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6,683 results on '"EXTREME ultraviolet lithography"'

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1. Chemical interaction of B4C, B, and C with Mo/Si layered structures.

2. Predicting radiation-induced carbon contamination of EUV optics.

4. Resist reflow methodology development to investigate interfacial interactions

5. Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO2 area-selective deposition

6. Using Hilbert curves to organize, sample, and sonify solar data

7. Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors

8. Actinic patterned mask inspection for EUV lithography

9. Coherent diffractive imaging methods for semiconductor manufacturing.

13. Analysis of partially coherent light propagation through the soft X-ray interference lithography beamline at SSRF

15. Fast 3D lithography simulation by convolutional neural network

16. Using Temporally Synthesized Laser Pulses to Enhance the Conversion Efficiency of Sn Plasmas for EUV Lithography

18. Extreme-ultraviolet spectral compression by four-wave mixing

20. Application of Novel Multilayer Normal-Incidence Mirrors for EUV Solar Spectroscopy

21. Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography

22. Optical proximity correction for anamorphic extreme ultraviolet lithography.

23. Fast 3D lithography simulation by convolutional neural network: POC study

24. Characterization of megahertz X-ray laser beams by multishot desorption imprints in PMMA

26. Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field

27. Soft X-ray and EUV emission spectra of beryllium plasma produced by neodymium-glass laser radiation with broad frequency and angular spectra

28. Demonstration of a ring-FEL as an EUV lithography tool

29. Projection Objective For an EUV-Lithographic Workbench

30. Reflective aperiodic multilayer filters for metrology at XUV sources

31. Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography

32. RETRACTED: A review study on harmonic generation from materials

33. Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask

35. Uncertainties in the reconstruction of nanostructures in EUV scatterometry and grazing incidence small-angle X-ray scattering

36. Exploring the stochastics cliff: understanding the impact of LER/LWR to stochastic defectivity and yield

37. Rigorous EUV absorber model for the mask modeling with deep learning techniques

38. Multi-beam mask writer exposure optimization for EUV mask stacks

39. Study of SXR/EUV radiation of exploded foils and wires with spectral, spatial and temporal resolution simultaneously on KING electric discharge facility

40. A synchrotron-based kilowatt-level radiation source for EUV lithography

41. Pupil optimization for after etch defectivity: what imaging metrics matter?

42. Optimizations aspects for EUV low-k1 logic with the low-n mask

43. Impact of mask corner rounding on pitch 40 nm contact hole variability

44. Contribution of mask roughness in stochasticity of high-NA EUV imaging

45. Simulation of polychromatic effects in high NA EUV lithography

46. Resolution limit and photon flux dependency in EUV ptychography

47. Exploration of alternative mask for 0.33NA EUV single patterning at pitch 28nm

48. Optimal phase shift and reflectance for high numerical aperture EUV phase shift mask

49. EMA modelled alternative EUV absorber materials considering optical and stability behavior

50. Compensation of EUV lithography mask blank defect based on an advanced genetic algorithm

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