1. Analysis of Yield Improvement Techniques for CNFET-Based Logic Gates
- Author
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Malgorzata Chrzanowska-Jeske, Rehman Ashraf, and Siva G. Narendra
- Subjects
Materials science ,Yield (engineering) ,Monte Carlo method ,Transistor ,Nanotechnology ,Hardware_PERFORMANCEANDRELIABILITY ,Integrated circuit ,Power (physics) ,law.invention ,law ,Logic gate ,Hardware_INTEGRATEDCIRCUITS ,Electronic engineering ,Hardware_LOGICDESIGN ,Electronic circuit ,Block (data storage) - Abstract
CNFET is one of the most promising candidates for a building block of post silicon era integrated circuits due to its excellent electronic properties. The presence of unwanted metallic tubes is identified as a major challenge towards building robust CNT based circuits. Metallic tubes negatively impact the performance, power and yield of CNFET-based circuits. Current CNT growth techniques described in the literature show a wide range, from close to 4% to almost 40%, of metallic tubes being initially present in CNFETs. We used Monte Carlo simulation to analyze yield improvement techniques in both cases; (1) when metallic tubes are present in CNFETs, and (2) when they are removed with extra processing techniques proposed by researches. We proposed design-based promising methods for yield improvement. Suggested and analyzed yield-improvement techniques include transistor, gate and circuit level approaches.
- Published
- 2017
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