Search

We experimentally investigate the smallest germanium waveguide cavity resonators on silicon that can be designed to work around 1.55 mu m wavelength and observe an almost 30-fold enhancement in the collected spontaneous emission per unit volume when compared to a continuous germanium film of the same thickness. The enhancement is due to an effective combination of (i) excitation enhancement at the pump wavelength, (ii) emission enhancement (Purcell effect) at the emission wavelength, and (iii) effective beaming by the nanoresonators, which act as optical antennas to enhance the radiation efficiency. Our results set a basis for the understanding and engineering of light emission based on subwavelength, CMOS-compatible nanostructures operating at telecommunication wavelengths.

High n-type doping in germanium is essential for many electronic and optoelectronic applications especially for high performance Ohmic contacts, lasing and mid-infrared plasmonics. We report on the combination of in situ doping and excimer laser annealing to improve the activation of phosphorous in germanium. An activated n-doping concentration of 8.8 x 10(19) cm(-3) has been achieved starting from an incorporated phosphorous concentration of 1.1 x 10(20) cm(-3). Infrared reflectivity data fitted with a multi-layer Drude model indicate good uniformity over a 350 nm thick layer. Photoluminescence demonstrates clear bandgap narrowing and an increased ratio of direct to indirect bandgap emission confirming the high doping densities achieved.

Asymmetric quantum well systems are excellent candidates to realize semiconductor light emitters at far-infrared wavelengths not covered by other gain media. Group-IV semiconductor heterostructures can be grown on silicon substrates, and their dipole-active intersubband transitions could be used to generate light from devices integrated with silicon electronic circuits. Here, we have realized an optically pumped emitter structure based on a three-level Ge/Si0.18Ge0.82 asymmetric coupled quantum well design. Optical pumping was performed with a tunable free-electron laser emitting at photon energies of 25 and 41 meV, corresponding to the energies of the first two intersubband transitions 0 → 1 and 0 → 2 as measured by Fourier-transform spectroscopy. We have studied with a synchronized terahertz timedomain spectroscopy probe the relaxation dynamics after pumping, and we have interpreted the resulting relaxation times (in the range 60 to 110 ps) in the framework of an out-of-equilibrium model of the intersubband electron−phonon dynamics. The spectral changes in the probe pulse transmitted at pump−probe coincidence were monitored in the range 0.7−2.9 THz for different samples and pump intensity and showed indication of both free carrier absorption increase and bleaching of the 1 → 2 transition. The quantification from data and models of the free carrier losses and of the bleaching efficiency allowed us to predict the conditions for population inversion and to determine a threshold pump power density for lasing around 500 kW/cm2 in our device. The ensemble of our results shows that optical pumping of germanium quantum wells is a promising route toward siliconintegrated far-infrared emitters.

International audience; In this paper, a silicon integrated driver unit, intended for a single-channel NRZ 3D heterogeneous silicon photonic modulator is proposed. It allows data rate of up to 100 Gb/s, which is beyond the current state of the art. It directly controls 160 GHz bandwidth high speed phase modulator (HSPM) segment of a Mach Zehnder Interferometer (MZI). It is fabricated in 55 nm SiGe BiCMOS technology with fT of up to 300 GHz. It features a 300 mW of dc power consumption and delivers a 2.5 Vpp single-ended output swing at 100 Gb/s.

Dense arrays of micrometric crystals, with areal filling up to 93%, are obtained by depositing GaAs in a mask-less molecular beam epitaxy process onto Si substrates. The substrates are patterned into tall, micron sized pillars. Faceted high aspect ratio GaAs crystals are achieved by tuning the Ga adatom for short surface diffusion lengths. The crystals exhibit bulk-like optical quality due to defect termination at the sidewalls. Simultaneously, the thermal strain induced by different thermal expansion parameters of GaAs and Si is fully relieved. This opens the route to thick film applications without crack formation and wafer bowing. (C) 2013 AIP Publishing LLC.

We investigate light-matter interactions in periodic silicon microcrystals fabricated combining top-down and bottom-up strategies. The morphology of the microcrystals, their periodic arrangement, and their high refractive index allow the exploration of photonic effects in microstructured architectures. We observe a notable decrease in reflectivity above the silicon bandgap from the ultraviolet to the near-infrared. Finite-difference time-domain simulations show that this phenomenon is accompanied by a ∼2-fold absorption enhancement with respect to a flat sample. Finally, we demonstrate that ordered silicon microstructures enable a fine tuning of the light absorption by changing experimentally accessible knobs as pattern and growth parameters. This work will facilitate the implementation of optoelectronic devices based on high-density microcrystals arrays with optimized light-matter interactions.