1. Momentum matching and band-alignment type in van der Waals heterostructures: Interfacial effects and materials screening
- Author
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Zhang, Yue-Jiao, Ren, Yin-Ti, Lv, Xiao-Huan, Zhao, Xiao-Lin, Yang, Rui, Wang, Nie-Wei, Jin, Chen-Dong, Zhang, Hu, Lian, Ru-Qian, Gong, Peng-Lai, Wang, Rui-Ning, Wang, Jiang-Long, and Shi, Xing-Qiang
- Subjects
Condensed Matter - Materials Science - Abstract
Momentum-matched type II van der Waals heterostructures (vdWHs) have been designed by assembling layered two-dimensional semiconductors (2DSs) with special band-structure combinations - that is, the valence band edge at the Gamma point (the Brillouin-zone center) for one 2DS and the conduction band edge at the Gamma point for the other [Ubrig et al., Nat. Mater. 19, 299 (2020)]. However, the band offset sizes, band-alignment types, and whether momentum matched or not, all are affected by the interfacial effects between the component 2DSs, such as the quasichemical-bonding (QB) interaction between layers and the electrical dipole moment formed around the vdW interface. Here, based on density-functional theory calculations, first we probe the interfacial effects (including different QBs for valence and conduction bands, interface dipole, and, the synergistic effects of these two aspects) on band-edge evolution in energy and valley (location in the Brillouin zone) and the resulting changes in band alignment and momentum matching for a typical vdWH of monolayer InSe and bilayer WS2, in which the band edges of subsystems satisfy the special band-structure combination for a momentum-matched type II vdWH. Then, based on the conclusions of the studied interfacial effects, we propose a practical screening method for robust momentum-matched type II vdWHs. This practical screening method can also be applied to other band alignment types. Our current study opens a way for practical screening and designing of vdWHs with robust momentum-matching and band alignment type.
- Published
- 2023
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