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Presents a study that have grown epitaxial layers of silicon-doped indium-arsenic-antimony by molecular-beam epitaxy on gallium arsenide (GaAs) and GaAs-coated silicon substrates. Absorption coefficient; Use of the fitted value of the Fermi level; Electron concentration.

Studies band-gap narrowing of gallium arsenide as a function of doping concentration using photoluminescence spectroscopy on samples grown by molecular epitaxy. Technique used in measuring the band gap energy; Details on the experiment; Discussion on the results of the study.

Investigates the molecular beam epitaxial growth of InAsSb on gallium arsenide (GaAs)-coated patterned silicon (Si) substrates. Comparison of the InAsSb epilayer morphology for different substrate conditions; Threaded defect density of the InAsSb layers; Evidence of a regular array of misfit dislocations.

Novel methods of GaAs surface passivation are investigated. Passivation is acheived by simple chemical treatments using aqueous solutions of Na2S, KOH, RuCl3, and K2Se. GaAs pn homojunction solar cells are used to evaluate the effectiveness of these passivation techniques. A significant reduction in minority-carrier surface recombination velocity is demonstrated. In the best case, the surface recombination velocity decreased from 5×106 cm/s (untreated surface) to 103 cm/s. In addition, we observe improvements in solar cell photogenerated current, short wavelength spectral response, open-circuit voltage, and junction ‘‘dark’’ current. [ABSTRACT FROM AUTHOR]

A gallium arsenide film is grown embedded in masked pre-etched wells in silicon vicinal (001) substrates by molecular beam epitaxy. The morphology and crystallinity of the embedded GaAs on Si layers are identical to those of large area GaAs on Si grown on the same wafer, as indicated by the comparison of Nomarski contrast photomicrographs and electron channeling patterns. High-resolution electron microscope images reveal the epitaxial relation of the GaAs/Si interface on the bottom and the sidewall of the wells. On the slope most of the dislocations are restricted to a narrow region near the interface. The same photoluminescent behavior is found for the GaAs deposit in the different silicon environments. This embedded growth technique is suitable for realization of a coplanar GaAs on Si surface. [ABSTRACT FROM AUTHOR]