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CdSe semiconductor thin films were grown on indium tin oxide (ITO) coated glass substrates by co-electrochemical deposition method. Deposition potential was kept at - 0.95 V vs. Ag/AgCl reference electrode for ten minutes. Deposition electrolyte includes an aqueous solution of 10 mM CdCl2, 20 mM H(2)SeO(3 )as precursors, 200 mM LiCl as complexing agent, and HCl for adjusting of pH. Deposited CdSe thin film was annealed at 500 degrees C for 30 min in air medium. Precursor and annealed CdSe thin films were characterized using a number of techniques, including SEM, EDX, XRD, UV-vis spectroscopy, and electrochemical impedance spectroscopy. SEM studies show that annealing alters the surface of precursor CdSe film from smooth to granular appearance. According to EDX analyses, the ratio of Cd/Se is close to 1.07 and 1.04 for the precursor and annealed CdSe thin film, respectively. XRD analysis shows that each film has polycrystalline structure. Precursor film has only cubic structure of CdSe, while annealed film has hexagonal structure of CdSe and cubic crystal phase of CdO. Optical energy band gap of the as-deposited CdSe film increases from 1.64 to 1.71 eV after annealing due to the mixture of the two phases. Refractive index against wavelength changes between 2.0 and 3.3. Calculations performed by using the data of Mott-Schottky measurements show that precursor CdSe film has 1.72 x 10(16 )cm(-3), while annealed film is of 3.65 x 10(17 )cm(-3 )carrier concentration. The prepared films exhibit n-type semiconductor character. The study reports energy level diagrams of the produced semiconductor CdSe thin films by using the Mott-Schottky and Tauc's approximations. The carrier transport properties in the interface between active CdSe thin film and electrolyte are discussed based on an equivalent electronic circuit simulated to the Nyquist data of the CdSe/electrolyte system.

A broadband optical transparent InGaAs semiconductor layer production of micron thicknesses was produced in only 75 s by thermionic vacuum arc (TVA) method at the first time. The optical and surface properties of the produced layers have been investigated. InGaAs structure is using in electronics and optoelectronics devices. The main advantage of TVA method is its fast deposition rate, without any loss in the quality of the films. Doping is a very simple and fast according to common production methods. InGaAs is an alloy of indium arsenide (InAs) and gallium arsenide (GaAs). InAs with (220) crystallographic direction and GaAs with (024)/(022) crystallographic directions were detected using by XRD analysis. GaAs and InAs are in the cubic and zinc blende crystal system, respectively. According to the transmittance spectra, sample has a broadband transparency in the range of 1000–3300 nm. According to results, defined TVA method for In doping to GaAs is proper fast and friendly method. SCANNING 38:297–302, 2016. © 2015 Wiley Periodicals, Inc. © Wiley Periodicals, Inc.

Ferroelectric polarization switching of poly(vinylidene difluoride-trifluoroethylene) is investigated in different thin-film device structures, ranging from simple capacitors to dual-gate thin-film transistors (TFT). Indium gallium zinc oxide, a high mobility amorphous oxide material, is used as semiconductor. We find that the ferroelectric can be polarized in both directions in the metal-ferroelectric-semiconductor (MFS) structure and in the dual-gate TFT under certain biasing conditions, but not in the single-gate thin-film transistors. These results disprove the common belief that MFS structures serve as a good model system for ferroelectric polarization switching in thin-film transistors. cop. 2015 AIP Publishing LLC.

We report in detail on the luminescence imaging setup developed within the last years in our laboratory. In this setup, the luminescence emission of silicon solar cells or silicon wafers is analyzed quantitatively. Charge carriers are excited electrically (electroluminescence) using a power supply for carrier injection or optically (photoluminescence) using a laser as illumination source. The luminescence emission arising from the radiative recombination of the stimulated charge carriers is measured spatially resolved using a camera. We give details of the various components including cameras, optical filters for electro- and photo-luminescence, the semiconductor laser and the four-quadrant power supply. We compare a silicon charged-coupled device (CCD) camera with a back-illuminated silicon CCD camera comprising an electron multiplier gain and a complementary metal oxide semiconductor indium gallium arsenide camera. For the detection of the luminescence emission of silicon we analyze the dominant noise sources along with the signal-to-noise ratio of all three cameras at different operation conditions. © 2011 American Institute of Physics.

A one dimensional (1D) transfer matrix calculation of current transport in semiconductor nanowires with built-in barriers is described within the effective mass approximation by taking into account (i) the quantum confinement in the radial direction and (ii) the Fermi level position with respect to the 1D sub-band(s), both of which can be determined analytically. We calculate the current-voltage (I-V) characteristic for an InAs nanowire, which has a radius of 200 Å and two 50 Å InP, built-in barriers, which define a 150 Å long InAs quantum disk and find that a peak in the current occurs at an applied voltage of 72 mV, corresponding to resonant tunneling of carriers through the double barriers. This is in good agreement with the I-V curve measured in a similar nanowire at a temperature of 4.2 K, where resonant tunneling occurs at 80 mV. It is deduced that the Fermi level is ≈26 meV above the conduction band edge at the surface of the specific InAs nanowire, which is ten times lower than the Fermi level pinning at inverted InAs thin film surfaces. We discuss the importance of the strain and surface depletion. © 2008 American Institute of Physics. 104

Carrier spin polarization in In0.13Ga0.87 As under high electric fields has been investigated. The spin polarization was created by optical spin orientation techniques and the inverse spin-Hall effect was employed to measure the spin polarization. For moderate electric fields, the spin polarization was constant, whereas the significant change in the spin polarization was found in the high electric field range. The spin-density rate equation, together with carrier transport analysis, clarifies that the observed change is attributed to the voltage-induced Auger process which modifies the carrier number in InGaAs. © 2011 American Institute of Physics. 98 24 Cited By :4