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1. Optical immersion further shrinks feature sizes.

Author

Jones-Bey, Hassaun A.

Subjects
*REFRACTOMETRY, *LITHOGRAPHY, *RESEARCH institutes, *PHOTOLITHOGRAPHY, *CONFERENCES & conventions
Abstract

The article focuses on the description obtained using NEMO resulted from the Microlithography conference of scientists from the IBM Almaden Research Center in San Jose, California. NEMO is an interferometric tool for deep ultraviolet optical immersion lithography. The researchers created distinct and uniformly spaced patterns with ridges and spaces.

Published
2006

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