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This paper explores the next stage of GaN power devices with 2-level integration of peripheral low voltage active and passive devices. The 1st level consists of protection/control/driving circuits, which potentially improves the performance and overcomes the challenges to the power devices. The 2nd level integration has high-low side on-chip integration on a 100V technology platform. The challenge of channel modulation due to substrate bias sharing is effectively eliminated by the invented new scheme. The system efficiency of DC-DC buck converter using such scheme is enhanced with lower on-state resistance and good stability.

GaN Cascode performance optimization for high efficient power applications is presented in this paper. Analytical equations of Cascode capacitance network (Ciss, Coss, Cgd) is demonstrated and the equations accuracy is verified through experimental measurement. Analysis shows that Cascode Cgd is determined by HV D-MISFETs Cds, LV Si FETs Cgd/Coss ratio, and extra zener diode capacitance. With low intrinsic capacitance HV D-MISFETs [1-2], proper LV Si FETs selection, and extra zener diode protection, optimization for Cascode switching figure-of-merit (FOM, Ron x Qgd) is well demonstrated. 8.8X lower switching figure-of-merit than commercial best-in-class Si SJ FETs [3] is achieved, double pulse test (DPT) and hard switching PFC system verification result all indicate that GaN Cascode is the promising solution and ready for next generation energy systems.

CMOS-compatible 100/650 V enhancement-mode FETs and 650 V depletion-mode MISFETs are fabricated on 6-inch AlGaN/GaN-on-Si wafers. They show high breakdown voltage and low specific on-resistance with good wafer uniformity. The importance of epitaxial quality is figured out in a key industrial item: high-temperature-reverse-bias-stress-induced on-state drain curent degradation. Optimization of epitaxial layers shows significant improvement of device reliability.