23 results on '"Akira Kurokawa"'
Search Results
2. Surface-Treatment Methods Using Ozone
- Author
-
Akira Kurokawa
- Subjects
Surface (mathematics) ,chemistry.chemical_compound ,Ozone ,Materials science ,chemistry ,Environmental chemistry ,Treatment method ,General Materials Science ,Surfaces and Interfaces ,Instrumentation ,Spectroscopy - Published
- 2013
3. Production and Applications of Metal-cluster-complex Ion Beams
- Author
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Akira Kurokawa, Kouji Kondou, Toshiyuki Fujimoto, Kouji Watanabe, Hiroshi Itoh, Yukio Fujiwara, Shingo Ichimura, Naoaki Saito, Yoshikazu Teranishi, Mitsuhiro Tomita, and Hidehiko Nonaka
- Subjects
Silicon ,Ion beam mixing ,Analytical chemistry ,chemistry.chemical_element ,Surfaces and Interfaces ,Ion source ,Ion ,Secondary ion mass spectrometry ,Ion beam deposition ,chemistry ,Sputtering ,General Materials Science ,Irradiation ,Instrumentation ,Spectroscopy - Abstract
A new ion source using massive molecules called metal cluster complexes has been developed. Metal cluster complexes are chemically-synthesized organometallic compounds, which have a wide range of chemical compositions with high molecular weight. The ion source is compact enough to be installed in commonly used secondary ion mass spectrometry (SIMS) systems. Using the ion source, sputtering characteristics of silicon bombarded with normally incident Ir4(CO)7+ ions were investigated. Experimental results showed that the sputtering yield at 10 keV was 36, which is higher than that with Ar+ ions by a factor of 24. In addition, SIMS analyses of boron-delta-doped silicon samples and organic films of poly(methyl methacrylate) (PMMA) were performed. Compared with conventional O2+ ion beams, Ir4(CO)7+ ion beams improved depth resolution by a factor of 2.5 at the same irradiation conditions; the highest depth resolution of 0.9 nm was obtained at 5 keV, 45° with oxygen flooding of 1.3×10-4 Pa. Furthermore, experimental results confirmed that Ir4(CO)7+ ion beams significantly enhanced secondary ion intensity in high-mass region.
- Published
- 2009
4. Ozone Concentration Measurement of O2-O3 Binary Gas with Two Types of Pressure Gauges
- Author
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Takichi Kobayashi, Shingo Ichimura, Akira Kurokawa, Hisao Hojyo, and Sonoko Tsukahara
- Subjects
Ozone ,Atmospheric pressure ,Analytical chemistry ,Thermodynamics ,Binary number ,Condensed Matter Physics ,Capacitance ,Surfaces, Coatings and Films ,law.invention ,Viscosity ,chemistry.chemical_compound ,Pressure measurement ,chemistry ,law ,Electrical and Electronic Engineering ,Quartz ,Crystal oscillator - Abstract
A concentration measuring method for a binary gas system, which was based on the viscosity measurement, was investigated. The method utilizes two types of pressure gauges, a capacitance manometer which depends just on pressure and a quartz friction pressure gauge which depends on both viscosity and pressure of a binary gas. The concentration of the binary gas can be estimated from the viscosity because the viscosity is given as a function of concentration of the binary gas. Firstly we applied the pressures-observing system to evaluate concentration of ozone in an O3/O2gas mixture. The results indicated that this method allows a concentration measurement of ozone with an accuracy ofΔ Cozone = 0.2 vol%, near atmospheric pressure. Secondly, we used an impedance measurement system of a quartz oscillator and we estimated the accuracy at Δ Cozone=0.05 vol%.
- Published
- 2004
5. Development of Partial Pressure Gauge for Silane-Hydrogen Gas Mixtures Used for Production of Thin Film Silicon Solar Cell Materials
- Author
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Akira Kurokawa, Takuya Matsui, Atsushi Suzuki, Michio Kondo, and Takehiko Nagai
- Subjects
Silicon ,Hydrogen ,chemistry.chemical_element ,Surfaces and Interfaces ,Partial pressure ,Silane ,law.invention ,Viscosity ,chemistry.chemical_compound ,Pressure measurement ,chemistry ,Chemical engineering ,law ,General Materials Science ,Thin film ,Instrumentation ,Quartz ,Spectroscopy - Abstract
A partial pressure gauge was developed with a quartz sensor to measure partial pressures of silane and hydrogen gases in gas mixtures, which are used as the sources of thin film silicon solar cells. The partial pressures were derived from the dependencies on viscosity and molecular weight of these mixtures, which can be measured using the quartz sensor. The partial pressure gauge developed based on this principle measured partial pressures of silane and hydrogen in gas mixtures for 133-1,333 Pa and 0, 20, 40, 60, 80, and 100vol.% silane with resolution of 0.01vol.% for gas mixtures including over 20% silane partial pressures, which are typical preparation conditions for thin film silicon solar cell materials. This pressure gauge can be used in practical application to measure the partial pressures of silane and hydrogen in mixtures.
- Published
- 2012
6. Comparison of Pressure Dependence between the Frequency Change and the Impedance Change of a Quartz Crystal Oscillator Vibrating in the Viscous-Flowing Gas
- Author
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Takichi Kobayashi, Hisao Hojo, and Akira Kurokawa
- Subjects
Condensed matter physics ,Chemistry ,Thermodynamics ,General Materials Science ,Surfaces and Interfaces ,Pressure dependence ,Instrumentation ,Electrical impedance ,Crystal oscillator ,Spectroscopy - Published
- 2011
7. [Untitled]
- Author
-
Akira Kurokawa
- Subjects
chemistry.chemical_compound ,Ozone ,Materials science ,chemistry ,Electrical and Electronic Engineering ,Condensed Matter Physics ,Photochemistry ,Silicon oxidation ,Surfaces, Coatings and Films - Published
- 2001
8. Measurement of Binary Gas Concentration with Quartz Gauge
- Author
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Hisao Hojyo, Hidehiko Nonaka, Shingo Ichimura, and Akira Kurokawa
- Subjects
Explosive material ,Chemistry ,Analytical chemistry ,Thermodynamics ,Partial pressure ,Condensed Matter Physics ,Capacitance ,Surfaces, Coatings and Films ,law.invention ,Viscosity ,Pressure measurement ,law ,Fugacity ,Wet gas ,Electrical and Electronic Engineering ,Compressibility factor ,Astrophysics::Galaxy Astrophysics - Abstract
To measure concentration of binary mixture gas we developed a new method that uses a Quartz gauge together with a capacitance manometer. Because a Quartz gauge's sensor is sensitive to both gas viscosity and gas pressure while a capacitance manometer is just sensitive to gas pressure, the viscosity of the gas can be estimated from pressure indication from both the gauges. If the gas is binary mixture gas and the viscosity of the gas changes monotonically with the concentration, the pressure deviation will give the concentration of binary mixture gas. This method has several merits. One is that we can apply to explosive gases because the sensors do not have any source to ignite such as a heated wire, an energetic light, and an electron source. The other is that because of no source to decompose the gas, this method does not change the concentration of the sample gas after the measurement. Then it is not necessary to discard the sampled gas, and consequently the effective amount of the sample is negligible.
- Published
- 2001
9. A New Ozone Decomposition Method Using Redox Reactions of Transition Metals
- Author
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Yoshiki Morikawa, Masaharu Miyamoto, Tetsuya Nishiguchi, Akira Kurokawa, Shingo Ichimura, and Hidehiko Nonaka
- Subjects
chemistry.chemical_compound ,Ozone ,Transition metal ,chemistry ,Inorganic chemistry ,Decomposition method (queueing theory) ,Electrical and Electronic Engineering ,Condensed Matter Physics ,Photochemistry ,Redox ,Surfaces, Coatings and Films - Published
- 2001
10. [Untitled]
- Author
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Satoshi KUROKOUCHI, Masayuki OKABE, Mitsuyoshi SAITO, Shinsaku MORITA, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Seiichiro KANNO, Tatehito USUI, Koichi SUDOH, Tatsuo YOSHINOBU, Hiroshi IWASAKI, Hiroaki TANAKA, Kimio OKUNO, Tadao MIURA, Touru SUMIYA, Katsuya HONDA, Shun-ichiro TANAKA, Yukio INOKUTI, Kazuhiro SUZUKI, Nastuki TAKAHASHI, Osamu OHKUBO, Yoshihiro SAWAHIRA, Akishige SATO, Naoto KIKUCHI, Eiji KUSANO, Hidehito NANTO, Akira KINBARA, Tetsuya NARUSHIMA, Akiko ITAKURA, Takaya KAWABE, Masahiro KITAJIMA, Masaru KITAGAWA, Toshiyuki OHYA, Hiroyuki NAGAHAMA, Sei-ichiroh YOKOYAMA, Ichiro ARAKAWA, Takashi ADACHI, Takato HIRAYAMA, Koichiro MITSUKE, Makoto SAKURAI, Sin-ichi IGARASHI, Yukiko ABE, Yasuo IRIE, Miyuki KAMBE, Aki TOSAKA, Satoko HAMAMATSU, Satoshi ISHII, Yoshiyuki NORIMITSU, Toshimi SUTOU, Noriyuki UBUKATA, Yoshihiro OINUMA, Shigeru SAITO, Masaaki KATOH, Kenichi TAJIMA, Daisuke HORIMOTO, Takeo OHTE, Akira KOJIMA, Seiya OHI, Takashi SHIOYA, Kazuhiko KOBAYASHI, Hidefumi NAKAJIMA, Satoshi YOKOYAMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Koichiro UCHIMURA, Hitoshi TABATA, Tomoji KAWAI, Yutaka HIBINO, Guochun XU, Yasuo SUZUKI, Masao TANIHARA, Yukio IMANISHI, Shigemi SUGINUMA, Masahiro HIRATA, Hitoshi AKIMICHI, Kyoko TAKEUCHI, Yutaka TUZI, Masahiro TOSA, Akira KASAHARA, Kyung Sub LEE, Kazuhiro YOSHIHARA, Tomonari TANAKA, Tadashi SAWADA, Wataru SUGIYAMA, Koyu OTA, Daisuke YAMAUCHI, Shinobu SATO, Masatoshi TANAKA, Masaaki KISHIDA, Masahiko TOMITORI, Kiyotaka ASAKURA, Wang-Jae CHUN, Yasuhiro IWASAWA, Kiminori KAKITANI, Hiroko KAJI, Yoichiro YAGI, Akio YOSHIMORI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Shigeaki NAKAMURA, Nobuo SAITO, Shoji YOSHIOKA, Isamu NAKAAKI, Hideo HASEGAWA, Toshiyuki MIHARA, Shoichi MOCHIZUKI, Shigeharu TAMURA, Hironori KOBAYASHI, Ryoji MAKABE, Tadashi ISHIDA, Yoshiyuki SATO, Masanori ANDO, Tetsuhiko KOBAYASHI, Ayako HIOKI, Kazuki NATSUKAWA, Koji INOUE, Yoshikazu NAKAYAMA, Takayuki SATO, Shinichiro MICHIZONO, Yoshio SAITO, Shinichi KOBAYASHI, Kiyohide KOKUBUN, Yuuki WATANABE, Heizo TOKUTAKA, Kikuo FUJIMURA, Tatsuo SHIMIZU, Yasushiro NISHIOKA, Hideki TANAKA, Hiroyuki WAKIMOTO, Toshihiko MIYAZAKI, Goro MIZUTANI, Sukekatsu USHIODA, Yoshitake YAMAGUCHI, Satoru TAKAKUSAGI, Makoto KATO, Yuji SAKAI, Akira KUROKAWA, Shingo ICHIMURA, Ken NAKAMURA, Takanori AOKI, Syogo TODA, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Kazuaki HAMAJI, Yoshiharu KAKEHI, Tsutom YOTSUYA, Norihiro MATSUOKA, Yoshitsugu TSUTSUMI, Hideki TOMIOKA, Yoshio OKAMOTO, Kensuke MURAI, Masato YASUMOTO, Norimasa UMESAKI, Hirohiko NAKANO, Toshiaki TATSUTA, Jiro MATSUO, Isao YAMADA, Hiroyuki MAGARA, Osamu TABATA, Touichi HATANO, Masatoshi KOTERA, Kiyoshi YAMAGUCHI, Naohiro HORII, Kunio OKIMURA, Akira SHIBATA, Hiroshi MURAKAMI, Ikuya KAMEYAMA, Satoru SUKENOBU, Kazuhiko MIMOTO, Takashi MATSUMOTO, Takafumi YOSHIKAWA, Masato KIUCHI, Seiichi GOTO, Masatoshi OHBA, Yoshiaki AGAWA, Kazuma SHIBUTANI, Hiroshi TSUJI, Yasuhito GOTOH, Junzo ISHIKAWA, Hiroki KAWADA, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masanori KATSUYAMA, Shinichi SUZUKI, Katsuto TANAHASHI, Yuichi KAWAMURA, Naohisa INOUE, Yoshikazu HOMMA, Michimasa KIKUCHI, Kazumasa ISHIKAWA, Teiichi HOMMA, Yoshinori SUGANUMA, Nan LI, Katsuyoshi KOBAYASHI, Nobuyoshi SAKAKIBARA, Yoshiki UENO, Masayuki AOKI, Toshiaki YASUI, Keito MORIMOTO, Hirokazu TAHARA, Takao YOSHIKAWA, Hidekazu KODERA, Masahiko UOTA, Yoshihiro SATOH, Tomio KUBO, Kozo MOCHIJI, Naoshi ITABASHI, Hiroshi SHIMIZU, Shunsuke OHTANI, Kazuhiko OKUNO, and Nobuo KOBAYASHI
- Subjects
Electrical and Electronic Engineering ,Condensed Matter Physics ,Surfaces, Coatings and Films - Published
- 1999
11. XRR Analysis of the Transition Layer in SiO2 Thin Film Formed on Si Surface
- Author
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Tosiyuki Fujimoto, Kenji Odaka, Akira Kurokawa, and Yasushi Azuma
- Subjects
Ozone ,Materials science ,Silicon dioxide ,Oxide ,Analytical chemistry ,Substrate (electronics) ,Condensed Matter Physics ,Surfaces, Coatings and Films ,X-ray reflectivity ,chemistry.chemical_compound ,chemistry ,Transition layer ,Electrical and Electronic Engineering ,Thin film ,Reflectometry - Abstract
To develop nanometric film thickness standard (FTSs), uniformity of silicon dioxide thin film were investigated by X-ray Reflectometry (XRR). The samples we investigated were thermally grown oxides (O2-Oxides) and ozone-formed oxide(Ozone-Oxide). The O2-oxide were grown on Si(100) substrate at 1000°C and at 700°C. The Ozone-Oxide was grown at 750°C with the highly concentrated ozone gas. With XRR method the bulk-layer density of oxide films were analyzed for; the O2-Oxide formed at 700°C (D700), the O2-Oxide formed at 1000°C(D1000), and the Ozone-Oxide formed at 750°C (Dozone750). We also analyzed the transition-layer density of the O2-Oxide formed at 700°C (DTL700). The results showed the relation was D1000
- Published
- 2007
12. Gas Analysis for Plasmas using a Quartz Sensor
- Author
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Akira Kurokawa, Hidehiko Nonaka, and Atsushi Suzuki
- Subjects
Spectrometer ,Analytical chemistry ,Partial pressure ,Condensed Matter Physics ,Mass spectrometry ,Surfaces, Coatings and Films ,Triple quadrupole mass spectrometer ,chemistry.chemical_compound ,chemistry ,Gas composition ,Electrical and Electronic Engineering ,Quadrupole mass analyzer ,Carbon monoxide ,Hybrid mass spectrometer - Abstract
Our partial pressure measurement for a binary gas with a quartz sensor can be applied to plasmas. In this study, the Q-sensor outputs, which depend on pressure, molecular weight and viscosity of gases, were compared to the results by gas analysis with a quadrupole mass spectrometer (QMS). For H2 plasmas, the Q-sensor outputs changed when discharges were turned on and off. On the other hand, the results from mass spectroscopy by the QMS showed the degas of carbon monoxide (CO) during the discharges. Since the changes of the Q-sensor outputs correspond to the CO production above, it can be concluded that the Q-sensor measurements can detect the gas composition changes in the plasmas, thereby, can be used as a simple gas analysis method compared to a conventional mass spectrometer.
- Published
- 2007
13. [Untitled]
- Author
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Michio MINATO, Yoshio ITOH, Shingo ICHIMURA, Kiyohide KOKUBUN, Masahiro HIRATA, Sonoko TSUKAHARA, Kazuya SAITO, Yoshinao IKEDA, Yoshio SAITO, Kowashi WATANABE, Hiroshi SAEKI, Mitsuhiro MASAKI, Yasuaki SUZUKI, Yukiko TANIUCHI, Takashi NODA, Michio MAENO, Suck Hee BE, Haruo OHKUMA, Masahiro TOSA, Akira KASAHARA, Kazuhiro YOSHIHARA, Seiichiro KANNO, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masaaki NAKAYAMA, Hitoshi NISHIMURA, Kenji SHIRAI, Shinichi KOBAYASHI, Norio OGIWARA, Keiichi OHIRA, Takayuki SATO, Shinichiro MICHIZONO, Shigemi SUGINUMA, Migaku TAKAHASHI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Kazuhiko KOBAYASHI, Masatoshi NOGUCHI, Hidefumi NAKAJIMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Hideo HASEGAWA, Yukio INOKUTI, Kazuhiro SUZUKI, Osamu OHKUBO, Natsuki TAKAHASHI, Masayuki TERAI, Norichika HASEGAWA, Masahiko OKUZAWA, Chuhei OSHIMA, Shigeki OTANI, Kenji ODAKA, Osamu SATOH, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Kenya AKAISHI, Kazuhiro EZAKI, Yusuke KUBOTA, Osamu MOTOJIMA, Masakatsu KITANI, Akira KUROKAWA, Hiroko KAJI, Kiminori KAKITANI, Yoichiro YAGI, Akio YOSHIMORI, Takanori AOKI, Shogo TODA, Kazuaki HAMAJI, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Daisuke TANAKA, Takeshi FUJIWARA, Mituaki MAEDA, Nobuhiko TAKEHARA, Mitsutaka HIKIDA, Yasuhiro IGASAKI, Akishige SATO, Masaru KITAGAWA, Yasunobu KURODA, Eiji KUSANO, Akira KINBARA, Taizo KAWAUCHI, Katsuyuki FUKUTANI, Tatsuo OKANO, Shunji KISHIMOTO, Xiaowei ZHANG, Toyosei KAWASAKI, Daisuke SAKAI, Hiroshi ITOH, Takeo ICHINOKAWA, Toshuu AN, Hiroshi KUBO, Yasuhito GOTOH, Hiroshi TSUJI, Junzo ISHIKAWA, Youiti YAMAMOTO, Toshiaki MIYOKAWA, Nobuaki TAMURA, Tadao MIURA, Touru SUMIYA, Haruko FUJINUMA, Shun-ichiro TANAKA, Hiroyuki YOSHIKI, Teruhiko TSUTSUI, Tetsu OKAMOTO, Seiichi WATANABE, Yukio OKAMOTO, Hiroki KAWADA, Kaoru IJIMA, Seigi MIZUNO, Saburo SHIMIZU, Koh FUWA, Seiji SEKI, Kazunobu HAYAKAWA, Heizo TOKUTAKA, Kazuyuki IWAMOTO, Kikuo FUJIMURA, Toru WATANABE, Satoru KISHIDA, Ken NAKAMURA, Yoshiyuki IGARI, Shinji ISHIDZUKA, Tetsuroh MINE, Tsuyoshi TAKAOKA, Tomohide TAKAMI, Isao KUSUNOKI, Akira HAYAMA, Kazuyoshi IMOTO, Takato HIRAYAMA, Ichiro ARAKAWA, Takashi ADACHI, Koichiro MITSUKE, Makoto SAKURAI, Takashi MOMOSE, Eishuu HAYASAKA, Katsuhiro SAITOU, Katsuya NAGAYAMA, Sin'ya ABE, Kunio OKIMURA, Naoki YASUMARU, Yukiko ABE, Sin-ichi IGARASHI, Yasuo IRIE, Katsumi SUZUKI, Eiji ROKUTA, Tomohiro HAYASHI, Atsushi ITO, Toshio SAKURAI, Masuaki MATSUMOTO, Natsuo TATSUMI, Tadashi ITOYAMA, and Masaomi UMEZAWA
- Subjects
Electrical and Electronic Engineering ,Condensed Matter Physics ,Surfaces, Coatings and Films - Published
- 1998
14. Development of a Time-of-flight Mass Spectrometer Equipped with a Superconducting-tunnel-junction Ion Detector
- Author
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Naoaki Saito, Tomoya Kinumi, Masataka Ohkubo, A. Kushino, Akira Kurokawa, Takeshi Mizota, Masahiro Ukibe, Shingo Ichimura, and Yasushi Shigeri
- Subjects
Spectrometer ,Physics::Instrumentation and Detectors ,business.industry ,Chemistry ,Condensed Matter Physics ,Mass spectrometry ,Surfaces, Coatings and Films ,Secondary ion mass spectrometry ,Time of flight ,Condensed Matter::Superconductivity ,Superconducting tunnel junction ,Optoelectronics ,Electrical and Electronic Engineering ,Atomic physics ,business ,Quadrupole mass analyzer ,Hybrid mass spectrometer ,Gas chromatography ion detector - Abstract
We have started the development of a new time-of-flight mass spectrometer equipped with Nb/Al superconducting-tunnel-junction detectors. Metal cluster ions were employed to investigate the properties of the superconducting ion detectors. In addition to mass spectroscopy with wide mass range, we have performed impact energy measurement, which enables charge-state discrimination.
- Published
- 2005
15. Influence of Temperature and Humidity on Partial Pressure Measurement using Dual Pressure Gauges
- Author
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Shingo Ichimura, Akira Kurokawa, Hidehiko Nonaka, and Atsushi Suzuki
- Subjects
Hydrogen ,Chemistry ,chemistry.chemical_element ,Humidity ,Thermodynamics ,Partial pressure ,Condensed Matter Physics ,Surfaces, Coatings and Films ,law.invention ,Apparent temperature ,Pressure measurement ,Critical relative humidity ,law ,Relative humidity ,Density of air ,Physics::Chemical Physics ,Electrical and Electronic Engineering ,Physics::Atmospheric and Oceanic Physics - Abstract
Taking into account the utilization of partial pressure measurement under various temperatures and humidity, their influence on this measurement with a capacitance manometer and a quartz friction pressure gauge (Q-gauge) is studied. With increasing humidity, a Q-gauge pressure reading, calibrated by air gas, decreases as well as when the hydrogen leakage is detected. To avoid this error by humidity for the hydrogen sensing, we tried to compensate influence of humidity using a humidity coefficient which is calculated from the humidity dependence of the Q-gauge pressure reading at constant temperature, and suppressed to one-fifth of the fluctuation of the Q-gauge pressure reading background due to humidity change. Regarding to influence of temperature on the Q-gauge pressure reading, it is calibrated by the temperature dependence at low humidity. Finally, influences of temperature and humidity on the hydrogen sensing can be reduced by the calculation below the reading by 0.6 at.% of hydrogen gas.
- Published
- 2005
16. Hydrogen Gas Sensing using Two Type of Pressure Gauges
- Author
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Atsushi Suzuki, Hidehiko Nonaka, Shingo Ichimura, and Akira Kurokawa
- Subjects
Detection limit ,Leak ,Hydrogen ,Analytical chemistry ,chemistry.chemical_element ,Condensed Matter Physics ,Pressure sensor ,Capacitance ,Surfaces, Coatings and Films ,law.invention ,Volumetric flow rate ,Pressure measurement ,chemistry ,law ,Physics::Atomic Physics ,Electrical and Electronic Engineering ,Leakage (electronics) - Abstract
For safety hydrogen sensing, the pressure measurement with a capacitance manometer and a quartz friction pressure gauge (Q-gauge) were investigated. Q-gauge pressure reading decreases when hydrogen gas is introduced into air supplied from atmosphere without any change of pressure measured by a capacitance manometer. This result indicates that the present pressure measurement using two pressure gauges is possible to detect the hydrogen leakage into air. In addition, a decrease of Q-gauge pressure reading correlates with a flow rate of the hydrogen gas, and increases with hydrogen concentration in air. Then it was shown that the low detection limit of hydrogen concentration is below 1%. Response time for hydrogen introduction is faster than 30 seconds, which meets the requirements for the hydrogen gas leak sensor. As above, the present safe pressure measurement using a capacitance manometer and a Q-gauge is satisfactorily useful for the hydrogen gas leak sensing.
- Published
- 2005
17. Instrument for Creating Surface Layer Structure and for in-situ Layer Observation with Surface Electron Spectroscopic Tomography
- Author
-
Yoshio Saitoh, Akira Kurokawa, Joseph Toth, Jae In Jeong, Shingo Ichimura, Kazuhiro Yoshihara, and Yoshihiro Satoh
- Subjects
Surface (mathematics) ,In situ ,Materials science ,business.industry ,Electron ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Optics ,Optoelectronics ,Surface layer ,Tomography ,Electrical and Electronic Engineering ,business ,Layer (electronics) - Published
- 1995
18. Mass Dependence of Detection Efficiency in a Time-of-flight Analysis of Photoions by Laser Ionization
- Author
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Shingo Ichimura, Shigeyuki Sekine, Hazime Shimizu, Akira Kurokawa, and Kiyohide Kokubun
- Subjects
Time of flight ,Materials science ,law ,Ionization ,Analytical chemistry ,Electrical and Electronic Engineering ,Atomic physics ,Condensed Matter Physics ,Laser ,Surfaces, Coatings and Films ,Atmospheric-pressure laser ionization ,law.invention - Published
- 1994
19. Summary Abstract
- Author
-
Shu WATANABE, Masakazu AONO, Shigeki KATO, Hitoshi AKIMICHI, Tomonari TANAKA, Kyoko TAKEUCHI, Yutaka TUZI, Ichiro ARAKAWA, Nobuaki GOTOH, Takashi MOMOSE, Hajime ISHIMARU, Ron PAITICH, Shingo ICHIMURA, Shigeyuki SEKINE, Kiyohide KOKUBUN, Akira KUROKAWA, Hazime SHIMIZU, Keiko TERADA, Mitsuyasu NAKAYAMA, Tatsuo OKANO, Yutaka MATSUI, Hiroki OHZORA, Minsheng XU, Masahiro TOSA, Akiko ITAKURA, Masaaki HARADA, Kazuhiro YOSHIHARA, Masaharu MIKI, Katsujiro ITOH, Nobuyoshi ENOMOTO, Yixin YANG, Kazuya SAITOH, Sonoko TSUKAHARA, and Fumio WATANABE
- Subjects
Electrical and Electronic Engineering ,Condensed Matter Physics ,Surfaces, Coatings and Films - Published
- 1994
20. Production of Active Oxygen by Ion Source
- Author
-
Shingo Ichimura, Hug. J. Kan, Hiroshi Murakami, Akira Kurokawa, and Ken Nakamura
- Subjects
Active oxygen ,Chemistry ,Inorganic chemistry ,Production (economics) ,Electrical and Electronic Engineering ,Condensed Matter Physics ,Ion source ,Surfaces, Coatings and Films - Published
- 1997
21. Observation of Si Surface with Instrument for Electron Spectroscopic Tomography
- Author
-
Shingo Ichimura and Akira Kurokawa
- Subjects
Surface (mathematics) ,Materials science ,Analytical chemistry ,Tomography ,Electron ,Electrical and Electronic Engineering ,Condensed Matter Physics ,Molecular physics ,Surfaces, Coatings and Films - Published
- 1997
22. Comparison of the Counting Efficiencies of an Imaging Counter and an Electric-pulse Counter
- Author
-
Akira Kurokawa, Akira Iwasaki, Shingo Ichimura, and Shigeyuki Sekine
- Subjects
Optics ,Materials science ,business.industry ,Electrical and Electronic Engineering ,Electric pulse ,Condensed Matter Physics ,business ,Surfaces, Coatings and Films - Published
- 1996
23. Pressure Measurement in XHV Region Using Nonresonant Multiphoton Ionization by Picosecond Pulsed Laser
- Author
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Shingo Ichimura, Akira Kurokawa, Hazime Shimizu, Shigeyuki Sekine, and Kiyohide Kokubun
- Subjects
Range (particle radiation) ,Picosecond pulsed laser ,Chemistry ,business.industry ,Condensed Matter Physics ,Laser ,Surfaces, Coatings and Films ,law.invention ,Atmospheric-pressure laser ionization ,Optics ,Pressure measurement ,law ,Picosecond ,Ionization ,Electrical and Electronic Engineering ,Atomic physics ,business ,Order of magnitude - Abstract
By means of nonresonant multiphoton ionization using a picosecond pulsed YAG laser, pressure measurement for H2, CO and CO2 gases was carried out in the XHV pressure range. It was experimentally verified that pressure measurement was possible in the range of 10-11 Pa, and this pressure measurement method had pressure sensitivity of the same order of magnitude for the three molecules.
- Published
- 1994
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