1. Pulse Profiling Active Load Pull Measurements
- Author
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Eigo Kuwata, Johannes Benedikt, Yashar Alimohammadi, Paul J. Tasker, James Bell, Lei Wu, Thoalfukar Husseini, and Xuan Liu
- Subjects
Profiling (computer programming) ,Materials science ,business.industry ,Pulse (signal processing) ,020208 electrical & electronic engineering ,Linearity ,020206 networking & telecommunications ,02 engineering and technology ,Active load ,Power (physics) ,0202 electrical engineering, electronic engineering, information engineering ,Range (statistics) ,Optoelectronics ,Constant load ,business ,Electrical impedance - Abstract
An advanced active load-pull pulse profiling (ALPPP) system is presented to identify and track, for the first time, the optimum impedances along different sections of an RF pulse. Optimum impedance variations of a 10W GaN device within the RF pulse, and the resulting performance variations are quantified over an output power range of 25 dB showing a significant variation at power back-off. Furthermore, the nature of optimum load variations is probed through the addition of a pulsed IV capability. Pre-bias is utilized to investigate the impact of traps on device behavior over a range of temperature and drive power levels. It is demonstrated that pre-filling the traps provides for an almost constant load optimum across the RF pulse while maintaining device performance. Moreover, the identified optimum pre-bias condition, shows improved device linearity over the duration of the RF pulse, hence, suggesting a new method for compensating impedance mismatches and improving device linearity within an RF pulse.
- Published
- 2020
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