1. Ultraviolet assisted processing: A unique approach to mitigate oxygen vacancies and attain low loss highly tunable Ba0.60Sr0.40TiO3 thin films.
- Author
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Cole, M. W., Toonen, R. C., Ivill, M., Hirsch, S. G., Ngo, E., and Hubbard, C.
- Subjects
OXYGEN ,ULTRAVIOLET radiation ,THIN films ,ANNEALING of crystals ,ORGANOMETALLIC compounds ,STRAY currents ,THERMAL expansion ,OXIDE electrodes - Abstract
Isothermal (700 °C) ultraviolet annealing (UVA) processing of crystallized Ba0.60Sr0.40TiO3 (BST) thin films for exposure times up to 225 min films has been studied. The BST films, grown on PtSi wafers via the metalorganic solution deposition (MOSD) technique, were crystallized via conventional furnace annealing (CFA) prior to UVA treatment, and the effects of UV annealing time on the structural, dielectric, and insulation properties were evaluated. The experimental results demonstrated significantly improved structural, dielectric, and insulation properties for the UVA films. Specifically, lattice parameter contraction (toward that of bulk BST60/40) and a 20% reduction in loss were observed for the UVA treated films with respect to the CFA/control film. Leakage current characteristics were found to be the most sensitive characterization technique to access material property modification as a result of UVA exposure time. Specifically, the 225 min UVA exposure time resulted in a three-order of magnitude reduction in leakage current density compared to the CFA film, and the lowest value observed was 1.06 × 10-7 A/cm2 at E = 300 kV/cm. The useable tunability (tunability value at the maximum acceptable leakage current, 500 pA) was found to be elevated by a factor of two with respect to that of the CFA/control BST film (52.31%/UVA film vs. 18.5%/control film). It is suggested that the improved material properties are due to the mitigation of unwanted oxygen vacancies within the film after UV-annealing. A mechanistic model is presented and discussed. [ABSTRACT FROM AUTHOR]
- Published
- 2011
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