Search

Your search keyword '"Stefan E. Schulz"' showing total 81 results

Search Constraints

Start Over You searched for: Author "Stefan E. Schulz" Remove constraint Author: "Stefan E. Schulz" Search Limiters Peer Reviewed Remove constraint Search Limiters: Peer Reviewed
81 results on '"Stefan E. Schulz"'

Search Results

1. Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor

2. Millisecond flash lamp curing for porosity generation in thin films

Catalog

Books, media, physical & digital resources

3. Process Development of Aluminum Electroplating from an Ionic Liquid on 150 mm Wafer Level

4. Disorder explains dual‐band reflection spectrum in spherical colloidal photonic supraparticle assemblies

5. Laser induced crystallization of Co–Fe–B films

6. Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir

7. On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes

8. Disturbing-Free Determination of Yeast Concentration in DI Water and in Glucose Using Impedance Biochips

9. P-N Junction-Based Si Biochips with Ring Electrodes for Novel Biosensing Applications

11. Nanolithographic Fabrication Technologies for Network-Based Biocomputation Devices

12. Ferrocenyl‐Pyrenes, Ferrocenyl‐9,10‐Phenanthrenediones, and Ferrocenyl‐9,10‐Dimethoxyphenanthrenes: Charge‐Transfer Studies and SWCNT Functionalization

14. Control of magneto-optical properties of cobalt-layers by adsorption of α-helical polyalanine self-assembled monolayers

15. A β-ketoiminato palladium(II) complex for palladium deposition

16. Computationally efficient simulation method for conductivity modeling of 2D-based conductors

17. Iron(III) β-diketonates: CVD precursors for iron oxide film formation

18. Magnetic Tunnel Junctions: Laser Annealing Versus Oven Annealing

19. Tuning of diameter and electronic type of CCVD grown SWCNTs: A comparative study on Co-Mo and Co-Ru bimetallic catalyst systems

20. The role of plasma analytics in leading-edge semiconductor technologies

21. Effects of catalyst configurations and process conditions on the formation of catalyst nanoparticles and growth of single-walled carbon nanotubes

22. Low-temperature chemical vapor deposition of cobalt oxide thin films from a dicobaltatetrahedrane precursor

23. Manganese half-sandwich complexes as metal-organic chemical vapor deposition precursors for manganese-based thin films

24. Enhancement of carbon nanotube FET performance via direct synthesis of poly (sodium 4-styrenesulfonate) in the transistor channel

25. A detailed ellipsometric porosimetry and positron annihilation spectroscopy study of porous organosilicate-glass films with various ratios of methyl terminal and ethylene bridging groups

27. High-resolution inkjet printing of conductive carbon nanotube twin lines utilizing evaporation-driven self-assembly

28. Metal nanoparticles reveal the organization of single-walled carbon nanotubes in bundles

29. Exploitation of Giant Piezoresistivity – CNT Sensors Fabricated with a Wafer-level Technology

30. Interaction between carbon nanotubes and metals: Electronic properties, stability, and sensing

31. Magnesium β-ketoiminates as CVD precursors for MgO formation

32. Half-sandwich cobalt complexes in the metal-organic chemical vapor deposition process

33. Influence of porosity and methyl doping inside silica network: An electron diffraction and DFTB analysis

34. Wetting Behavior of Plasma Etch Residue Removal Solutions on Plasma Damaged and Repaired Porous ULK Dielectrics

35. Cover Feature: Ferrocenyl‐Pyrenes, Ferrocenyl‐9,10‐Phenanthrenediones, and Ferrocenyl‐9,10‐Dimethoxyphenanthrenes: Charge‐Transfer Studies and SWCNT Functionalization (Chem. Eur. J. 12/2020)

36. Photosensitive Field‐Effect Transistors Made from Semiconducting Carbon Nanotubes and Non‐Covalently Attached Gold Nanoparticles

37. The dielectric response of low-k interlayer dielectric material characterized by electron energy loss spectroscopy

38. Controlling SWCNT assembling density by electrokinetics

39. Investigation of CH4, NH3, H2 and He plasma treatment on porous low-k films and its effects on resisting moisture absorption and ions penetration

40. Optimizing sonication parameters for dispersion of single-walled carbon nanotubes

41. Ruthenocenes and Half‐Open Ruthenocenes: Synthesis, Characterization, and Their Use as CVD Precursors for Ruthenium Thin Film Deposition

42. Influence of thermal cycles on the silylation process for recovering k-value and chemical structure of plasma damaged ultra-low-k materials

43. Modeling of TDDB in advanced Cu interconnect systems under BTS conditions

44. Variable-shaped e-beam lithography enabling process development for future copper damascene technology

45. How to evaluate surface free energies of dense and ultra low-κ dielectrics in pattern structures

46. Influence of the additives argon, O2, C4F8, H2, N2 and CO on plasma conditions and process results during the etch of SiCOH in CF4 plasma

47. Investigations regarding Through Silicon Via filling for 3D integration by Periodic Pulse Reverse plating with and without additives

48. Carbon nanotubes for nanoscale low temperature flip chip connections

49. Analysis of the impact of different additives during etch processes of dense and porous low-k with OES and QMS

50. Investigation of physical and chemical property changes of ultra low-κ SiOCH in aspect of cleaning and chemical repair processes