Jasinski, J., Swider, W., Liliental-Weber, Z., Visconti, P., Jones, K. M., Reshchikov, M. A., Yun, F., Morkoc¸, H., Park, S. S., and Lee, K. Y.
A free-standing GaN template grown by hydride vapor phase epitaxy has been characterized by transmission electron microscopy (TEM). The TEM investigation was augmented by x-ray diffraction, defect delineation etching process followed by imaging with atomic force microscopy and variable temperature photoluminescence. The density of dislocations near the N face was determined to be, in order, 3±1x10[sup 7], 4±1x10[sup 7], and about 1x10[sup 7] cm[sup -2] by cross-sectional TEM, plan-view TEM, and a defect revealing etch, respectively. The same methods on the Ga face revealed the defect concentration to be, in order, less than 1x10[sup 7] cm[sup -2] by plan-view TEM, less than 5x10[sup 6] cm[sup -2] by cross-sectional TEM, and 5x10[sup 5] cm[sup -2] by defect revealing hot H[sub 3]PO[sub 4] acid, respectively. The full width at half maximum of the symmetric (0002) x-ray diffraction peak was 69 and 160 arc sec for the Ga and N faces, respectively. That for the asymmetric (101_4) peak was 103 and 140 arc sec for Ga and N faces, respectively. The donor bound exciton linewidth was about 1 meV each at 10 K, and a green band centered at about 2.44 eV was observed. © 2001 American Institute of Physics. [ABSTRACT FROM AUTHOR]