Search

Two-dimensional metasurface structures have recently been proposed to reduce the challenges of fabrication of traditional plasmonic metamaterials. However, complex designs and sophisticated fabrication procedures are still required. Here, we present a unique one-dimensional (1-D) metasurface based on bilayered metallic nanowire gratings, which behaves as an ideal polarized beam splitter, producing strong negative reflection for transverse-magnetic (TM) light and efficient reflection for transverse-electric (TE) light. The large anisotropy resulting from this TE-metal-like/TM-dielectric-like feature can be explained by the dispersion curve based on the Bloch theory of periodic metal-insulator-metal waveguides. The results indicate that this photon manipulation mechanism is fundamentally different from those previously proposed for 2-D or 3-D metastructures. Based on this new material platform, a novel form of metasurface holography is proposed and demonstrated, in which an image can only be reconstructed by using a TM light beam. By reducing the metamaterial structures to 1-D, our metasurface beam splitter exhibits the qualities of cost-efficient fabrication, robust performance, and high tunability, in addition to its applicability over a wide range of working wavelengths and incident angles. This development paves a foundation for metasurface structure designs towards practical metamaterial applications. [ABSTRACT FROM AUTHOR]

Subwavelength grating (SWG) metamaterials have garnered a great interest for their singular capability to shape the material properties and the propagation of light, allowing the realization of devices with unprecedented performance. However, practical SWG implementations are limited by fabrication constraints, such as minimum feature size, that restrict the available design space or compromise compatibility with high-volume fabrication technologies. Indeed, most successful SWG realizations so far relied on electron-beam lithographic techniques, compromising the scalability of the approach. Here, we report the experimental demonstration of an SWG metamaterial engineered beam splitter fabricated with deep-ultraviolet immersion lithography in a 300-mm silicon-on-insulator technology. The metamaterial beam splitter exhibits high performance over a measured bandwidth exceeding 186 nm centered at 1550 nm. These results open a new route for the development of scalable silicon photonic circuits exploiting flexible metamaterial engineering. [ABSTRACT FROM AUTHOR]