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1. Pendeo-EpitaxyTM Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition

Author

Edward A. Preble, Kevin J. Linthicum, Robert F. Davis, Brian M. Robin, Pradeep Rajagopal, Thomas Gehrke, and E.P. Carlson

Subjects
Auger electron spectroscopy, Materials science, Mechanical Engineering, chemistry.chemical_element, Chemical vapor deposition, Nitride, Combustion chemical vapor deposition, Condensed Matter Physics, Epitaxy, chemistry.chemical_compound, chemistry, Chemical engineering, Mechanics of Materials, Silicon carbide, General Materials Science, Thin film, Gallium
Published
2000

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