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13 results on '"王利栓 Wang Lishuan"'

1. Design and preparation technology of laser protective film window of satellite

Author

季一勤 Ji Yiqin, 王利栓 Wang Lishuan, 姜玉刚 Jiang Yugang, 李士达 Li Shi-da, 刘华松 Liu Huasong, and 陈 丹 Chen Dan

Subjects
Optics, Materials science, business.industry, law, Window (computing), Satellite, business, Laser, Atomic and Molecular Physics, and Optics, law.invention
Published
2019

4. Effects of annealing on properties of Ta2O5thin films deposited by ion beam sputtering

Author

陈德应 Chen De-ying, 刘丹丹 Liu Dandan, 季一勤 Ji Yiqin, 刘华松 Liu Huasong, 王利栓 Wang Lishuan, and 姜承慧 Jiang Chenghui

Subjects
Ion beam sputtering, Materials science, Annealing (metallurgy), business.industry, Analytical chemistry, Optoelectronics, business, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials
Published
2014

5. Study on the design and preparing technology of ion beam sputtering wideband absorption thin film

Author

姜玉刚 Jiang Yugang, 姜承慧 Jiang Chenghui, 王利栓 Wang Lishuan, 刘小利 Liu Xiaoli, 季一勤 Ji Yiqin, 刘丹丹 Liu Dandan, 刘华松 Liu Huasong, and 陈 丹 Chen Dan

Subjects
Materials science, Ion beam sputtering, Space and Planetary Science, business.industry, Aerospace Engineering, Optoelectronics, Electrical and Electronic Engineering, Wideband, Thin film, business, Absorption (electromagnetic radiation), Atomic and Molecular Physics, and Optics
Published
2019

6. Calculation of Pseudo-brewster Angle for Substrate and Thin Film-substrate System

Author

季一勤 Ji Yiqin, 姜承慧 Jiang Chenghui, 刘华松 Liu Huasong, 王利栓 Wang Lishuan, and 姜玉刚 Jiang Yugang

Subjects
symbols.namesake, Brewster's angle, Materials science, business.industry, symbols, Optoelectronics, Substrate (printing), Thin film, business, Atomic and Molecular Physics, and Optics
Published
2013

7. Adjustments of refractive index and stress of SiO2 films prepared by IBS technology

Author

姜玉刚 Jiang Yugang, 刘华松 Liu Huasong, 季一勤 Ji Yiqin, and 王利栓 Wang Lishuan

Subjects
Stress (mechanics), Materials science, Analytical chemistry, Composite material, Refractive index, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials
Abstract

基于正交试验方法,系统研究了用离子束溅射法制备SiO2薄膜其折射率、应力与工艺参数(基板温度、离子束压、离子束流和氧气流量)之间的关联性.使用分光光度计和椭圆偏振仪测量SiO2薄膜透过率光谱和反射椭偏特性,利用全光谱反演计算法获得薄膜的折射率,通过测量基底镀膜前后的表面变形量得到SiO2薄膜的应力.实验结果表明,工艺参数对薄膜折射率影响权重从大到小依次为氧气流量、基板温度、离子束流和离子束压,前三者对折射率影响的可信概率分别为87.03％、71.98％和69.53％;对SiO2薄膜应力影响权重从大到小依次为基板温度、离子束压、氧气流量和离子束流,前三者对应力影响的可信概率分别为95.62％、48.49％和37.88％.得到的结果表明,制备低折射率SiO2薄膜应选择高氧气流量、低基板温度和低离子束流;制备低应力SiO2薄膜应选择低基板温度和高氧气流量.

Published
2013

8. Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering

Author

姜承慧 Jiang Chenghui, 王利栓 Wang Lishuan, 陈德应 Chen Deying, 刘丹丹 Liu Dandan, 季一勤 Ji Yiqin, 樊荣伟 Fan Rongwei, 张锋 Zhang Feng, 刘华松 Liu Huasong, and 杨霄 Yang Xiao

Subjects
Ion beam sputtering, Materials science, business.industry, Annealing (metallurgy), Aerospace Engineering, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, Atomic and Molecular Physics, and Optics, 0104 chemical sciences, Space and Planetary Science, Optoelectronics, Tantalum oxide, Electrical and Electronic Engineering, Thin film, 0210 nano-technology, business
Published
2018

9. Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique

Author

姜玉刚 Jiang Yugang, 刘华松 Liu Huasong, 姜承慧 Jiang Chenghui, 张 锋 Zhang Feng, 杨 霄 Yang Xiao, 王利栓 Wang Lishuan, 陈德应 Chen Deying, 刘丹丹 Liu Dandan, and 季一勤 Ji Yiqin

Subjects
Ion beam sputtering, Materials science, business.industry, Optoelectronics, Thin film, business, Electronic band structure, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Hafnium oxide
Published
2017

10. Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering

Author

张 锋 Zhang Feng, 姜玉刚 Jiang Yugang, 李士达 Li Shi-da, 王利栓 Wang Lishuan, 刘华松 Liu Huasong, 刘丹丹 Liu Dandan, 陈德应 Chen Deying, 姜承慧 Jiang Chenghui, 季一勤 Ji Yiqin, and 杨 霄 Yang Xiao

Subjects
Ion beam deposition, Ion beam sputtering, Materials science, business.industry, Optoelectronics, Thin film, business, Constant (mathematics), Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Characterization (materials science)
Published
2017

11. Physical model of optical constants of SiO2 thin films

Author

刘丹丹 Liu Dandan, 张 锋 Zhang Feng, 姜玉刚 Jiang Yugang, 刘华松 Liu Huasong, 陈德应 Chen Deying, 杨 霄 Yang Xiao, 王利栓 Wang Lishuan, 姜承慧 Jiang Chenghui, and 季一勤 Ji Yiqin

Subjects
Materials science, Space and Planetary Science, Analytical chemistry, Aerospace Engineering, Electrical and Electronic Engineering, Thin film, Atomic and Molecular Physics, and Optics
Abstract

SiO2薄膜是光学薄膜领域内常用的重要低折射率材料之一。在文中研究中，通过测量薄膜的椭偏参数，使用非线性最小二乘法反演计算获得薄膜的光学常数。采用离子束溅射和电子束蒸发两种方法制备了SiO2薄膜，在拟合过程中，基于L8（22）正交表设计了8组反演计算实验，以评价函数MSE为考核指标。实验结果表明：对IBS SiO2薄膜拟合MSE函数影响最大的为界面层模型，对EB SiO2薄膜拟合MSE函数影响最大的为Pore模型。同时确定了不同物理模型对拟合MSE函数的影响大小和反演计算过程模型选择的次序，按照确定的模型选择次序拟合，两种薄膜反演计算的MSE函数相对初始MSE可下降35%和38%，表明拟合过程模型选择合理物理意义明确。文中提供了一种判断薄膜物理模型中各因素对于薄膜光学常数分析作用大小的途径，对于薄膜光学常数分析具有指导意义。

Published
2017

12. Dispersive Properties of Optical Constants of Some Metallic Oxide Thin Films in the Mid-Infrared Regions

Author

冷健 Leng Jian, 姜玉刚 Jiang Yugang, 程鑫彬 Cheng Xinbin, 王利栓 Wang Lishuan, 刘丹丹 Liu Dandan, 张锋 Zhang Feng, 陈德应 Chen De-ying, 刘华松 Liu Huasong, 鲍刚华 Bao Ganghua, 焦宏飞 Jiao Hongfei, and 季一勤 Ji Yiqin

Subjects
Materials science, business.industry, Oxide, Mid infrared, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Metal, chemistry.chemical_compound, chemistry, visual_art, visual_art.visual_art_medium, Optoelectronics, Thin film, business
Published
2014

13. Numerical Analysis of Cone Angle Effect of Optical Thin Films Characteristics

Author

季一勤 Ji Yiqin, 姜玉刚 Jiang Yugang, 刘丹丹 Liu Dandan, 孙鹏 Sun Peng, 王利栓 Wang Lishuan, 刘华松 Liu Huasong, and 姜承慧 Jiang Chenghui

Subjects
Optics, Materials science, business.industry, Numerical analysis, Ligand cone angle, Thin film, business, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials
Published
2014

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