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Amorphous YCrO3 (YCO) films were prepared on Pt/TiO2/SiO2/Si substrate by pulsed laser deposition in order to investigate resistive switching (RS) phenomenon. The Pt/YCO/Pt device showed stable unipolar RS with resistance ratio of ∼105 between low and high resistance states, excellent endurance and retention characteristics, as well as, non-overlapping switching voltages with narrow dispersions. Based on the x-ray photoelectron spectroscopy and temperature dependent switching characteristics, observed RS was mainly ascribed to the oxygen vacancies. Moreover, current-voltage characteristics of the device in low and high resistance states were described by Ohmic and trap controlled space-charge limited conduction mechanisms, respectively. [ABSTRACT FROM AUTHOR]

Abstract: In a recent report, Lee et al. have proposed an “effective field model” for extrinsic doping to explain the electrical properties of Al‐doped zinc oxide (ZnO) films grown by atomic layer deposition (ALD). They have introduced the doping model by considering the layered structure of the ALD‐grown films as observed in the transmission electron microscopy measurements. However, in the present comment, we have demonstrated that the suggested doping model is misleading in which physically inconsistent assumptions are considered throughout. Herein, a reasonable interpretation of the electrical properties and doping mechanism of the ALD‐grown films by taking into consideration the theoretical formulations of the disordered electronic system is suggested. [ABSTRACT FROM AUTHOR]

High quality (1 0 0) oriented thin films of (Y 0.9 Bi 0.1 )(Fe 0.5 Cr 0.5 )O 3 [YBFCO] were deposited on (1 0 0) LAO substrates with conducting LNO buffer layer as bottom electrode. YBFCO thin film was found to demonstrate interesting room temperature multiferroic properties where the origin of weak ferroelectricity could be mainly attributed to disordered transition metal ions of unlike spins, and magnetic behavior was ascribed to uncompensated weak ferromagnetism arises due to magnetic cluster state in disordered system. Dielectric anomaly near magnetization reversal temperature ( T irr ) revealed magnetodielectric effect in YBFCO film. In addition, leakage current behavior of the film was explained by trap-controlled space-charge-limited current conduction (SCLC) mechanism. [ABSTRACT FROM AUTHOR]

Highlights: [•] High quality thin film of multiferroic BiFeO3 on SrRuO3 is grown by RF Sputtering. [•] The Pt/BFO/SRO structure showed diode like behavior through I–V measurement. [•] Appreciable VOC and JSC were observed with illumination of white light. [•] The photoresponse at zero bias of BFO film showed rapid increase in photocurrent. [•] Application of BFO film for photosensitive capacitor is demonstrated. [ABSTRACT FROM AUTHOR]

Multilevel resistive switching was observed in random access memory device using amorphous SmGdO3 (SGO) ternary oxide thin films. Non-volatile and stable 4-level resistance states with sufficient margin of resistance ratios were observed by varying compliance current which was attributed to compliance current dependent variation in size of conducting filaments. As fabricated Pt/SGO/Pt devices exhibited excellent switching parameters such as stable resistance ratios of reset (ON) to set (OFF) states, non-overlapping switching voltages, excellent data retention, and endurance. Temperature dependent variation of resistances of ON and OFF states of the device was studied to elucidate current conduction and resistive switching mechanisms. [ABSTRACT FROM AUTHOR]

Nanocrystalline ZnO thin films have been deposited on rhenium and tungsten pointed and flat substrates by pulsed laser deposition method. An emission current of 1 nA with an onset voltage of 120 V was observed repeatedly and maximum current density ∼1.3 A/cm2 and 9.3 mA/cm2 has been drawn from ZnO/Re and ZnO/W pointed emitters at an applied voltage of 12.8 and 14 kV, respectively. In case of planar emitters (ZnO deposited on flat substrates), the onset field required to draw 1 nA emission current is observed to be 0.87 and 1.2 V/μm for ZnO/Re and ZnO/W planar emitters, respectively. The Fowler–Nordheim plots of both the emitters show nonlinear behaviour, typical for a semiconducting field emitter. The field enhancement factor β is estimated to be ∼2.15×105 cm−1 and 2.16×105 cm−1 for pointed and 3.2×104 and 1.74×104 for planar ZnO/Re and ZnO/W emitters, respectively. The high value of β factor suggests that the emission is from the nanometric features of the emitter surface. The emission current–time plots exhibit good stability of emission current over a period of more than three hours. The post field emission surface morphology studies show no significant deterioration of the emitter surface indicating that the ZnO thin film has a very strong adherence to both the substrates and exhibits a remarkable structural stability against high-field-induced mechanical stresses and ion bombardment. The results reveal that PLD offers unprecedented advantages in fabricating the ZnO field emitters for practical applications in field-emission-based electron sources. [ABSTRACT FROM AUTHOR]

With the rapid development of new device miniaturization technology, there is invigorated interest in magnetic nanostructures for potential application in novel multifunctional devices. In continuation to our search for a suitable magnetic material having Curie temperature (Tc) well above room temperature for multifunctional applications, we have studied the dielectric, optical, magnetic, and resistance switching characteristics of Ni0.65Zn0.35Fe2O4 (NZFO) thin films. The observation of only (004) reflection in the X-ray diffraction patterns confirms the c-axis orientation and high quality growth of NZFO thin films. The presence of mixed valences of Fe2+/Fe3+ cations is probed by X-ray photon spectroscopy, which supports the cationic ordering-mediated large dielectric response. Our investigations reveal NZFO to be an indirect band gap material (~1.8eV) with a direct gap at ~2.55eV. These nanostructures exhibit high saturation magnetization and a low coercive field with a ferrimagnetic-paramagnetic phase transition of ~713K. Magnetic force microscopy studies revealed the stripe-like domain structure of the investigated thin films. In addition, these thin films exhibit reliable and repeatable unipolar resistive switching characteristics. The observed high dielectric permittivity with low loss tangent, large magnetization with soft magnetic behavior, striped magnetic domain structure and reliable resistance switching in NZFO thin films above room temperature suggest potential application in memory, spintronics, and multifunctional devices. [ABSTRACT FROM AUTHOR]

Multilevel cell (MLC) capability of a memory device is an attractive alternative to realise high integration density of memory arrays. In addition, power efficient memory cell along with MLC capability has huge potential in neuromorphic computing and data storage applications. In this study low power, high speed and 3-bit multilevel bipolar resistance switching operation is reported in TiO2 thin films where copper is used as counter electrode. On account of using an oxidisable electrode, low programming voltages (∼+0.2 V, −0.1 V) along with low reset current (∼10 µA) are observed, thereby ensuing low power (∼µW) memory operation. Additionally, observation of fast switching (∼250 ns) translated to ultra-low energy (∼pJ) consumption. By varying compliance current (IC) from 25 µA to 1.6 mA during the set process, eight distinct non-volatile resistance states are reliably obtained, which showed statistically significant and non-overlapping resistance distribution. The multilevel resistive switching in Cu/TiO2/Pt device is explained by considering filamentary the widening phenomenon in the electrochemical metallization memory cell. Numerical calculations revealed that increase in the diameter of the metallic conducting filament from ∼3 nm to 70 nm with increasing IC is accountable for multiple low resistance states. The results of this study are promising towards realisation of emerging memory devices with low operating power, fast switching operation and high spatial density. [ABSTRACT FROM AUTHOR]

Herein, it is shown that the UV photoresponse characteristics of MgZnO thin films deposited by pulsed laser deposition change rapidly with time if the films are exposed to ambient air and that the response can be stabilized significantly by depositing a thin capping layer of MgO on the surface of MgZnO thin film. The decay time of photocurrent in as‐deposited MgZnO thin films increases from 1.8 to 229 s and the value of peak responsivity increases by about three orders of magnitude as the film is exposed to air for about 106 s. On application of MgO capping layer, the decay time of the photocurrent marginally increases from ≈0.2 to ≈0.4 s and the value of peak responsivity increases only by one order of magnitude over the span of 106 s, thereafter showing tendency of saturation, implying much better stability in performance. The MgO capping layer is transparent to UV, but acts as a diffusion barrier for oxygen, stabilizing the UV photoresponse. [ABSTRACT FROM AUTHOR]

The paper deals with the comparative study of nanocrystalline Lanthanum hexaboride (LaB) thin films grown on various substrates by Pulsed laser deposition and Arc plasma method. Field emission studies were carried out on LaB films deposited on various substrates show metallic behavior of the emitters. The high value of field enhancement factors, indicating that the electron emission from LaB nanoscale protrusions deposited on emitter surface. The post field emission surface morphology of the emitters showed no significant erosion of the films during continuous operation. The observed behavior indicates that it is linked with the growth of LaB films on substrate crystal structure. The LaB nanocrystallites/nanowires films were synthesized using arc plasma method shows good emission current stability. The LaB micro/nanocrystallites were also obtained by picosecond laser irradiation which gives high enhancement β factor, and good emission current stability along with high current density. The results reveal that nanocrystalline LaB films, exhibit high resistance to ion bombardment and excellent structural stability and are more promising emitters for practical applications in field emission based new generation devices. [ABSTRACT FROM AUTHOR]

Abstract: Lanthanum hexaboride (LaB6) films have been deposited on a zirconium foil by pulsed laser deposition method. The field emission studies of the LaB6 deposited film have been performed in the planar diode configuration under ultra high vacuum conditions. The Fowler–Nordheim plots were found to be linear in accordance with the quantum mechanical tunneling phenomenon. A typical field emission current of 7.02μA was drawn at an applied electric field of 2V/μm. The field enhancement factor is calculated to be 8913cm−1, indicating that the field emission is from nanoscale protrusions present on the emitter surface. The atomic force microscope (AFM) investigation of the surface clearly shows the conical shaped nanoprotrusions of few hundred nanometers with asperities of 20–40nm on its top. The emission current–time plot recorded at the pre-set value of emission current of 5μA over a period of more than 3h exhibits an initial increase and subsequent stabilization of the current. The results reveal that the LaB6/Zr field emitter obtained by the pulsed laser deposition (PLD) is a promising cathode material for practical applications in field emission-based devices. [Copyright &y& Elsevier]

Abstract: A novel highly transparent intrinsic zinc oxide (ZnO) thin films (without adding any dopants and annealing) were grown by pulsed laser deposition (PLD) technique using Johnson Matthey “specpure”- grade ZnO pellets. The effects of substrate temperatures on zinc oxide thin film growth, optical transmission, absorption, reflection and photoluminescence properties were studied. As well as the feasibility of developing high quality transparent oxide thin films was also studied simultaneously. The optical transmission window of such obtained films, i.e., T% (max)⩾95% is broader than those of other transparent conducting oxides such as indium tin oxide (ITO) and absolute rivals that of the most transparent conducting oxides (TCOs). Also as a novelty merit, we want to emphasize as a interesting, significant and novel physical effect that the average optical transmittance of ZnO thin films rivals that of the most transmittive TCO films reported to date for this conductivity level (of the order of 103 Ω−1 cm−1). Also this is the first time that we have applied these PLD prepared ZnO thin films to iso and hetero semiconductor–insulator–semiconductor (SIS) type solar cells as transparent conducting oxide (TCO) coatings. From optical studies, we know that the films were act as highly anti-reflective coatings. From photoluminescence study, we confirmed the purity and high electrical conductivity of the deposited thin films of ZnO. The optical parameter values for the films were calculated, tabulated and graphically emphasized. Supplementary studies on surface, electrical, structural and internal morphological properties of zinc oxide thin film growth correlated with optical transmission, absorption, reflection and photoluminescence properties gives added advantages to this work. We hope that surely these data should be helpful either as a scientific or technical basis in the semiconductor processing and technology. [Copyright &y& Elsevier]

High quality epitaxial indium zinc oxide (heavily indium oxide doped) (epi-n-IZO) thin films were optimized by laser-molecular beam epitaxy (L-MBE) i.e., pulsed laser deposition (PLD) technique for fabricating novel iso- and hetero-semiconductor–insulator–semiconductor (SIS) type solar cells using Johnson Matthey “specpure”- grade 90% In2O3 mixed 10% ZnO (as commercial indium tin oxide (ITO) composition) pellets. The effects of substrate temperatures, substrates and heavy indium oxide incorporation on IZO thin film growth, opto-electronic properties with 〈1 0 0〉 silicon (Si), gallium arsenide (GaAs) and indium phosphide (InP) wafers were studied. As well as the feasibility of developing some novel models of iso- and hetero-SIS type solar cells using epi-IZO thin films as transparent conducting oxides (TCOs) and 〈1 0 0〉 oriented Si, GaAs and InP wafers as base substrates was also studied simultaneously. The optimized films were highly oriented, uniform, single crystalline approachment, nano-crystalline, anti-reflective (AR) and epitaxially lattice matched with 〈1 0 0〉 Si, GaAs and InP wafers without any buffer layers. The optical transmission T (max) ⩾ 95% is broader and absolute rivals that of other TCOs such as ITO. The highest conductivity observed is σ=0.47×103 Ω-1 cm-1 (n-type), carrier density n=0.168×1020 cm-3 and mobility μ=123 cm2/V s. From opto-electronic characterizations, the solar cell characteristics and feasibilities of fabricating respective epi-n-TCO/〈1 0 0〉 wafer SIS type solar cells were confirmed. Also, the essential parameters of these cells were calculated and tabulated. We hope that these data be helpful either as a scientific or technical basis in semiconductor processing. [Copyright &y& Elsevier]