1. Investigation of the Influence of Technological Factors on High-Voltage p0–n0 Junctions Based on GaAs.
- Author
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Sultanov, A. M., Yusupov, E. K., and Rakhimov, R. G.
- Subjects
GALLIUM arsenide ,AUDITING standards ,BREAKDOWN voltage ,CHARGE carriers ,HALL effect - Abstract
A technology has been developed and an optimal solution has been found for obtaining p
0 -n0 junctions based on lightly doped GaAs layers, with high values of electrical parameters and specified thicknesses of the base layers for creating ultra-high-speed high-voltage pulsed three-electrode switches with a photoninjection mechanism for the transfer of no ne quorum charge carriers. The dependence of the switching stability relative to the control pulse of the created high-voltage photonic-injection switches in a wide current and frequency mode of their operation, its sensitivity to various external and internal influences of these parameters has been studied. Those on the thickness of the p0 -layer, on the transfer coefficient &945;, on the breakdown voltage Utrial, high-voltage p0 -n0 transition, on the thickness of the solution-melt, on the temperature of the onset of crystallization, as well as the dependence of the transfer coefficient on the thickness of the p0 -layer. [ABSTRACT FROM AUTHOR]- Published
- 2024
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