251. Water-developable resists based on glyceryl methacrylate for 193-nm lithography
- Author
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Kwan-Ku Lee, Jong-Sung Ko, Jin-Baek Kim, Ji-Hyun Jang, and Jae-Hak Choi
- Subjects
chemistry.chemical_classification ,Materials science ,Glyceryl methacrylate ,Methacrolein ,Polymer ,chemistry.chemical_compound ,chemistry ,Chemical engineering ,Resist ,Polymer chemistry ,Copolymer ,sense organs ,Contact print ,Lithography - Abstract
Novel water-developable negative resists were designed to induce both cross-linking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced cross-linking, polarity change, and increase in dry-etch resistance. The resist formulated with this polymer and cast in a water-ethanol mixture, showed 0.7 μm line and space patterns using a mercury-xenone lamp in a contact printing mode and pure water as a developer.
- Published
- 2004
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