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59. Enhancement of devices performance of hybrid FDSOI/bulk technology by using UTBOX sSOI substrates

60. 28nm FDSOI technology platform for high-speed low-voltage digital applications

61. Impact of 45° rotated substrate on UTBOX FDSOI high-k metal gate technology

62. Impact of substrate orientation on Ultra Thin BOX Fully Depleted SOI electrical performances

63. Impact of local back biasing on performance in hybrid FDSOI/bulk high-k/metal gate low power (LP) technology

64. Low frequency noise variability in high-k/metal gate stack 28nm bulk and FD-SOI CMOS transistors

67. Low power UTBOX and back plane (BP) FDSOI technology for 32nm node and below

69. Impact of a 10nm ultra-thin BOX (UTBOX) and ground plane on FDSOI devices for 32nm node and below

70. Efficient multi-VT FDSOI technology with UTBOX for low power circuit design

71. First CMOS integration of ultra thin body and BOX (UTB2) structures on bulk direct silicon bonded (DSB) wafer with multi-surface orientations

72. Hybrid FDSOI/bulk High-k/metal gate platform for low power (LP) multimedia technology

73. Impact of a 10nm Ultra-Thin BOX (UTBOX) and Ground Plane on FDSOI devices for 32nm node and below

74. FDSOI devices with thin BOX and ground plane integration for 32nm node and below

76. Planar Bulk+ technology using TiN/Hf-based gate stack for low power applications

77. FDSOI devices with thin BOX and ground plane integration for 32nm node and below

86. Low-Frequency Noise Investigation and Noise Variability Analysis in High- k/Metal Gate 32-nm CMOS Transistors.

87. <atl>Reliability of ultra-thin film deep submicron SIMOX nMOSFETs

89. Is SOI CMOS a promising technology for SOCs in high frequency range?

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