1. Role of solute in stress development of nanocrystalline films during heating: An in situ synchrotron X-ray diffraction study.
- Author
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Wang, Jing, Li, Xiaohu, Maawad, Emad, Han, Lu, Huang, Yuan, Liu, Yongchang, and Wang, Zumin
- Subjects
X-ray diffraction ,SYNCHROTRONS ,CRYSTAL grain boundaries ,HEAT treatment ,THERMAL stresses ,INTERNAL friction ,THERMAL diffusivity ,ANNEALING of metals - Abstract
• Real-time stress evolutions in the nanocrystalline films upon heating were investigated by in situ synchrotron X-ray diffraction. • The total stress in the films can be separated into thermal stress, grain-growth stress, and intrinsic stress. • The addition of solute Mo can modify grain boundaries during heating, including grain-boundary amorphization, grain-boundary relaxation, and grain-boundary segregation. • The intrinsic role of solute on stress development in the nanocrystalline films has been disclosed. The effect of the solute (Mo) on the stress development of nanocrystalline Ni and Ni–Mo films upon heating has been investigated in real time using in situ synchrotron X-ray diffraction. The complex and distinct relationship between the film stress and grain boundaries (GBs) has been examined by the evolution of real-time intrinsic stress in combination with the in situ grain growth and thermal characterizations. The different intrinsic stress evolutions in the Ni and Ni–Mo films during the heating process result from the modification of GBs by Mo alloying, including GB amorphization, GB relaxation, and GB segregation. It has been found that GBs play a vital role in the stress development of nanocrystalline films. The addition of a solute can not only inhibit grain growth but also influence the stress evolution in the film by changing the atomic diffusivity at the GBs. This work provides valuable and unique insights into the effect of solutes on stress development in nanocrystalline films during annealing, permitting control of the film stress through solute addition and heat treatment, which is critical for improving the design, processing, and lifetime of advanced nanocrystalline film devices at high temperatures. [ABSTRACT FROM AUTHOR]
- Published
- 2023
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