1. Rapid and selective green laser activation of InGaZnO thin-film transistors through metal absorption
- Author
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Dong Hyun Choi, Won-Gi Kim, Jeong Woo Park, Min Seong Kim, Hyun Jae Kim, Hyukjoon Yoo, and Hyung Tae Kim
- Subjects
Indium gallium zinc oxide ,Computer engineering. Computer hardware ,Materials science ,Annealing (metallurgy) ,business.industry ,Green laser ,Transistor ,green laser ,Oxide thin-film transistor ,flexible electronics ,Flexible electronics ,law.invention ,TK7885-7895 ,law ,Thin-film transistor ,Metal absorption ,Optoelectronics ,annealing ,activation ,General Materials Science ,Electrical and Electronic Engineering ,business ,oxide thin-film transistor - Abstract
We used a pulsed green laser to activate indium gallium zinc oxide thin-film transistors (IGZO TFTs). The IGZO films with large bandgaps (>3 eV) were easily activated by heat delivered by a pulsed green laser to the gate, source, and drain metal electrodes. The IGZO TFTs were quickly and selectively activated in the absence of conventional annealing. Compared to the IGZO TFTs that were annealed at 300°C, the IGZO TFTs that were activated via pulsed green laser irradiation exhibited superior electrical characteristics: a field effect mobility of 11.98 ± 0.64 cm2 V−1 s−1, a subthreshold swing of 0.33 ± 0.02 V dec−1, and an on/off ratio of 8.28 × 109 ± 7.42 × 109, which were attributable to increases in the number of metal–oxide (M-O) bonds and oxygen vacancies, and reduced levels of OH-related species. The pulsed green laser broke weak chemical M-O bonds in the IGZO films through dihydroxylation of the OH-related species, and then strengthened the residual M-O bonds via heat transfer from the metal electrodes. This new activation process could replace conventional annealing and is expected to expand the applications of flexible and transparent devices.
- Published
- 2021