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Hard X-ray microscopy is a prominent tool suitable for nanoscale-resolution non-destructive imaging of various materials used in different areas of science and technology. With an ongoing effort to push the 2D/3D imaging resolution down to 10 nm in the hard X-ray regime, both the fabrication of nano-focusing optics and the stability of the microscope using those optics become extremely challenging. In this work a microscopy system designed and constructed to accommodate multilayer Laue lenses as nanofocusing optics is presented. The developed apparatus has been thoroughly characterized in terms of resolution and stability followed by imaging experiments at a synchrotron facility. Drift rates of ∼2 nm h−1accompanied by 13 nm × 33 nm imaging resolution at 11.8 keV are reported.

The semiconductor industry is moving toward a half-pitch of 7 nm. The required metrology equipment should be one order of magnitude more accurate than that. Any metrology tool is only as good as it is calibrated. The characterization of metrology systems requires test patterns that are one order of magnitude smaller than the measured features. The test sample was designed in such a way that the distribution of linewidths appears to be random at any location and any magnification. The power spectral density of such pseudo-random test pattern is inherently flat, down to the minimum size of lines. Metrology systems add a cut-off of the spectra at high frequencies; the shape of the cut-off characterizes the system in its entire dynamic range. This method is widely used in optics, and has allowed optical systems to be perfected down to their diffraction limit. There were attempts to use the spectral method to characterize nanometrology systems such as SEMs, but the absence of natural samples with known spatial frequencies was a common problem. Pseudo-random test patterns with linewidths down to 1.5 nm were fabricated. The system characterization includes the imaging of a pseudo-random test sample and image analysis by a developed software to automatically extract the power spectral density and the contrast transfer function of the nanoimaging system.

A round-robin between the multilayer deposition laboratories of the Advanced Photon Source, the European Synchrotron Radiation Facility and the National Synchrotron Light Source II has been initiated in order to study standard W/B4C multilayer mirrors produced by the different facilities. The use of such multilayer mirrors for hard X-ray monochromatisation represents an important alternative to crystal-based devices when greater photon flux density is desirable for, e.g., X-ray imaging applications and other photon-intensive techniques. Currently, knowledge about the potential degradation of the wavefront in terms of beam profile distortion and coherence properties due to reflection on a multilayer mirror is limited. In order to address this issue, the beam profile and coherence properties of a monochromatic synchrotron beam reflected by the individual mirrors were studied at the Advanced Photon Source insertion device beamline 32-ID. The results indicate that by using the same coating material, commercially available high quality substrates and a similar coating technique, mirrors with comparable performance can be produced with quite different multilayer deposition facilities. Furthermore, no wave-optical formalism is available at this time which relates the influence of a multilayer reflection on the wavefront to the structural quality of the mirror. Hence, the experimental studies presented are highly targeted in order to identify parameters which have a potential influence on the wavefront preservation properties of a multilayer.

Characterization and testing of an L-shaped laterally graded multilayer mirror are presented. This mirror is designed as a two-dimensional collimating optics for the analyzer system of the ultra-high-resolution inelastic X-ray scattering (IXS) spectrometer at National Synchrotron Light Source II (NSLS-II). The characterization includes point-to-point reflectivity measurements, lattice parameter determination and mirror metrology (figure, slope error and roughness). The synchrotron X-ray test of the mirror was carried out reversely as a focusing device. The results show that the L-shaped laterally graded multilayer mirror is suitable to be used, with high efficiency, for the analyzer system of the IXS spectrometer at NSLS-II.

We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.

We discuss the results of SEM and TEM measurements with the BPRML test samples fabricated from a BPRML (WSi2/Si with fundamental layer thickness of 3 nm) with a Dual Beam FIB (focused ion beam)/SEM technique. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML test samples can be used to characterize x-ray microscopes. Corresponding work with x-ray microscopes is in progress.

We have designed and constructed a dedicated instrument to perform ptychography measurements and characterization of multilayer Laue lenses nanofocusing optics. The design of the scanning microscope provides stability of components and minimal thermal drifts, requirements for nanometer scale spatial resolution measurements. We performed thorough laboratory characterization of the instrument in terms of resolution and thermal drifts with subsequent measurements at a synchrotron. We have successfully acquired and reconstructed ptychography data yielding 11 nm line focus.

We report recent advances in hard-x-ray optics—including record spatial resolution—and in staining techniques that enable synchrotron microradiology to produce neurobiology images of quality comparable to electron and visible microscopy. In addition, microradiology offers excellent penetration and effective three-dimensional detection as required for many neuron studies. Our tests include tomographic reconstruction based on projection image sets.

A modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays [Proc. SPIE 7077-7 (2007), Opt. Eng. 47(7), 073602-1-5 (2008)] has been proven to be an effective MTF calibration method for a number of interferometric microscopes and a scatterometer [Nucl. Instr. and Meth. A 616, 172-82 (2010]. Here we report on a significant expansion of the application range of the method. We describe the MTF calibration of a 6 inch phase shifting Fizeau interferometer. Beyond providing a direct measurement of the interferometer's MTF, tests with a BPR array surface have revealed an asymmetry in the instrument's data processing algorithm that fundamentally limits its bandwidth. Moreover, the tests have illustrated the effects of the instrument's detrending and filtering procedures on power spectral density measurements. The details of the development of a BPR test sample suitable for calibration of scanning and transmission electron microscopes are also presented. Such a test sample is realized as a multilayer structure with the layer thicknesses of two materials corresponding to BPR sequence. The investigations confirm the universal character of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.

We report a successful fabrication and testing of the first set of Platinum (Pt)-coated Kirkpatrik-Baez (KB) mirrors for a submicrofocusing x-ray polychromatic beam from a conventional beamline (64 m long) at the 34-ID of Advanced Photon Source (APS). The set includes one 80 mm long mirror and one 40 mm short mirror fabricated by depositing Pt on finely polished spherical Silicon (Si) substrates using the APS-developed profile coating technique with the magnetron sputtering system. Profile coating masks were calculated through the coating profile data from metrology measurements acquired using interferometric stitching technique. Instead of flat substrates, spherical substrates (with shapes approximately mimicking the tangential profiles of the desired ellipses) were used, reducing the coating thickness and, thus, stress. The mirror pair was commissioned on the beamline and generated a 2-D spot with full width at half maximum (FWHM) 280 nm (V) x 150 nm (H). The detailed fabrication methods, metrology measurements, and calculations are discussed.

Any metrology tool is only as good as it is calibrated. The characterization of metrology systems requires test patterns at a scale about ten times smaller than the measured features. The fabrication of patterns with linewidths down to 1.5 nm is described. The test sample was designed in such a way that the distribution of linewidths appears to be random at any location. This pseudorandom test pattern is used to characterize dimensional metrology equipment over its entire dynamic range by extracting the modulation transfer function of the system. The test pattern contains alternating lines of silicon and tungsten silicide, each according to its designed width. The fabricated test samples were imaged using a transmission electron microscope, a scanning electron microscope, and an atomic force microscope.