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The influence of homogenisation annealing process on microstrucure of 7085 Al alloy has been investigated by optical microscopy(OM), scanning electron microscopy combined with energy dispersive X-ray spectroscopy (EDX), X-ray diffraction(XRD), and differential scanning calorimetry (DSC). The results show a large amount of skeletal Mg(Zn, Al, Cu)2 phase and AlZnMgCu phase distributed as eutectic microstructure on crystal boundaries, and some impurity phase of triangle or square Al18Mg3Cr2 in the interior of grain in as-cast 7085Al alloys. In combination with DSC and OM observation, the temperature of homogenisation annealing is determined lower than 473°C. With increasing temperature of homogenising annealing, the woven crystal microstructure on the grain boundary and part lager block second phase in interior of grain decreases, and grain boundary turns to be discontinuous. 7085Al alloys are treated by homogenising annealing of 470°C/24 h, grain boundary turns to be discontinuous, uniform and fine precipitation phase arises, and woven eutectic microstructure and lager block second phase disappear. The optimised homogenising annealing is 470°C/24 h in the study. [ABSTRACT FROM AUTHOR]

The effects of pressure treatment at room temperature on the microstructure and corrosion resistance in seawater solution of the as spun RE65Co25Al10 (RE = Ce, La, Pr, Sm and Gd) metallic glass ribbons have been investigated using X-ray diffraction, differential scanning calorimetry, scanning electron microscopy and electrochemical workstation. The results indicate that the pressure treatment causes the changes of microstructure, which results in the variation of the glass transition temperature and supercooled liquid region of the RE65Co25Al10 metallic glass. The RE65Co25Al10 metallic glass treated by pressure in 16 kN exhibits low self-corrosion current density and distinct passive region, indicating the higher seawater corrosion resistance. However, the corrosion resistance of the RE65Co25Al10 metallic glass becomes poor with increasing pressure to 30 kN. The discussion of the corrosion mechanism has been made based upon the structural relaxation and bonding force of the matrix elements and oxygen during the electrochemical corrosion process. [ABSTRACT FROM AUTHOR]

In this study, transparent alumina and TiAl alloy were successfully brazed at 860°C-940 °C using Ag-21Cu-4.5Ti (wt%) filler metal. The microstructure and mechanical properties of the joints were investigated. SEM and TEM analysis showed the typical interfacial microstructure of the joints brazed at 900 °C for 5min was TiAl/β-Ti + AlCuTi/AlCu 2 Ti + AlCuTi/AlCu 2 Ti + Ag(s,s) + Cu(s,s)/(Cu,Al) 3 Ti 3 O/transparent alumina. The effects of brazing temperature and holding time on the microstructure and mechanical properties of TiAl/transparent alumina joint were studied. In addition, the effects of the dissolution and diffusion of TiAl on the microstructural evolution of the brazing seam were discussed. Shear strength analysis reveals that the shear strength of the joint increases at first and then decreases when brazing temperature rises. The maximum shear strength is 49 MPa when the joint is brazed at 900 °C for 5 min. [ABSTRACT FROM AUTHOR]

The multilayer Ti and Ni foils were designed to braze SiO 2 -BN diphase ceramic with Nb at 1140 °C for 5min. The interfacial microstructure was examined using scanning electron microscopy (SEM), energy dispersive spectrometer (EDS), transmission electron microscope (TEM) and X-ray diffraction (XRD) methods, respectively. Experimental results and thermodynamical calculations showed that the interfacial microstructures between Nb and SiO 2 -BN ceramic were (βTi,Nb)-TiNi eutectic structure/TiNi + TiNi 3 /TiN + Ti 3 O 5 + TiB 2 + Ti 5 Si 3 . The effects of the Ti content in the Ti-Ni braze alloy on the microstructures of the joints were investigated. With the increase of the Ti content, less Ni 3 Nb formed in the joint and TiNi 3 phase successfully turned into TiNi and Ti 2 Ni. The effects of the Ti content in the Ti-Ni braze alloy on the shear strength of the joints showed that the optimum thickness of the TiN + Ti 3 O 5 + TiB 2 + Ti 5 Si 3 reaction area was about 13 μm and the maximum shear strength of 52 MPa was achieved when the Ti content was 45 wt.%. [ABSTRACT FROM AUTHOR]

An improved chemical bath deposition (CBD) technique has been provided to prepare zinc sulfide (ZnS) thin films on glass substrates deposited at 80–82°C using a mixed aqueous solution of zinc sulfate, ammonium sulfate, thiourea, hydrazine hydrate, and ammonia at the alkaline conditions. Both the traditional magnetic agitation and the substrates vibration by hand frequently were done simultaneously during the deposition. The substrates vibration reduced the formation and residence of gas bubbles on the glass substrates during growth and resulted in growth of clean ZnS thin films with high quality. Ammonia and hydrazine hydrate were used as complexing agents. It is found that hydrazine hydrate played an important role in growth of ZnS films. The structure and microstructure of ZnS films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD) and UV-vis spectroscopic methods. The XRD showed a hexagonal structure. The formed ZnS films exhibited good optical properties with high transmittance in the visible region and the band gap value was estimated to be 3.5–3.70 eV. [ABSTRACT FROM AUTHOR]

Intrinsic zinc oxide (i-ZnO) film was prepared for CuInSe2 (CIS) solar cell application [L. Stolt and J. Hedstrom, Appl. Phys. Lett.62 (1993) 8; D. Rudmann, Ph.D. Thesis, University of Basel, Basel, (2004)] on glass substrate by inductively coupled plasma (ICP)-assisted DC magnetron sputtering and under a quite low temperature of 50°C. The sputtering was done in an Ar and O2 gas mixture and a ceramic ZnO target was used. The microstructures of the film were investigated by X-ray diffractometer and scanning electron microscope. It was shown that all of the films had a c-axis preferred orientation perpendicular to the substrate. In our work, film with resistivity of 7 × 108Ω·cm and transmittance of about 80% in the visible range was prepared under the conditions of 4 mTorr working pressure and 50°C temperature. [ABSTRACT FROM AUTHOR]