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The challenge of nominalism in philosophy and theology to the reality of universals has been a motor of modern thought. Translated into aesthetic terms, it has abetted resistance to generic conventions and helped undermine essentialist notions of aesthetic form. Theodor W. Adorno had a characteristically dialectical response to nominalism, applauding its subversion of categorical reifications, but alarmed by its indiscriminate leveling of the distinction between concept and object, which could also efface the distinction between works of art and everyday objects. In musical terms, he appreciated the nominalist emphasis on individual works as opposed to generic formal categories, and praised Arnold Schoenberg's atonal revolution. But he was also aware that carried to an extreme, nominalism could lead to the subjective domination of a nature that was understood to be without essential characteristics of its own. In his late embrace of musique informelle, he admired a music that eschewed both reified categories and subjective domination of the apparent contingency of the material world, a music that expressed a nominalism that might better be called “magical” than “conventional.”

The self-aligned double patterning (SADP) module is a scheme to form 32 nm or 22 nm line structures that extend the useful range of either dry scanner or immersion scanner photolithography tools. Once reliable baseline processes for SADP flow have been developed, defect data collection, understanding, characterization, and reduction become increasingly important. Knowledge on defect characterization and reduction thus obtained reduces tool ramp-up time at manufacturing sites and provides new directions to improve wafer fabrication processes. In this paper, the types of defects in each step of the process to ultimately form 32 nm or 22 nm structures using the SADP flow are discussed, including an in-depth study of the impact of bump defects on the SADP flow, and proposed mechanisms of bump defect formation. Potential solutions involving an improved film deposition process for the SADP process module are also presented.

After having promoted and then tacitly abandoned the rhetoric of postmodernism, Zygmunt Bauman settled on the metaphor of a modernity that was growing more ‘liquid’ and ‘lighter’ than before. This essay explores the strengths and weaknesses of these metaphors, and attempts to contextualize Bauman’s insights in what has been called by the historian Yuri Slezkine the ‘Mercurian’ culture of diasporic Jewish life.

Even since William of Ockham’s critique of scholastic realism, the nominalist impulse in philosophy has been understood to undercut the inherent intelligibility of the world and abet its disenchantment. As a result, it has often been tied to a voluntarist notion of God or of human subjects who construct a world through self‐assertion. Drawing on the writings of Walter Benjamin, Rosalind Krauss and most notably W. J. T. Mitchell, this paper explores an alternative version of non‐conventionalist nominalism, which it calls ‘magical’ based on the Adamic quest for ‘true’ names. It argues that photography in certain respects exemplifies a visual expression of the same quest, which can be understood as the assertion of the world against the domination of the subject.

(2003). Mourning a Metaphor: The Revolution is Over. Parallax: Vol. 9, Mourning Revolution, pp. 17-20.

The popularity of films like Titanic betokens a massive shift in the nature of aesthetic spectatorship in our time. The contemplative, distanced viewer who is able to judge from afar the spectacle before him or her, has been replaced by a more proximate, involved "kinaesthetic" subject whose body is stimulated as much as his or her eye. This is evident not only in mass culture with amusement thrill rides and the return of what has been called the "cinema of attractions"; this new spectator can also be discerned in avant-garde culture, as shown by the Sensation exhibition of Young British Artists which caused such a stir in London and New York. This spectator is especially attracted to simulacral scenes of destruction and catastrophe, in which he or she is virtually immersed. If aesthetic judgement is to be a model for its political counterpart, as has been argued by theorists like Lyotard and Arendt, it cannot do so on the basis of this aesthetics of violent immersion.

Vision and the gaze are key issues in the analysis of racism, sexism and ethnocentrism. In recent radical theory, generally, and French theory in particular, vision has been seen as a means of control. But this view is often unnuanced. It bypasses questions such as: Why is it that contemporary theories have been so critical of vision, and generous towards listening (in psychoanalysis) and language (in philosophy)? This collection of original essays brings together historical studies and contemporary theoretical perspectives on vision. The historical papers focus in turn on Ancient Greece, medieval theology, the Renaissance, the Enlightenment and the nineteenth century. These historical studies are themselves thoroughly informed by poststructuralist theory. They provide a rigorous background for several new, exciting articles on vision and its bearings for feminism, race, sexual orientation, film and art. This collection is the first of its kind in juxtaposing historical and contemporary

Illustrations ix Reprint Acknowledgments xi Acknowledgments xv Introduction: The Work of Vision in the Age of European Empires / Sumathi Ramaswamy 1 Section I: The Imperial Optic Introduction / Martin Jay and Sumathi Ramaswamy 25 Part 1: Empires of the Palette 1. The Walls of Images / Serge Gruzinski 47 2. Painting as Exploration: Visualizing Nature in Eighteenth-Century Colonial Science / Daniela Bleichmar 64 3. Indian Yellow: Making and Breaking the Imperial Palette / Jordanna Bailkin 91 4. Colonial Panaromania / Roger Benjamin 111 Part 2. The Mass-Printed Imperium 5. Objects of Knowledge: Oceanic Artifacts in European Engravings / Nicholas Thomas 141 6. Excess in the City? Consumption of Imported Prints in Colonial Calcutta, c. 1780-c. 1795 / Natasha Eaton 159 7. Advertising and the Optics of Colonial Power at the Fin de Siecle / David Ciarlo 189 Part 3. Mapping, Claiming, Reclaiming 8. Mapping Plus Ultra: Cartography, Space, and Hispanic Modernity / Ricardo Padron 211 9. Mapping an Exotic World: The Global Project of Dutch Cartography, circa 1700 / Benjamin Schmidt 246 10. Visual Regimes of Colonization: European and Aboriginal Seeing in Australia / Terry Smith 267 Part 4. The Imperial Lens 11. The Photography Complex: Exposing Boxer-Era China (1900-1901), Making Civilization / James L. Hevia 283 12. Colonial Theaters of Proof: Representation and Laughter in the 1930s Rockefeller Foundation Hygeine Cinema in Java / Eric A. Stein 315 13. Colonialism and the Built Space of Cinema / Brian Larkin 346 Section II. Postcolonial Looking Introduction / Martin Jay and Sumathi Ramaswamy 377 Part 5. Subaltern Seeing: An Overlap of Complexities 14. Speaking Back to Orientalist Discourse / Zeynep Celik 395 15. Maps, Mother/Goddesses, and Martyrdom in Modern India / Sumathi Ramaswamy 415 16. Notes from the Surface of the Image: Photography, Postcolonialism, and Vernacular Modernism / Christopher Pinney 450 17. "I Am Rendered Speechless by Your Idea of Beauty": The Picturesque in History and Art in the Postcolony / Krista A. Thompson 471 18. Fanon, Algeria, and the Cinema: The Politics of Identification / Robert Stam 503 Part 6. Regarding and Reconstituting Europe 19. Creole Europe: The Reflection of a Reflection / Christopher Pinney 539 20. Picasso, Africa, and the Schemata of Difference / Simon Gikandi 566 21. Double Dutch and the Culture Game / Olu Oguibe 594 Conclusion. A Parting Glance: Empire and Visuality / Martin Jay 609 Contributors 621 Index 629

The objective of this study was to examine the defect reduction effect of the wafer edge polishing step on the immersion lithography process. The experimental wafers were processed through a typical front end of line device manufacturing process and half of the wafers were processed with the wafer edge polishing just prior to the immersion lithography process. The experimental wafers were then run through two immersion lithography experiments and the defect adders on these wafers were compared and analyzed. The experimental results indicated a strong effect of the edge polishing process on reducing the particle migration from the wafer edge region to the wafer surface during the immersion lithography process.

Let me begin with two quotations: The identity of experience in the form of a life that is articulated and possesses internal continuity - and that life was the only thing that made the narrator's stance possible - has disintegrated. One need only note how impossible it would be for someone who participated in the war to tell stories about it the way people used to tell stories about their adventures. The war is] as totally divorced from experience as is the functioning of a machine from the movement of the body, which only begins to resemble it in pathological states. . . . Life has changed into a timeless succession of shocks, interspersed with empty, paralyzed intervals. . . . The total obliteration of the war by information, propaganda commentaries, with cameramen in the first tanks and war reporters dying heroic deaths, the mishmash of enlightened manipulation of public opinion and oblivious activity: all this is another expression for the withering of experience, the vacuum between men and their fate, in which their real fate lies. For those conversant with the history of Critical Theory, the lament expressed in these two citations will immediately sound familiar.If asked to identify their source, they would be likely to point to Walter Benjamin’s celebrated essay of 1936, “The Storyteller,” in which the First World War is blamed for starting a process that has impoverished something called experience ( Erfahrung , not, for reasons to be discussed shortly, Erlebnis ). It is here, after all, that one finds these now familiar lines: “For never has experience been contracted more thoroughly than strategic experience by tactical warfare, economic experience by inflation, bodily experience by mechanical warfare, moral experience by those in power.”

Traditional semiconductor manufacturing relies on a fixed process-recipe combined with a classical statistical process control that is used to monitor the production process. Leading-edge manufacturing processes require higher levels of precision and accuracy, which necessitate the use of tighter process control. Advanced Process Control (APC) is becoming a critical component to improve performance, yield, throughput, and flexibility of the manufacturing process using run-to-run, wafer-to-wafer, within wafer and real-time process control. The complexity of device manufacturing process as well as the strong coupling effect of several input parameters on the final process outputs prohibit the use of a classical single variable feedback control method. Therefore, multivariate, model-based APC system is developed in conjunction with feed-forward and feedback mechanisms to automatically determine the optimal recipe for each wafer based on both incoming wafer and tool state properties. The APC system uses wafer metrology, process models and sophisticated control algorithms to provide dynamic fine-tuning of intermediate process targets that enhance final device targets. The design of the APC system enables scalable control solutions across a single chamber, a process tool, multi-tools, a process module and multi-process modules using similar building blocks, concepts and algorithms.

A nitrogen-free (N-free) dielectric anti-reflective coating (DARC®) was cost-effectively developed in a plasma-enhanced chemical vapor deposition (PECVD) reactor to eliminate the 193nm resist poisoning interaction caused when N2O is used as a precursor [1]. Although it was found that even a N-free ARC could poison sensitive 193nm resists with –OH radicals [2], which either exist inherently in the ARC or result from H2O absorption by the ARC surface, the current investigation has revealed that it was possible to minimize resist poisoning. Our investigation showed that compressive film stress directly correlates to H2O resistance. Therefore, it was possible to greatly improve the ARC resistance to H2O absorption by creating and maintaining a process regime that makes the ARC film dense. The dense ARC film demonstrated promising lithography performance with minimal resist poisoning as well as excellent shelf life and O2-ashing resistance. This paper explores the N-free DARC material, its development, lithographic integration results and implementation in a production environment to eliminate 193nm resist poisoning.

A mapping reflectometer has been integrated into the load robotics of a multi-chamber, thin film deposition tool. Normal incidence reflectance metrology is used to monitor PE-CVD silicon oxynitride films. Reflectance data is modeled to obtain film thickness and extrapolate refractive index and extinction coefficient at DUV wavelengths using an interpolation dispersion model. The interpolation model is an empirical, process specific dispersion model that uses one or two adjustable parameters to interpolate between well- characterized 'node' films. The node film dispersions are characterized by multiple-angle spectroscopic ellipsometry over the spectral range of 200 nm to 800 nm. The model parameters are correlated to process variables which affect the index of the deposited oxynitride film directly such as the SiH4:N2O flow ratio and the total flow. The capabilities of the instrument are demonstrated by measuring a 5-layer, ILD stack for a dual damascene/copper process.© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

The demand for increased productivity in train operation has been the driving force in creating today's energy-efficient high-horsepower diesel electric locomotives. A key in obtaining this productivity improvement has been the evolution of the electric transmission that has allowed the locomotive's effective tractive effort to increase along with its diesel engine horsepower. A means of correlating the relative efficiency, reliability, performance, size, and weight of the available propulsion technologies and control strategies is developed, along with trade-offs in applying these technologies and strategies to locomotives now and in the future. Both dc and the various types of ac propulsion technologies are included. How the basic strategy of individual axle control or total locomotive control (for both dc and ac technologies) relates to locomotive productivity is covered along with variations such as power equipment staging in the overall optimization process.