1. Superior Electro-Oxidation and Corrosion Resistance of Monolayer Transition Metal Disulfides
- Author
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Daniel S. Schulman, Nasim Alem, Dan May-Rawding, Fu Zhang, Saptarshi Das, and Drew Buzzell
- Subjects
Substrate Interaction ,Materials science ,chemistry.chemical_element ,Context (language use) ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,0104 chemical sciences ,Corrosion ,Chemical engineering ,Transition metal ,chemistry ,Monolayer ,General Materials Science ,Reactivity (chemistry) ,0210 nano-technology ,Tin ,Electrode potential - Abstract
Physics of monolayer and few-layer transition metal dichalcogenides (TMDs) and chemistry of few-layer TMDs have been well studied in recent years in the context of future electronic, optoelectronic, and energy harvesting applications. However, what has escaped the attention of the scientific community is the unique chemistry of monolayer TMDs. It has been demonstrated that the basal plane of multilayer TMDs is chemically inert, whereas edge sites are chemically active. In this article, we experimentally demonstrate that the edge reactivity of the TMDs can be significantly impeded at the monolayer limit through monolayer/substrate interaction, thus making the monolayers highly resistant to electrooxidation and corrosion. In particular, we found that few-layer flakes of MoS2 and WS2 exfoliated on conductive TiN substrates are readily corroded beyond a certain positive electrode potential, while monolayer remnants are left behind unscathed. The electrooxidation resistance of monolayers was confirmed using a ...
- Published
- 2018
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