoms prior to natalizumab administration. The influence of extended interval dosing (EID) on wearing-off symptoms are important to consider, as this might cause hesitancy in initiating or continuing EID. Methods: Participants of the NEXT-MS trial, in which treatment intervals are adjusted based on drug concentrations, were divided into two groups: an extended group containing participants with at least one week of additional interval extension, and a group with a fixed interval during the trial (range 4–7 weeks). Changes in the occurrence, frequency, onset, and severity of wearing-off symptoms were evaluated. Results: 255 participants were included (extended group n = 171, fixed group n = 84). The odds on occurrence of wearing-off symptoms in the extended group did not increase after extending the treatment interval. Additional analyses for frequency, onset, and severity of wearing-off symptoms showed no changes over time. Mean decrease in natalizumab drug concentration did not influence the frequency of wearing-off symptoms. Discussion: Wearing-off symptoms were not reinforced by further extending the natalizumab interval. Wearing-off symptoms might increase in a minority of patients after EID, although our data support the view that wearing-off symptoms appear to be unrelated to the decrease in natalizumab trough drug concentrations.

Published
2024

3. Caregiver strain among life partners of persons with mild disability due to relapsing-remitting multiple sclerosis

Author

Van Der Hiele, K., Van Gorp, D.A.M., Heerings, M.A.P., Jongen, P.J., Van Der Klink, J.J.L., Beenakker, E.A.C., Van Eijk, J., Frequin, S., Van Geel, B., Hengstman, G., Hoitsma, E., Mostert, J., Verhagen, W., De Gans, K., Zemel, D., Middelkoop, H., Visser, L., Van Der Hiele, K., Van Gorp, D.A.M., Heerings, M.A.P., Jongen, P.J., Van Der Klink, J.J.L., Beenakker, E.A.C., Van Eijk, J., Frequin, S., Van Geel, B., Hengstman, G., Hoitsma, E., Mostert, J., Verhagen, W., De Gans, K., Zemel, D., Middelkoop, H., and Visser, L.

Published
2019

7. Second-trimester cervical length as risk indicator for Cesarean delivery in women with twin pregnancy

Author

van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, Mol, B W J, van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, and Mol, B W J

Published
2015

8. Second-trimester cervical length as risk indicator for Cesarean delivery in women with twin pregnancy

Author

van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, Mol, B W J, van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, and Mol, B W J

Published
2015

9. Second-trimester cervical length as risk indicator for Cesarean delivery in women with twin pregnancy

Author

van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, Mol, B W J, van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, and Mol, B W J

Published
2015

10. Second-trimester cervical length as risk indicator for Cesarean delivery in women with twin pregnancy

Author

Epi Methoden Team 1, Other research (not in main researchprogram), Geboortecentrum voorzitterschap, van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, Mol, B W J, Epi Methoden Team 1, Other research (not in main researchprogram), Geboortecentrum voorzitterschap, van de Mheen, L, Schuit, E, Liem, S M S, Lim, A C, Bekedam, D J, Goossens, S M T A, Franssen, M T M, Porath, M M, Oudijk, M A, Bloemenkamp, K W M, Duvekot, J J, Woiski, M D, de Graaf, I, Sikkema, J M, Scheepers, H C J, van Eijk, J, de Groot, C J M, van Pampus, M G, and Mol, B W J

Published
2015

11. Photolithography on bulk micromachined substrates

Author

Venstra, W.J. (author), Spronck, J.W. (author), Sarro, P.M. (author), Van Eijk, J. (author), Venstra, W.J. (author), Spronck, J.W. (author), Sarro, P.M. (author), and Van Eijk, J. (author)

Abstract

Photolithography on high topography substrates, such as the sidewalls or the bottom of cavities and trenches created by bulk micromachining, enables the design of complex three-dimensional structures. When a contact lithography system is used to pattern such substrates, local gaps exist between the mask and the substrate. In this paper we investigate the deformation of patterns as a result of these local gaps. We determine the position accuracy and the minimum size of features that can be patterned as a function of the gap distance. Deformations introduced by the optical system are quantified for a common exposure tool, and compared to pattern deformation due to variations in photoresist layer thickness. Finally, methods to improve the quality of patterns transferred through gaps up to 350 ?m are discussed, Kavli Institute of Nanoscience, Applied Sciences

Published
2009
Full Text
View/download PDF

12. Photolithography on bulk micromachined substrates

Author

Venstra, W.J. (author), Spronck, J.W. (author), Sarro, P.M. (author), Van Eijk, J. (author), Venstra, W.J. (author), Spronck, J.W. (author), Sarro, P.M. (author), and Van Eijk, J. (author)

Abstract

Photolithography on high topography substrates, such as the sidewalls or the bottom of cavities and trenches created by bulk micromachining, enables the design of complex three-dimensional structures. When a contact lithography system is used to pattern such substrates, local gaps exist between the mask and the substrate. In this paper we investigate the deformation of patterns as a result of these local gaps. We determine the position accuracy and the minimum size of features that can be patterned as a function of the gap distance. Deformations introduced by the optical system are quantified for a common exposure tool, and compared to pattern deformation due to variations in photoresist layer thickness. Finally, methods to improve the quality of patterns transferred through gaps up to 350 ?m are discussed, Kavli Institute of Nanoscience, Applied Sciences

Published
2009
Full Text
View/download PDF

15. Active Structural Damping in high-precision equipment

Author

Vervoordeldonk, M.J., Roozen, N.B., van Eijk, J., Vervoordeldonk, M.J., Roozen, N.B., and van Eijk, J.

Abstract

This paper discusses a novel approach to actively dampen structural modes of high-precision equipment, based on the presence of active vibration isolators. For both the evaluation of the achievable damping and the controller tuning, an alternative analysis method is introduced. Initial experimental results – based on a 3D scale model of an active isolated platform – are presented.

Published
2006

Catalog

Books, media, physical & digital resources
See catalog results