19 results on '"BEAM EPITAXY"'
Search Results
2. Fabrication of precision high quality facets on molecular beam epitaxy material
- Author
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Dijaili, Sol [Moraga, CA]
- Published
- 2001
3. Photodetectors using III-V nitrides
- Author
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Misra, Mira [Arlington, MA]
- Published
- 1997
4. P-type gallium nitride
- Author
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Chan, James [Berkeley, CA]
- Published
- 1997
5. Process for depositing epitaxial alkaline earth oxide onto a substrate and structures prepared with the process
- Author
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Walker, Frederick [Oak Ridge, TN]
- Published
- 1996
6. Method of deposition by molecular beam epitaxy
- Author
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Lear, Kevin [Albuquerque, NM]
- Published
- 1995
7. Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process
- Author
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Walker, Frederick [Oak Ridge, TN]
- Published
- 1993
8. Reflection mass spectrometry technique for monitoring and controlling composition during molecular beam epitaxy
- Author
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Tsao, Jeffrey [Albuquerque, NM]
- Published
- 1992
9. Millimeter-scale layered MoSe 2 grown on sapphire and evidence for negative magnetoresistance
- Author
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Olivier Renault, Edith Bellet-Amalric, H. Boukari, F. Rortais, M.-T. Dau, M. Jamet, Carlos Alvarez, Alain Marty, C. Beigné, Pascal Pochet, V. Guigoz, C. Vergnaud, Hanako Okuno, SPINtronique et TEchnologie des Composants (SPINTEC), Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Direction de Recherche Fondamentale (CEA) (DRF (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Fondamentale (CEA) (DRF (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Nanophysique et Semiconducteurs (NPSC), Institut Néel (NEEL), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), PHotonique, ELectronique et Ingénierie QuantiqueS (PHELIQS), Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Laboratory of Atomistic Simulation (LSIM ), Modélisation et Exploration des Matériaux (MEM), Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Laboratoire d'Etude des Matériaux par Microscopie Avancée (LEMMA ), and Nanophysique et Semiconducteurs (NEEL - NPSC)
- Subjects
Materials science ,Physics and Astronomy (miscellaneous) ,Magnetoresistance ,negative magnetoresistance ,FOS: Physical sciences ,02 engineering and technology ,Substrate (electronics) ,01 natural sciences ,Variable-range hopping ,transition metal dichalcogenides MoSe2 ,variable range hopping ,Electrical resistivity and conductivity ,molecular beam epitaxy ,0103 physical sciences ,molecular ,[PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] ,010306 general physics ,Condensed Matter - Materials Science ,Condensed matter physics ,Materials Science (cond-mat.mtrl-sci) ,021001 nanoscience & nanotechnology ,2D materials ,Magnetic field ,Sapphire ,beam epitaxy ,negative magnetoresistance 2 ,Crystallite ,0210 nano-technology ,transition metal dichalcogenide MoSe 2 ,Molecular beam epitaxy - Abstract
Molecular beam epitaxy technique has been used to deposit a single layer and a bilayer of MoSe 2 on sapphire. Extensive characterizations including in-situ and ex-situ measurements show that the layered MoSe 2 grows in a scalable manner on the substrate and reveals characteristics of a stoichiometric 2H-phase. The layered MoSe 2 exhibits polycrystalline features with domains separated by defects and boundaries. Temperature and magnetic field dependent resistivity measurements unveil a carrier hopping character described within two-dimensional variable range hopping mechanism. Moreover, a negative magnetoresistance was observed, stressing a fascinating feature of the charge transport under the application of a magnetic field in the layered MoSe 2 system. This negative magnetoresistance observed at millimeter-scale is similar to that observed recently at room temperature inWS2 flakes at a micrometer scale [Zhang et al., Appl. Phys. Lett. 108, 153114 (2016)]. This scalability highlights the fact that the underlying physical mechanism is intrinsic to these two-dimensional materials and occurs at very short scale., 15 pages, 6 figures
- Published
- 2017
- Full Text
- View/download PDF
10. In surface segregation in InGaN/GaN quantum wells
- Author
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Amélie Dussaigne, Benjamin Damilano, Nicolas Grandjean, and Jean Massies
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indium gallium nitride ,POLARIZATION ,Photoluminescence ,Reflection high-energy electron diffraction ,Condensed matter physics ,Chemistry ,Oscillator strength ,business.industry ,Electron ,Condensed Matter Physics ,Indium gallium nitride ,segregation ,Inorganic Chemistry ,chemistry.chemical_compound ,Optics ,Electron diffraction ,MOLECULAR-BEAM EPITAXY ,Materials Chemistry ,beam epitaxy ,molecular ,reflection high energy electron diffractions ,business ,Quantum well ,Molecular beam epitaxy - Abstract
We investigate both theoretically and experimentally the effects of the In surface segregation in InGaN/GaN quantum wells (QWs). It is shown that this phenomenon induces a blue-shift of the QW photoluminescence (PL) energy, which does not depend on the QW width, at least for well thicknesses larger than 1.5 nm. The oscillator strength of the QW optical transitions decreases when the segregation process increases due to the spatial separation of the electron and hole pairs by the internal electric field. The surface segregation phenomenon has been studied by reflection high-energy electron diffraction in the case of molecular beam epitaxy growth with NH3 as the nitrogen source. Evidence for surface segregation is given by comparing PL results and data deduced from a careful analysis of the growth rate variation of GaN deposited on an In covered surface. (C) 2003 Elsevier Science B.V. All rights reserved.
- Published
- 2003
- Full Text
- View/download PDF
11. Control of the polarity of GaN films using an Mg adsorption layer
- Author
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S. Pezzagna, P. Vennéguès, Amélie Dussaigne, and Nicolas Grandjean
- Subjects
Reflection high-energy electron diffraction ,Chemistry ,Analytical chemistry ,Nonlinear optics ,Gallium nitride ,Condensed Matter Physics ,interfaces ,Inorganic Chemistry ,Crystallography ,chemistry.chemical_compound ,Electron diffraction ,MOLECULAR-BEAM EPITAXY ,Transmission electron microscopy ,Monolayer ,Materials Chemistry ,beam epitaxy ,molecular ,reflection high energy electron diffractions ,Thin film ,gallium nitride ,Molecular beam epitaxy - Abstract
The polarity of GaN epilayers grown by molecular beam epitaxy is controlled using Mg. This is achieved by simultaneously exposing the surface to Mg and NH3 fluxes during growth interruption. Reflection high-energy electron diffraction (RHEED) indicates the formation of a Mg3N2, layer. Overgrowing GaN on this surface leads to a polarity inversion either from Ga to N or N to Ga. The change of the polarity is followed in situ by RHEED via surface reconstructions of the GaN surface. The polarity inversion is further confirmed by convergent beam electron diffraction experiments. Finally, high-resolution transmission electron microscopy images show different interface morphologies between Ga/N and N/Ga polarity boundaries. The control of the GaN polarity opens the way for novel periodic polarity structures dedicated to non-linear optics. (C) 2002 Elsevier Science B.V. All rights reserved.
- Published
- 2003
- Full Text
- View/download PDF
12. Growth of InAs/InAsSb heterostructured nanowires
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Mauro Gemmi, Lucia Nasi, Fabio Beltram, Giancarlo Salviati, Marialilia Pea, Daniele Ercolani, Francesca Rossi, Lucia Sorba, Ang Li, Ercolani, Daniele, Gemmi, M, Nasi, L, Rossi, F, Pea, M, Li, A, Salviati, G, Beltram, Fabio, and Sorba, L.
- Subjects
Materials science ,business.industry ,Mechanical Engineering ,BEAM EPITAXY ,Alloy ,Nanowire ,Nucleation ,chemistry.chemical_element ,Bioengineering ,Heterojunction ,General Chemistry ,engineering.material ,Chemical beam epitaxy ,LAYERS ,SEMICONDUCTOR ALLOYS ,Antimony ,chemistry ,Mechanics of Materials ,Antimonide ,engineering ,Optoelectronics ,General Materials Science ,Electrical and Electronic Engineering ,High-resolution transmission electron microscopy ,business - Abstract
We report the growth of InAs/InAs1-xSbx single and double heterostructured nanowires by Au-assisted chemical beam epitaxy. The InAs1-xSbx nanowire segments have been characterized in a wide range of antimony compositions. Significant lateral growth is observed at intermediate compositions (x similar to 0.5), and the nucleation and step-flow mechanism leading to this lateral growth has been identified and described. Additionally, CuPt ordering of the alloy has been observed with high resolution transmission electron microscopy, and it is correlated to the lateral growth process. We also show that it is possible to regrow InAs above the InAsSb alloy segment, at least up to an intermediate antimony composition. Such double heterostructures might find applications both as mid-infrared detectors and as building blocks of electronic devices taking advantage of the outstanding electronic and thermal properties of antimonide compound semiconductors.
- Published
- 2012
- Full Text
- View/download PDF
13. Formation and destabilization of Ga interstitials in GaAsN : Experiment and theory
- Author
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Laukkanen, P., Punkkinen, Marko Patrick John, Puustinen, J., Levämäki, H., Tuominen, M., Schulte, K., Dahl, J., Lang, J., Zhang, Hualei, Kuzmin, M., Palotas, K., Johansson, Börje, Vitos, Levente, Guina, M., Kokko, K., Laukkanen, P., Punkkinen, Marko Patrick John, Puustinen, J., Levämäki, H., Tuominen, M., Schulte, K., Dahl, J., Lang, J., Zhang, Hualei, Kuzmin, M., Palotas, K., Johansson, Börje, Vitos, Levente, Guina, M., and Kokko, K.
- Abstract
Using first-principles total energy calculations we have found complex defects induced by N incorporation in GaAsN. The formation energy of the Ga interstitial atom is very significantly decreased due to local effects within the defect complex. The stability of the Ga interstitials is further increased at surfaces. The present results suggest that the energetically favorable Ga interstitial atoms are much more abundant in GaAsN than the previously considered N defects, which have relatively large formation energies. Our synchrotron radiation core-level photoemission measurements support the computational results. The formation of harmful Ga interstitials should be reduced by incorporating large group IV B atoms in GaAsN., QC 20121210
- Published
- 2012
- Full Text
- View/download PDF
14. Sputter deposition of gallium nitride films using a GaAs target
- Author
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S C Sabharwal, S.S. Major, Nahlah Elkashef, K.P. Muthe, and R.S. Srinivasa
- Subjects
Materials science ,Thin-Films ,Beam Epitaxy ,Inorganic chemistry ,Analytical chemistry ,chemistry.chemical_element ,Deposition Process ,Gallium nitride ,Substrate (electronics) ,Growth ,Nitride ,Nitrides ,chemistry.chemical_compound ,Sputtering ,Materials Chemistry ,Thin film ,Argon ,Iii-V Nitride ,Metals and Alloys ,Optical-Properties ,Surfaces and Interfaces ,Sputter deposition ,Nitrogen ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Gan ,Blue ,chemistry ,Semiconductors ,Phase ,Wurtzite - Abstract
GaAs was used as the target material for the deposition of GaN films by reactive sputtering. The films were grown at different compositions of the sputtering gas mixture (0-100% nitrogen in argon) at substrate temperatures of 450 and 550 degrees C. The films were studied using XRD and XPS techniques. Even a small quantity of nitrogen in the sputtering medium was found to prevent the formation of GaAs on the substrate. Films grown at 550 degrees C using 100% nitrogen as the sputtering-reactive gas were found to be single phase (0002) oriented hexagonal gallium nitride and revealed complete absence of arsenic. (C) 1998 Elsevier Science S.A. .
- Published
- 1998
15. Substrate solder barriers for semiconductor epilayer growth
- Author
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Zipperian, Thomas [Albuquerque, NM]
- Published
- 1989
16. Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
- Author
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Dabirian, Ali, Kuzminykh, Yury, Wagner, Estelle, Benvenuti, Giacomo, Rushworth, Simon A., and Hoffmann, Patrik
- Subjects
Titanium ,Optimization ,nanotechnology ,Beam Epitaxy ,Precursors ,chemisorption ,chemical vapor deposition ,Chemistry ,thin films ,Compositional Spreads ,adsorption ,Parameters ,Carbon Nanotubes ,Adsorption ,Films - Abstract
Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
17. Rotated domains in selective area epitaxy grown Zn3P2: formation mechanism and functionality
- Author
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Nelson Y. Dzade, Jean-Baptiste Leran, Maria Chiara Spadaro, Sara Martí-Sánchez, Simon Escobar Steinvall, Jordi Arbiol, Mahdi Zamani, Rajrupa Paul, Pol Torres-Vila, Anna Fontcuberta i Morral, Elias Z. Stutz, Generalitat de Catalunya, Ministerio de Economía y Competitividad (España), European Commission, Universidad de Zaragoza, and Max Planck Society
- Subjects
Fabrication ,Nanostructure ,Materials science ,Nanowire ,strain relaxation ,02 engineering and technology ,software tool ,stem-cell ,Epitaxy ,01 natural sciences ,7. Clean energy ,Atomic units ,Crystal ,Selective area epitaxy ,0103 physical sciences ,initio molecular-dynamics ,gaas ,General Materials Science ,nanowire solar-cells ,010302 applied physics ,enhanced absorption ,business.industry ,021001 nanoscience & nanotechnology ,simulation ,Optoelectronics ,Direct and indirect band gaps ,beam epitaxy ,0210 nano-technology ,business ,transitions - Abstract
Zinc phosphide (Zn3P2) is an ideal absorber candidate for solar cells thanks to its direct bandgap, earth-abundance, and optoelectronic characteristics, albeit it has been insufficiently investigated due to limitations in the fabrication of high-quality material. It is possible to overcome these factors by obtaining the material as nanostructures, e.g. via the selective area epitaxy approach, enabling additional strain relaxation mechanisms and minimizing the interface area. We demonstrate that Zn3P2 nanowires grow mostly defect-free when growth is oriented along the [100] and [110] of the crystal, which is obtained in nanoscale openings along the [110] and [010] on InP(100). We detect the presence of two stable rotated crystal domains that coexist in the structure. They are due to a change in the growth facet, which originates either from the island formation and merging in the initial stages of growth or lateral overgrowth. These domains have been visualized through 3D atomic models and confirmed with image simulations of the atomic scale electron micrographs. Density functional theory simulations describe the rotated domains' formation mechanism and demonstrate their lattice-matched epitaxial relation. In addition, the energies of the shallow states predicted closely agree with transition energies observed by experimental studies and offer a potential origin for these defect transitions. Our study represents an important step forward in the understanding of Zn3P2 and thus for the realisation of solar cells to respond to the present call for sustainable photovoltaic technology., We acknowledge Martin Friedl, Didem Dede, Nicholas Morgan, and Wonjong Kim for helpful discussions regarding selective area growth and the substrate patterning procedures. M. C. S., S. M. S., P. T. V. and J. A. acknowledge funding from Generalitat de Catalunya 2017 SGR 327. ICN2 is supported by the Severo Ochoa programme from Spanish MINECO (Grant No. SEV-2017-0706) and is funded by the CERCA Programme/Generalitat de Catalunya. M. C. Spadaro has received funding from the European Union's Horizon 2020 research and innovation programme under the Marie Skłodowska-Curie grant agreement No. 754510 (PROBIST) and the Severo Ochoa programme. This project has received funding from the European Union's Horizon 2020 research and innovation programme under grant agreement No 823717 – ESTEEM3. Authors acknowledge the use of instrumentation provided by the National Facility ELECMI ICTS, node “Laboratorio de Microscopías Avanzadas” at University of Zaragoza. S. E. S., E. Z. S., M. Z., R. P., J. B. L. and A. F. i M. were supported by SNSF Consolidator grant BSCGI0-157705 and the Max-Planck-EPFL-Center for Molecular Nanoscience and Technology. N. Y. D. acknowledges the UK Engineering and Physical Sciences Research Council (EPSRC) for funding (Grant No. EP/S001395/1). The DFT calculations were performed using the computational facilities of the Advanced Research Computing @ Cardiff(ARCCA) Division, Cardiff University.
18. InGaN heterostructures grown by molecular beam epitaxy: from growth mechanism to optical properties
- Author
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Damilano, B., Grandjean, N., Vezian, S., and Massies, J.
- Subjects
optical properties ,nitrides ,growth model ,PIEZOELECTRIC FIELDS ,QUANTUM-WELLS ,low dimensional structures ,beam epitaxy ,molecular - Abstract
GaN and InGaN layers are grown by molecular beam epitaxy using ammonia as nitrogen precursor. The lattice mismatch between InN and GaN is very large and a Stranski-Krastanov (SK) growth mode transition can occur above a critical In composition. However, changing the growth conditions, namely increasing the NH3 flux, allows one to promote the 2D growth. This phenomenon can be ascribed to a surfactant effect of hydrogen atoms (or NHx radicals) present at the growth surface. The optical properties of InGaN/GaN quantum dots, made by SK growth mode, and InGaN/GaN quantum wells are compared. (C) 2001 Elsevier Science B.V. All rights reserved.
19. Confinement effects on the phonon spectrum of thin InAs/InP strained single quantum wells
- Author
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Luciano Colombo, Jean-François Carlin, Gino Mariotto, A. Rudra, and Lorenzo Pavesi
- Subjects
DISORDER ,RAMAN-SCATTERING ,Materials science ,Photoluminescence ,Phonon ,Physics::Optics ,Surface finish ,Barrier layer ,Condensed Matter::Materials Science ,symbols.namesake ,GAAS/ALAS SUPERLATTICES ,Materials Chemistry ,Electrical and Electronic Engineering ,Spectroscopy ,Quantum well ,SPECTROSCOPY ,Condensed matter physics ,Condensed Matter::Other ,BEAM EPITAXY ,Condensed Matter::Mesoscopic Systems and Quantum Hall Effect ,Condensed Matter Physics ,Electronic, Optical and Magnetic Materials ,symbols ,GROWTH ,VAPOR-PHASE EPITAXY ,INTERFACE PHONONS ,Raman spectroscopy ,Raman scattering - Abstract
By means of Raman and photoluminescence measurements we have studied the effect of strain and confinement on the optical phonon spectrum of single InAs quantum wells. The frequency region of longitudinal optical phonons confined in both the InAs well and InP barrier layer has been studied. Simple modelling of the effects of the strain and the confinement on the InAs phonon is able to explain the dependence of the phonon frequencies on the layer thickness. Experimental evidence of vibrations localized at the InAs/InP interface is also reported and discussed. Finally, confinement of InP phonons in the layer between the InAs slab and the sample surface is observed and related to the structural features of the InAs well as deduced from photoluminescence measurements.
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