42 results on '"Delabie, Annelies"'
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2. Low-Temperature Dechlorosilylation Chemistry for Area-Selective Deposition of Ge2Sb2Te5 and Its Mechanism in Nanopatterns
3. Probing the spatial dimensions of nanoscale patterns with Rutherford backscattering spectrometry
4. Top-Gate Stack Engineering Featuring a High-κ Gadolinium Aluminate Interfacial Layer for Field-Effect Transistors Based on Two-Dimensional Transition-Metal Dichalcogenides
5. Impact of open‐air processing on atmospheric pressure plasma deposition of poly(ethylene oxide) coatings for antifouling applications
6. Quantification of area-selective deposition on nanometer-scale patterns using Rutherford backscattering spectrometry
7. Chemical Vapor Deposition of a Single-Crystalline MoS2 Monolayer through Anisotropic 2D Crystal Growth on Stepped Sapphire Surface
8. Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
9. Improvement of the Ferroelectric Response of La-Doped Hafnium Zirconium Oxide Employing Tungsten Oxide Interfacial Layer with Back-End-of-Line Compatibility
10. Selectivity and Growth Rate Modulations for Ruthenium Area‐selective Deposition by Co‐Reagent and Nanopattern Design.
11. Chemical Vapor Deposition of a Single-Crystalline MoS2 Monolayer through Anisotropic 2D Crystal Growth on Stepped Sapphire Surface.
12. Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy
13. Quantified Uniformity and Selectivity of TiO2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles
14. A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition
15. In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor
16. Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions
17. Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition
18. Quantified Uniformity and Selectivity of TiO2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles.
19. A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition.
20. Nucleation and growth mechanism for atomic layer deposition of Al2O3 on two-dimensional WS2 monolayer
21. Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO2 area-selective deposition
22. Optimizing EUV imaging metrics as a function of absorber thickness and illumination source: simulation case study of Ta-Co alloy
23. (Invited) Nm-Scale Patterns and Selectivity: A Blessing or a Curse
24. (Invited) Metallizations for Advanced Interconnects and Challenges for Future Nodes
25. (Invited) Addressing Key Process and Material Challenges to Enable 2D Transition Metal Dichalcogenide Channels in Advanced Logic Devices
26. Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition
27. In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor.
28. Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
29. Improving polymethacrylate EUV resists with TiO2 area-selective deposition
30. Nucleation and growth mechanism for atomic layer deposition of Al2O3 on two-dimensional WS2 monolayer.
31. Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub‐50 nm Nanopatterns by Diffusion and Size‐Dependent Reactivity
32. Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition.
33. Optimizing EUV imaging metrics as a function of absorber thickness and illumination source: simulation case study of Ta-Co alloy
34. Improving polymethacrylate EUV resists with TiO2area-selective deposition
35. Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
36. Chemical Vapor Deposition of a Single-Crystalline MoS2Monolayer through Anisotropic 2D Crystal Growth on Stepped Sapphire Surface
37. MoS2Functionalization with a Sub-nm Thin SiO2Layer for Atomic Layer Deposition of High-κ Dielectrics
38. (Invited) Ru Selective Metal Deposition for Hybrid Metallization in Nano-Interconnect Applications.
39. A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2Atomic Layer Deposition
40. Improving polymethacrylate EUV resists with TiO2 area-selective deposition.
41. Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO2area-selective deposition
42. Chemical Vapor Deposition of a Single-Crystalline MoS 2 Monolayer through Anisotropic 2D Crystal Growth on Stepped Sapphire Surface.
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