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Oxide-based thin-film transistors (TFTs) with a lateral in-plane electrode are self-assembled on paper substrates, and the electrical modulation effect of the in-plane electrode is investigated. A \SiO2-based solid-electrolyte film with high specific capacitance is used as the gate dielectric, and the operation voltage is reduced to less than 2.0 V. The threshold voltage (Vth) of such paper TFTs is tuned from -0.98 to 0.94 V by different voltage biases on the in-plane electrode. The threshold voltage shift (\Delta Vth) can be described by \Delta Vth = -(CG2/CG1)VG2, where CG2 and CG1 are the in-plane electrode and bottom-gate specific capacitance values. High electrical performance with a current on/off ratio of \6 \times \10^5 \sim \10^6, a subthreshold swing of 0.14 \sim 0.19 V/dec, and a mobility of \8.64 \sim \9.45\ \cm^2/\V\cdot \s is obtained at different in-plane electrode voltage biases. Such low-voltage paper TFTs are promising for low-cost and portable electronics. [ABSTRACT FROM PUBLISHER]

This paper provides an industry perspective on the present state of compact models for MOS transistors. It highlights the complexity of layout-dependent effects in modern transistors, reviews some common misunderstandings of MOS transistor capacitances, and introduces a new, structurally symmetric, “gate-as-input” equivalent network for these capacitances. Areas of focus for the future model developments are also proposed. [ABSTRACT FROM AUTHOR]

Microporous SiO2 can provide large electric-doublelayer (EDL) capacitance and negligible leakage current, owing to lack of electron carrier and limited mobility of mobile ions. The impedance spectroscopy (ionic-conductivity--frequency and capacitance--voltage characteristics) and Fourier-transformed infrared spectroscopy of microporous SiO2 are characterized, which demonstrated that such dielectric is actually a solid-electrolyte dielectric. InGaZnO4 thin-film transistors (TFTs) on paper substrates gated by microporous-SiO2 solid electrolyte are fabricated at roomtemperature.The largeEDL-specific capacitance (1.36 µF/ cm²) results in the paper TFTs operate at a battery-drivable low voltage of 1.0 V. Both depletion-mode (Vth = .0.45 V) and enhancement-mode (Vth = 0.25 V) operations are realized by rationally controlling the oxygen concentration in argon ambient during InGaZnO4 channel deposition. Electrical characteristics with an equivalent field-effect mobility of ~21 cm²/V ⋅ s, a current ON/OFF ratio of greater than 105, and a subthreshold swing of ~80 mV/dec are demonstrated at low frequencies, which are promising for portable paper electronics. [ABSTRACT FROM AUTHOR]

Transistor random threshold voltage variations due to process fluctuations seriously affects the stability of Static Random Access Memory (SRAM). In this paper, a SRAM bit transistors threshold voltage $({Vth})$ deviation monitoring scheme and system is proposed. This scheme ingeniously achieves on-chip measurement of all transistors threshold voltages without altering compact SRAM bit array layout. Control signal strategies and Transistor ${Vth}$ Determination Circuit (TVDC) for different types of Devices Under Test (DUTs) have been proposed. The system is implemented using a 65 nm CMOS process with a core area of 0.01875mm2. Through Monte Carlo analysis, the Weighted Average (WA) difference of the proposed scheme and the direct measurement method is not more than 10mV, and the Root Mean Square Error (RMSE) difference is not more than 3mV. This system can also effectively detect the cell position of the transistor threshold voltage mismatch simulated by modifying the substrate voltage. For SRAM arrays of different scales, the method proposed in this paper has area efficiency and flexible reconfigurability. [ABSTRACT FROM AUTHOR]

The first part of this paper presented mymargin the device-level comparison of emerging materials (In0.53Ga0.47As and 2-D materials) and device architecture (NW FETs) with s-Si FinFETs. In order to further understand the performance and energy efficiency of these device options for future technology nodes, it is required to go beyond the device-level comparison by accounting for not only intrinsic but also the extrinsic parasitic elements. In this paper, we present the comparison of s-Si, In0.53Ga0.47As, and 2-D material-based n-type MOSFETs using the circuit-level figure of merits across three successive future technology nodes. The analysis incorporates both device characteristics obtained from an advanced quantum mechanical simulation tool and circuit-level comparison, which accounts for device parasitic elements and wiring load. The results show that 2-D material DG MOSFETs present a more energy-efficient device option than s-Si and In0.53Ga0.47As FinFETs in sub-0.7-V supply voltage regime and In0.53Ga0.47As nanowire (NW) FETs can outperform s-Si multi-gate (MuG) FETs and 2-D material FETs, but when considering non-idealities, s-Si NW FETs remain both faster and more energy-efficient device option. [ABSTRACT FROM AUTHOR]

Functional test sequences can detect defects that are not detected by scan-based tests, but overall, achieve a lower gate-level fault coverage than scan-based tests. Design-for-testability (DFT) approaches for functional test sequences cause the sequences to deviate from functional operation conditions in arbitrary ways over the entire design. This paper introduces the concept of invisible-DFT as a DFT approach for functional test sequences, where the effects of activating the DFT logic are confined to selected logic blocks. This paper develops an invisible-scan approach. Considering a single logic block, the procedure described in this paper inserts scan shift cycles into a functional test sequence while maintaining the same primary input and output sequences for the logic block. This makes the activation of the DFT logic invisible to other logic blocks. The procedure allows a limited number of primary output vectors to be corrected for this purpose. Experimental results are presented to demonstrate the increase in fault coverage that can be achieved by invisible-scan. [ABSTRACT FROM AUTHOR]

In this paper, a simple yet effective network pruning framework is proposed to simultaneously address the problems of pruning indicator, pruning ratio, and efficiency constraint. This paper argues that the pruning decision should depend on the convolutional weights, and thus proposes novel weight-dependent gates (W-Gates) to learn the information from filter weights and obtain binary gates to prune or keep the filters automatically. To prune the network under efficiency constraints, a switchable Efficiency Module is constructed to predict the hardware latency or FLOPs of candidate pruned networks. Combined with the proposed Efficiency Module, W-Gates can perform filter pruning in an efficiency-aware manner and achieve a compact network with a better accuracy-efficiency trade-off. We have demonstrated the effectiveness of the proposed method on ResNet34, ResNet50, and MobileNet V2, respectively achieving up to 1.33/1.28/1.1 higher Top-1 accuracy with lower hardware latency on ImageNet. Compared with state-of-the-art methods, W-Gates also achieves superior performance. [ABSTRACT FROM AUTHOR]

Thin-film transistors were fabricated using 45-nm thick ZnO deposited by pulsed laser deposition and 15-nm thick Al2O3 gate insulator deposited by atomic layer deposition. A 1-D model with a constant density of interface states above and below the conduction band edge is used to explain the current-voltage characteristic. This model does not create distortion of transconductance versus gate voltage at low gate voltage that can be created by exponential tail or Gaussian distributions of interface states. The “subthreshold” regime is at the top ZnO surface away from the bottom gate, but subthreshold swing is controlled by interface states at the ZnO/Al2O3 bottom interface. The observed increase in mobility with gate voltage is delayed by filling of the interface states above the conduction band edge. Interface state filling and a rapid increase in mobility with increased gate voltage produce an apparent large threshold voltage as extrapolated from a linear fit to current measured at large gate voltage. The difference between threshold voltage and turn-off voltage is an important figure of merit (FOM) that should be kept as small as possible. In this paper, FOM is 2.5 and 1.8 V for 0.1 and 6 V drain voltage, respectively. [ABSTRACT FROM PUBLISHER]

The physical mechanisms involved in the trapping and de-trapping processes associated with surface donor traps in gallium nitride (GaN) transistors are discussed in this paper. The paper challenges the conventional transient techniques adopted for extrapolating the trap energy level via experiments and TCAD simulations. Transient TCAD simulations were employed to reproduce the time-dependent electrical behavior of a metal-on-insulator field-effect transistor and explain the influence of the electric field and energy barrier on the transient time associated with the trapping and de-trapping mechanisms of surface traps. The comparison between three test structures and the relative variation of the trapping and de-trapping times with the bias and trap parameters leads to the suggestion of a proposed test structure and bias configuration to accurately extrapolate the energy level of surface traps in GaN transistors. [ABSTRACT FROM AUTHOR]

Intellectual property (IP) cores used in consumer electronics devices mandate protection against reverse engineering (RE) attacks. Functional obfuscation protects the design functionality by enhancing the complexity of RE attacks. This paper proposes a novel low cost (based on power-delay tradeoff) functional obfuscation methodology through employment of robust IP locking technique. In the proposed obfuscation methodology, several strong multipairwise secure IP locking block designs are presented that can only be actuated through application of valid serial key bits. As demonstration, this paper also shows a practical example of a functional obfuscated netlist structure of FIR filter. Proposed obfuscation on comparison with a recent approach for several DSP cores yielded a power reduction of ~10%, design cost reduction ~ 6.5% and security enhancement (strength of obfuscation) of $>\,\,4.29\,\,{e+9}$ times. [ABSTRACT FROM AUTHOR]

In this paper, for the first time, the record high-performance top-gated graphene technology platform is used for electrostatic discharge (ESD) physics exploration while investigating the implications of various design and technology options. Impact of diffusive versus ballistic carrier transport on the failure mechanism in top-gate as well as back-gate graphene FET (GFET) is investigated. A unique contact limited failure in graphene transistors is reported. Physical insights on current saturation in GFET and unique step-by-step failure in dielectric capped transistors are presented for the first time. Moreover, device degradation under ESD timescales and its implications on current saturation are revealed. Finally, the influence of various top-gate designs on the ESD performance is reported. New physical insights and matured GFET technology has eventually enabled record high ESD robustness. [ABSTRACT FROM AUTHOR]

Because of charge trapping in GaN HEMTs, dc characteristics of these devices are not representative of high-frequency operation. The advanced spice model GaN model presented in Part I of this paper is combined with a Shockley–Reed–Hall-based trap model, yielding a comprehensive FET model for GaN HEMTs which can accurately model GaN devices exhibiting trapping-related dispersion effects. Measurement results of the dc and pulsed output and transfer characteristics of a commercially available GaN HEMT are presented, trapping in the device is modeled, and excellent fit to the measured data is shown. This paper presents an accurate model of trapping which is validated for eight different quiescent bias points of pulse measurements, with quiescent drain voltage ranging from 5 to 20 V and quiescent gate voltage ranging from −2.8 to −3.8 V, and a large range of gate and drain voltages to which the device was pulsed in the pulse measurements and at which the device was measured in the dc measurements, with gate voltage ranging from −4 to 0.4 V and drain voltage ranging from 0 to 40 V. This paper also presents high-frequency (10 GHz) large-signal RF validation of the model for optimal complex load condition. [ABSTRACT FROM AUTHOR]

E-beam voltage contrast inspection is a very common method for in-line detection of many key defect types for rapid yield learning during technology development. Generally, the wafer surface is charged positive, but sometimes charging the wafer surface negative makes more sense. This paper reviews four advantages that negative charging may provide. Switching from positive to negative charging is typically achieved using landing energy and/or extraction voltage. A third control knob is introduced and demonstrated using three common inspection layers, contact chemical mechanical polish (CMP), 3D NAND wordline shorts and 3D NAND wordline opens. [ABSTRACT FROM AUTHOR]

We address the problem of reducing the size of Craig’s interpolants (ITPs) used in SAT-based model checking. Whereas it is well known that ITPs are highly redundant, their compaction is typically tackled by reducing the proof graph and/or by exploiting standard logic synthesis techniques. Furthermore, strengthening and weakening have been studied as options to control ITP quality. In this paper, we propose an SAT-based ITP weakening/strengthening technique, for ITP compaction, where the UNSAT core extracted from an additional SAT query is used to obtain a gate-level abstraction of the ITP. The abstraction introduces fresh new variables at gate cuts that must be quantified out in order to obtain a valid ITP. We show how to efficiently quantify them out, by working on a negation normal form representation of the circuit. This paper includes an experimental evaluation, showing the benefits of the proposed approach, on a set of benchmark ITPs arising from hardware model checking problems. 1 Some of the techniques here described were presented in a preliminary version at FMCAD’16. [ABSTRACT FROM AUTHOR]

This paper defines a new type of a low-power broadside test, called a reverse low-power broadside test, whose application requires design-for-testability logic. The unique feature of a reverse low-power broadside test is that it duplicates the switching activity during the second functional capture cycle of a given low-power broadside test, except that signal-transitions are reversed. Thus, the switching activity of a reverse low-power broadside test duplicates that of a low-power broadside test in every subcircuit and on every line individually. In addition, the reversed test detects different faults, and can thus increase the fault coverage of a low-power broadside test set. This paper studies the ability of reverse low-power broadside tests to increase the transition fault coverage in benchmark circuits considering functional broadside tests as well as low-power broadside tests that are not functional. [ABSTRACT FROM AUTHOR]

In this paper, we present a detailed investigation of the impact of fin width (${w}_{\text {fin}}$) on tri-gate AlGaN/GaN metal–oxide–semiconductor high electron mobility transistors (MOSHEMTs). As ${w}_{\text {fin}}$ is reduced, the threshold voltage (${V}_{\text {TH}}$) increases, which is due to the enhanced gate control (especially for ${w}_{\text {fin}} < {200}$ nm) thanks to the 3-D geometry of the tri-gate, and the reduced carrier concentration (${N}_{\text {s}}$) caused by a more pronounced strain relaxation and sidewall depletion, as explored using Hall and capacitance–voltage (${C}$ – ${V}$) measurements. Normally- OFF operation was achieved for ${w}_{\text {fin}}$ close to the sidewall depletion width (${w}_{\text {dep}}$) of 19.5 nm, since the fin is depleted from its two sidewalls. The impact of ${w}_{\text {fin}}$ on ON-resistance (${R} _{{{ {6{8} {\text {ON}}}}}}$) and current capability (${I} _{\text {D},\text {max}}$) was also investigated, along with the influence of the effective source injection, the trench conduction and the filling factor (FF) on these key characteristics. The degradation caused by the tri-gate fin etching could be fully recovered by increasing the FF. Finally, we show that the tri-gate can reduce gate capacitance (${C}_{\text {G}}$) and charge (${Q}_{\text {G}}$) in normally- ON MOSHEMTs, depending on the design of the tri-gate and the gate voltage (${V}_{\text {G}}$), leading to a smaller ${R}_{{{ {6{8} {\text {ON}}}}}} \cdot {Q}_{\text {G}}$ product that is beneficial for high-frequency switching applications. The results in this paper offer insights into important phenomena in tri-gate GaN devices and are fundamental for the further advance of this technology. [ABSTRACT FROM AUTHOR]

In this response, we show that the paper by Kim et al. by our group has a different research purpose and uses different modeling processes, which was not described in the previous work by Ortiz-Conde et al. The comments issued by Ortiz-Conde et al., who claim that our paper corresponds to a particular case of their previous work, are in our opinion overgeneralized. Differences compared to Ortiz-Conde’s previous work are discussed in detail. We also explain how the problem on threshold voltage pointed out by Ortiz-Conde et al. can be solved through a semiempirical method from measured data. [ABSTRACT FROM AUTHOR]

Vertical interconnects used in monolithic 3-D integrated circuits (3-D ICs), so-called monolithic interlayer vias (MIVs), are as small as local vias. Thus, redesigning an existing 2-D IC layout in a monolithic 3-D IC generally results in shorter wire length than the 2-D IC layout. In addition, MIVs have almost negligible resistance and capacitance, so their impact on signal delay is very small. Thus, redesigning a 2-D IC layout in a monolithic 3-D IC is expected to improve its performance significantly. Some researchers designed several monolithic 3-D IC layouts and showed their timing benefits in the literature. In this paper, we present analytical models for performance (timing) benefits of multitier gate-level monolithic 3-D ICs. The analytical models we develop in this paper can be used to quickly estimate the performance benefits multitier gate-level monolithic 3-D integration provides without physically redesigning 2-D IC layouts in 3-D. [ABSTRACT FROM AUTHOR]

As CMOS technology scales down to the nanoscale, high leakage power consumption becomes one of the major concerns in the design of electronic circuits. To overcome this challenge, nano-emerging technologies and logic-in-memory (LIM) structures are being studied. Magnetic tunnel junction (MTJ) is an emerging spin-based device, which consumes very minimal leakage power in conjunction with CMOS transistors. In this paper, we propose a novel MTJ/CMOS design, which consumes low power and has lower delay than the existing LIM-based MTJ/CMOS designs. The proposed MTJ/CMOS designs have lower power and lower delay by charge sharing the output nodes during the pre-charge phase. The designs are simulated using 45 nm CMOS technology with perpendicular anistropy CoFeB/MgO MTJ model using a Cadence Spectre simulator. From the simulation results, we can see that the proposed MTJ/CMOS OR, AND, XOR, MUX, and full adder designs have 31.35%, 40.15%, 49.17%, 35.86%, and 42.62% lower power-delay-product, respectively, compared with the existing MTJ/CMOS designs. Furthermore, in this paper, we have also studied the usage of integrating nano-electronic devices, such as a carbon nanotube field-effect transistor and a Fin field-effect transistor, in the proposed circuits along with the MTJ devices. [ABSTRACT FROM AUTHOR]

In negative capacitance field-effect transistors (NCFETs), drain current may decrease with increasing ${V}_{\mathrm {ds}}$ in the saturation region, leading to negative differential resistance (NDR). While NDR is useful for oscillator design, it is undesirable for most analog circuits. On the other hand, the tendency toward NDR may be used to reduce the normally positive output conductance ( ${g}_{ \mathrm {ds}}$ ) of a short-channel transistor to a nearly zero positive value to achieve higher voltage gain. In this paper, we analyze the NDR effect for NCFET in the static limit and demonstrate that it can be engineered to reduce ${g}_{\mathrm {ds}}$ degradation in short-channel devices. Small and positive $g_{\mathrm{ ds}}$ is achieved without compromising the subthreshold gain, which is crucial for analog applications. The 7-nm ITRS 2.0 FinFET with 0.7 V ${V}_{\mathrm {dd}}$ is used as the baseline device in this paper. [ABSTRACT FROM AUTHOR]

In this paper, a p-channel vertical 4H-silicon carbide (SiC) MOSFET (SiC p-MOSFET) has been fabricated successfully for the first time as a potential candidate for the complementary inverter application. The static characteristics and the robustness, including short circuit and avalanche capabilities of the p-MOSFET, are experimentally tested. Moreover, the comparison between the p-MOSFET and similar rating n-MOSFET is carried out. The short-circuit capability is 15% higher than that of the n-channel MOSFET. Furthermore, this paper also provides the physical insights into the failure mechanism during the short-circuit transient of the p- and n-MOSFET. Meanwhile, an electro-thermal analytical model is proposed to explain the thermal distribution during this transient. Last, the avalanche withstand time of the fabricated SiC p-MOSFET is experimentally demonstrated to be 27% higher than that of the n-channel one. It is concluded that the SiC p-MOSFET could be a competitive power switch applicable for high-frequency complementary inverters. [ABSTRACT FROM PUBLISHER]

Conventionally, integrated drain-extended MOS (DeMOS) like high-voltage devices are designed while keeping only performance targets for a given application in mind. In this paper, for the first time, performance and reliability codesign approach using 3-D TCAD has been presented for various superjunction (SJ) type DeMOS devices. In this context, how to effectively utilize the SJ concept in a DeMOS device for System on Chip applications, which often has stringent switching and RF performance targets, is explored in detail in this paper. Moreover, design and reliability tradeoffs for switching and RF applications are discussed, while considering two unique sets, one with fixed breakdown voltage and other with fixed ON-resistance. Finally, hot carrier generation, safe operating area concerns, and electrostatic discharge physics are explored and compared using 3-D TCAD simulations. [ABSTRACT FROM PUBLISHER]

Double-gate devices, like independent-gate (IG) FinFET, have introduced new possibilities and challenges in synthesis of transistor networks. Existing factorization methods and graph-based optimizations are not actually the most effective way to generate optimized IG FinFET based networks because only reducing the number of literals in a given Boolean expression does not guarantee the minimum transistor count. This paper presents two novel methods aiming the minimization of the number of devices in logic networks. The first contribution is a method for defactoring Boolean expressions able to apply the conventional factorization algorithms together with IG FinFET particularities, so improving it. The second contribution is a novel graph-based method that improves even more transistor arrangements by exploiting enhanced nonseries-parallel associations. Experimental results shown a significant reduction in the size of transistor networks delivered by the proposed methods. [ABSTRACT FROM AUTHOR]

This paper studies the precoder design problem of achieving max-min fairness (MMF) amongst users in multigateway multibeam satellite communication systems with feeder link interference. We propose a beamforming strategy based on a newly introduced transmission scheme known as rate-splitting multiple access (RSMA). RSMA relies on multi-antenna rate-splitting at the transmitter and successive interference cancellation (SIC) at the receivers, such that the intended message for a user is split into a common part and a private part and the interference is partially decoded and partially treated as noise. In this paper, we formulate the MMF problem subject to per-antenna power constraints at the satellite for the system with imperfect channel state information at the transmitter (CSIT). We also consider the case of two-stage precoding which is assisted by on- board processing (OBP) at the satellite. Numerical results obtained through simulations for RSMA and the conventional linear precoding method are compared. When RSMA is used, MMF rate gain is promised and this gain increases when OBP is used. RSMA is proven to be promising for multigateway multibeam satellite systems whereby there are various practical challenges such as feeder link interference, CSIT uncertainty, per-antenna power constraints, uneven user distribution per beam and frame-based processing. [ABSTRACT FROM AUTHOR]

A fault tree (FT) defines an undesired top event, characterizing it using logic combinations of lower-level undesired events. In this paper, we focus on coherent FTs, i.e., the logic is restricted to AND/OR formulas. FT analysis is used to identify and assess the minimal cut sets (MCSs) of an FT, which define the minimal set of events leading to the undesired state. The dual of MCS is minimal path set (MPS). MCS and MPS are commonly used for qualitative evaluation of FTs in safety and reliability engineering. This paper explores computation of the MCS/MPS of an FT by means of structural analysis (namely, computation of minimal p -semiflows) of a Petri net (PN) that represents the FT. To this end, we propose a formal definition of a coherent FT and a transformation from this model to a PN subclass (namely, structurally persistent nets). We also prove the relationship between minimal p -semiflows and MCS/MPS in an FT. In addition, we propose an algorithm that uses linear programming techniques to compute the MCS/MPS in an FT. Finally, we put our findings into practice by qualitatively evaluating the FT of a pressure tank system. [ABSTRACT FROM PUBLISHER]

This paper investigates the impact of quantum capacitance on the intrinsic inversion-capacitance ( C\mathrm{ inv}) characteristics of high-mobility multigate III–V-on-insulator nMOSFETs through a numerical simulation corroborated by the theoretical calculation. Nonmonotonic C\mathrm{ inv} characteristics stemming from the energy dependence of 1-D density-of-states and significant C\mathrm{ inv} degradation due to quantum capacitance have been found in trigate In0.53Ga0.47As and InAs devices based on the ITRS 2018–2024 technology nodes. This paper indicates that, to compensate the excess inversion-charge ( Q\mathrm{ inv} ) loss due to quantum capacitance, the needed mobility gain of the trigate InGaAs and InAs devices (against the Si counterparts) should be at least $\sim 3\times $ and $\sim 4\times $ , respectively. This paper also suggests that the quantum-capacitance-induced Q\mathrm{ inv} loss can be mitigated by raising the fin aspect ratio of the III–V multigate device. [ABSTRACT FROM AUTHOR]

A novel plasma Charge Accumulative Model (pCAM) by calculating time-integrated Fowler–Nordheim (FN) tunneling charges and field of the gate dielectric in plasma processes is proposed in this paper. Our prior studies have developed and presented a quantitative FinFET plasma recording device by an effective fin-shaped field effect transistor (FinFET) contact-to-metal coupling structure to record and quantify plasma ion charges created in FinFET backend processes. In this paper, a precise analytical model is proposed to model the magnitude of plasma ion charges, time-integrated stressing field, and the criteria of the plasma process for optimum FinFET process technology. The new pCAM is highly matching with the measurement result of 16- and 7-nm FinFET wafers. The model can be adapted to practically estimate the plasma damage with different charge types, process parameters, and ion distribution; it can optimize the FinFET process and further understand the plasma damage mechanism in charging processes of 7-nm FinFET and beyond. [ABSTRACT FROM AUTHOR]

The dielectric screening property of a semiconductor is very crucial for the electrical characteristics of a MOSFET, and which can be described mathematically by Poisson equation via the permittivity. While the theory and experiments have corroborated the permittivity reduction of nanoscale Si, this paper studies the electrical characteristics of MOSFETs considering the reduced channel permittivity by quantum transport simulations. It is found that the channel permittivity reduction may mitigate the short-channel effects, showing subthreshold swing improvement and threshold voltage shift of MOSFETs in nanoscale. Compared to quantization effects, the positive and negative impacts of the channel permittivity reduction on the devices in particularly nanoscale have been investigated. This paper elucidates the necessity of considering semiconductor permittivity reduction for nanoscale device design and simulations. [ABSTRACT FROM AUTHOR]

This paper clarifies the correct transmission mechanism, misattributed in the previous research, of a hydrogenated amorphous silicon thin-film transistor (a-Si:H TFT) device. Complete drain current–gate voltage (${I}_{\text {D}}$ – ${V}_{\text {G}}$) transfer characteristics including the forward and backward gate sweeps (gate voltage carried out in the OFF-state $\to $ on-state and the ON-state $\to $ OFF-state) are performed, and the physics models of an energy-band schematic are clearly explained. This paper reveals that the ${I}_{\text {D}}$ – ${V}_{\text {G}}$ curve stretch-out behavior of the subthreshold region is due to the leakage of the Poole–Frenkel region. At the Poole–Frenkel regions, electrons transfer to the drain terminal, and holes remain in the valance band of the a-Si:H bulk. The remaining holes represent the positive voltage and cause the electron barrier height lowering. This causes an increase in subthreshold current of the subthreshold region. Finally, three experiments are performed to prove the correctness of these models, and the a-Si TFTs device improvement methods will be proposed to enhance the stability and performance of product of the a-Si TFTs. [ABSTRACT FROM AUTHOR]

In this paper, we propose a novel reconfigurable ferroelectric FET (R-FEFET), which can reconfigure its operation between volatile and nonvolatile modes during run-time by dynamically modulating its hysteresis. The R-FEFET comprises of two gates with ferroelectric (FE) in both the gate stacks. One of these terminals serves as a regular gate, while the other is used as a control to introduce reconfigurability. Employing Landau–Khalatnikov equation-based FEFET model, we extensively analyze the device characteristics in both FinFET and planar technologies. We show that by changing the control voltage between 0 and 1 V, the hysteresis width (HW) can be modulated between 1.1 and 0.3 V. In addition, we show the device characteristics and advantages that R-FEFETs possess to overcome the drawbacks encountered with gate leakage in standard FEFETs. The hold margins in the nonvolatile mode of R-FEFETs increase by ~ $10\times $ with respect to standard FEFETs, and the drive current strengths in the volatile mode show 13% improvements when compared to standard FETs. Using the proposed R-FEFETs, we examine a low-power nonvolatile memory design in Part II of this paper. [ABSTRACT FROM AUTHOR]

The instability of amorphous indium–gallium–zinc oxide (a-IGZO) thin-film transistors (TFTs) under ultraviolet (UV) light was thoroughly investigated in this paper. Unlike in a darkened state, an off-state leakage current can be found in the dual-sweep I–V transfer curve of a-IGZO TFTs under UV light illumination. Furthermore, despite the same UV light condition, the forward sweep and reverse sweep show different I–V curves, representing two different physical mechanisms. First, the subthreshold swing degradation and threshold voltage shift to the negative direction in the forward sweep are due to the total channel barrier lowering and can be confirmed by changing the light exposure region. Second, in the reverse sweep, the suggested back-channel leakage current can be controlled by dual-gate TFTs. UV light exposure of the metal–insulator–semiconductor–metal structure verifies that the off-state leakage current passes through the back channel in a reverse sweep. Finally, the physical mechanism links between forward and reverse sweeps have comprehensive interpretation in this paper. [ABSTRACT FROM AUTHOR]

This paper presents two main contributions toward efficient very large scale integration circuits mapped with simple cells: 1) a complete synthesis flow to provide good-quality circuits mapped only with simple cells; and 2) an area-oriented, level-aware buffering algorithm based on inverter trees to fix cell fanout violations. An effective pattern-based algorithm to identify XORs/XNORs on and-inverter graphs is also presented. We show that efficient implementations in terms of inverter count, transistor count, area, power, and delay can be generated from circuits with a reduced number of both simple cells and inverters, combined with XOR/XNOR-based optimizations. The proposed buffering algorithm can handle all unfeasible fanout occurrences, while: 1) optimizing the number of added inverters and 2) assigning cells to the inverter tree based on their level criticality. When comparing with academic and commercial approaches, we are able to simultaneously reduce the average number of inverters, transistors, area, power dissipation, and delay up to 48%, 4%, 8%, 14%, and 16%, respectively. [ABSTRACT FROM AUTHOR]

This paper is the first known composition to demonstrate the application of quintic splines in the development of a dual-gate MOSFET model based on the well-known drift-diffusion system of differential equations used in semiconductor analysis. The techniques and methodologies presented advance the current state of the art in this particular area by implementing improved 2-D numerical techniques and avoiding the use of common accuracy reducing assumptions to decrease semiconductor equation complexity and execution time. This results in a model that is valid in all regions of operation, includes Non-Quasi static transient behavior, accounts for short channel effects, and allows researchers to predict the real world manufacturing effects of gate oxide thickness imperfections and applied gate voltage disparities. Model validation was accomplished by comparing simulation results to previously published experimental data for long and short channel devices as well as data generated using an established commercial product. In addition, a subsequent paper submission is planned to demonstrate the application of this modeling method in determining frequency response for simple CMOS circuits. [ABSTRACT FROM AUTHOR]

We address the problem of reducing the size of Craig’s interpolants used in SAT-based model checking. Craig’s interpolants are AND-OR circuits, generated by post-processing refutation proofs of SAT solvers. Being highly redundant, their compaction is typically tackled by reducing the proof graph and/or by exploiting standard logic synthesis techniques. In this paper, we propose a set of ad-hoc logic synthesis functions that, revisiting known logic synthesis approaches, specifically address speed and scalability. Though general and not restricted to interpolants, these techniques target the main sources of redundancy in combinational circuits. This paper includes an experimental evaluation, showing the benefits of the proposed techniques, on a set of benchmark interpolants arising from hardware model checking problems. [ABSTRACT FROM AUTHOR]

In this paper, we propose a model for estimating short-channel effects (SCEs) in the shell-doped double-gate junctionless (JL) MOSFET. The main emphasis of this paper is to estimate SCEs by effectively capturing source/drain (S/D) extensions beyond the gate edges for different values of undoped core thickness (${T}_{\textsf {core}}$), shell doping (${N}_{\textsf {d}}$), gate length (${L}_{\textsf {g}}$), and gate (${V}_{\textsf {gs}}$) and drain (${V}_{\textsf {ds}}$) biases in subthreshold regime. The threshold voltage (${V}_{\textsf {th}}$), drain-induced barrier lowering and subthreshold swing (${S}$), extracted from transfer characteristics, are in good agreement with the simulation results. Results highlight the utility of shell doping and core thickness to provide an additional degree of freedom to control SCEs. The proposed model can be useful in estimating SCEs and optimizing core–shell JL architecture for low-power applications. [ABSTRACT FROM AUTHOR]

In this paper, the threshold voltage characteristics of silicon nanowire metal–oxide–semiconductor field-effect transistor (MOSFET) with a double-layer gate structure are presented. This type of device is considered to be the most promising application of nanodevice in ultralarge-scale integration, due to several advantages such as similar operation principle as the junctionless nanowire transistor, the screening effect of the upper gate (UG) to shield the lower gate MOSFETs from external electromagnetic disturbance, the tradeoff between the short channel and the thick-gate oxide layer, and the compatible fabrication process with the conventional MOS technology. In this paper, the relations of threshold voltage versus the gate length, the UG bias, the substrate bias, the drain bias, and the temperature are measured and analyzed. Moreover, the penetration effect of the UG electric field is proposed to interpret the short-channel characteristics of the device, and a piecewise curve model is presented to reveal the underlying physics of the relation of the threshold voltage versus the drain bias. The double-layer gate structure technology enables the design of many devices, such as small-signal analog circuit units, single-electron devices, and quantum bit cells. [ABSTRACT FROM AUTHOR]

The p-n junction is the fundamental building block for electronics and photonics applications. In a conventional p-n junction, the performance parameters cannot be tuned due to the fixed doping level after ion implantation. In this paper, reconfigurable p-n or n-p junctions were built based on the ambipolar black phosphorus (BP) and other 2-D materials, namely, graphene and hexagonal boron nitride (h-BN). High-quality graphene/h-BN/BP/h-BN sandwich device was created by the dry transfer method in an inert environment. Graphene serves as the local back gate, which can tune BP partially into either n-type or p-type material. The rest of the BP channel can be controlled by the back gate. The BP encapsulated device can enable the high performance of the ideality factor down to 1.08 (p-n junction) and 1.18 (n-p junction). The device developed in this paper has a more balanced ideality factor than previously reported reconfigurable WSe2 and BP devices. By tuning the back gate and graphene gate, the BP device can be tuned into four operational quadrants, namely, n-n, n-p, p-n, and p-p junctions. Moreover, the hole mobility of BP is up to 404 cm2/ $\text {V}\cdot \text {s}$ at room temperature. Our work shows that the BP heterostructure is very promising for high-speed reconfigurable logic functions and circuits. [ABSTRACT FROM AUTHOR]

This paper demonstrates a novel nanofabrication technology for producing high-density gated molybdenum (Mo) field-emitter array (FEA) based on modified nanosphere lithography (NSL). The arc-shaped side wall of gate apertures introduced by the conventional NSL process put obstacles in the formation of sharp cone-type emitters. In this paper, a two-method solution was employed to facilitate the realization of gate apertures with sharper cutting side wall which are beneficial for the formation of sharper gated Mo emitters. One method was softening nanosphere to enlarge the contact area between nanosphere and substrate. The other was optimizing gate film deposition conditions to dramatically reduce the diffraction effects. Due to the improvements in the geometrical shape of gated Mo emitters, a low-voltage working high-density gated Mo FEA was demonstrated in this paper. This is the first observation of remarkable electron emission from high-density gated Mo FEA fabricated using such as low-cost, high-throughput, and high-efficiency technique which is expected to substantially overcome the challenges in the traditional fabrication process and promotes the low-cost and large-area application of high-density gated field-emitter devices. In addition, the novel nanofabricating method is expected to offer a simple and scalable route which allows fabrication of many gated field-emission devices. [ABSTRACT FROM AUTHOR]

This paper demonstrates a high-performance black phosphorus nanoribbons field-effect transistor (BPNR-FET) and systematically investigates methods for enhancing its anisotropic carrier transport. The BPNR-FET shows a strong dependence on crystal orientation in which the best mobility performance is achieved in armchair-oriented nanoribbons. A downscaling of nanoribbon width is shown to improve the short-channel effect owing to a better electrostatic gate control. Furthermore, hydrogenation is employed to effectively passivate the dangling bonds and heal the nanoribbon edge defects, leading to nearly hysteresis-free transfer properties. By virtue of bandgap and contact-metal workfunction engineering, n-type BPNR-FET is successfully demonstrated, which enables complementary inverter circuits to be simultaneously realized. This paper unravels the superior performance underscores a conceptually new BPNR-FET, paving the way toward the development of non-planar devices and integrated circuits based on 2-D materials platform. [ABSTRACT FROM AUTHOR]

This paper proposes a semianalytical model to estimate short-channel effects for independent gate operation in double-gate (DG) junctionless (JL) MOSFET incorporating gate-to-source/drain underlap, through the solution of Poisson’s equations in the subthreshold regime. The model also accounts for the asymmetry in device operation through variation in gate oxide thicknesses, gate work functions, and underlap lengths. Subthreshold drain current, threshold voltage, and subthreshold swing, evaluated from the channel potential, show reasonable agreement with simulation data. Results suggest the use of negative back gate bias and longer underlap length to reduce off-current. This paper highlights the role of doping, underlap length, and back gate bias in tuning the threshold voltage. This model serves as a generic formulation (within limits) with different asymmetries to estimate, design, and optimize self-aligned DG JL transistors for subthreshold logic applications. [ABSTRACT FROM AUTHOR]

This paper reports on the design optimization of double gate (DG) tunnel FET (TFET) for dynamic memory applications in sub-100-nm regime. It is shown that incorporation of lateral spacing ( L_ \text gap) between the gates, and an underlap region ( L\text {un}) between drain and back gate reduces state “0” degradation, which along with optimal biases, results in an improved Retention Time (RT) at 85 °C. The systematic design optimization increases RT from ~80 to ~300 ms with the use of L\text {gap} at 85 °C, which can be further improved to ~600 ms with the introduction of L\text {un} . The careful investigation shows the back gate scaled down to 25 nm with a front gate region of 100 nm, and operation even at elevated temperatures (125 °C). The insights into DG TFET DRAM operation in terms of individual as well as total lengths highlights the RT enhancement by a factor of 3 with constant total length (200 nm) and an improved scalability with total length scaled down to 160 nm. This paper provides new opportunities to realize TFET-based DRAM with improved RT, scalability, and high temperature operation. [ABSTRACT FROM PUBLISHER]

Superjunction has arguably been the most creative and important concept in the power device field since the introduction of the insulated gate bipolar transistor (IGBT) in the 1980s. It is the only concept known today that has challenged and ultimately proved wrong the well-known theoretical study on the limit of silicon in high-voltage devices. This paper deals with the history, device and process development, and the future prospects of Superjunction technologies. It covers fundamental physics, technological challenges as well as aspects of design and modeling of unipolar devices, such as CoolMOS. The superjunction concept is compared to other methods of enhancing the conductivity of power devices (from bipolar to employment of wide-bandgap materials) to derive its set of benefits and limitations. This paper closes with the application of the superjunction concept to other structures or materials, such as terminations, superjunction IGBTs, or silicon carbide Field Effect Transistors (FETs). [ABSTRACT FROM AUTHOR]

Tunnel FETs (TFETs) have been identified as the most promising steep slope devices for ultralow power logic circuits. In this paper, we demonstrate in-plane InAs/Si TFETs monolithically integrated on Si, using our recently developed template-assisted selective epitaxy approach. These devices represent some of the most scaled TFETs with dimensions of less than 30 nm, combined with excellent aggregate performance with average subthreshold swing (SS), of around 70 mV/decade combined with I\mathrm{\scriptscriptstyle ON} of a few \mu \textA / \mu \textm for |V\mathrm {\mathbf {DS}}| = |V\mathrm {\mathbf {GS}}| = 0.5 V. Here, we will discuss the device fabrication as well as the experimental electrical data. Extensive low temperature characterization and activation energy analysis is used to gain insights into the factors limiting device performance. Combined with the simulation study presented in part 2 of this paper, this will elucidate how traps are ultimately limiting the SS. [ABSTRACT FROM AUTHOR]

In a relational database, tuples are called “duplicate” if they describe the same real-world entity. If such duplicate tuples are observed, it is recommended to remove them and to replace them with one tuple that represents the joint information of the duplicate tuples to a maximal extent. This remove-and-replace operation is called a fusion operation. Within the setting of a relational database management system, the removal of the original duplicate tuples can breach referential integrity. In this paper, a strategy is proposed to maintain referential integrity in a semantically correct manner, thereby optimizing the quality of relationships in the database. An algorithm is proposed that is able to propagate a fusion operation through the entire database. The algorithm is based on a framework of first and second order fusion functions on the one hand, and conflict resolution strategies on the other hand. It is shown how classical strategies for maintaining referential integrity, such as delete cascading, are highly specialized cases of the proposed framework. Experimental results are reported that (i) show the efficiency of the proposed algorithm and (ii) show the differences in quality between several second order fusion functions. It is shown that some strategies easily outperform delete cascading. [ABSTRACT FROM PUBLISHER]