40 results on '"Banerjee, Ratnabali"'
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2. Study of hydrogenated amorphous silicon nitride films prepared by RF magnetron sputtering
3. Short-range order, microstructure and their correlation with light-induced degradation in hydrogenated amorphous silicon deposited at high growth rates by cathode heating technique
4. Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films
5. Correlation of the structural properties with the device characteristics of hydrogenated amorphous silicon deposited at different substrate temperatures
6. Hydrogenated amorphous silicon films prepared at high substrate temperature: Properties and light induced degradation
7. Hydrogenated Amorphous Silicon, Its Alloys and Their Device Applications
8. Formation of microcrystallinity in hydrogenated silicon films deposited with a simple modification of the magnetron sputtering method
9. Control of the crystallite size and passivation of defects in porous silicon by a novel method
10. Degradation of tin-doped indium-oxide film in hydrogen and argon plasma.
11. Properties of tin doped indium oxide thin films prepared by magnetron sputtering.
12. Structural characterization of tin doped indium oxide films prepared by magnetron sputtering
13. Thickness dependence of the properties of magnetron sputtered indium tin oxide films
14. Device quality hydrogenated amorphous silicon films deposited at high growth rates
15. A simple modification of the magnetron sputtering method for the deposition of boron-doped hydrogenated microcrystalline silicon films with enhanced doping efficiency
16. Influence of Chamber Pressure on Optoelectronic and Structural Properties of Boron-Doped Hydrogenated Silicon Films Prepared by RF Magnetron Sputtering
17. Deposition of boron doped a-Si:H films by a novel combination of rf glow discharge technique and filament heating: Enhancement of doping efficiency
18. Efficient Boron Incorporation in Hydrogenated Amorphous Silicon Films by a Novel Combination of RF Glow Discharge Technique and Heated Filament
19. Role of boron in the structural and electronic properties of hydrogenated silicon films deposited by r.f. magnetron sputtering
20. Hydrogenated amorphous silicon films deposited at high growth rates by the cathode heating technique: properties and light induced degradation
21. Electronic and Structural Characterisation of Boron-Doped Hydrogenated Silicon Thin and Ultrathin Films Prepared by RF Magnetron Sputtering
22. Effect of parasitic resistances on electrical characteristics of an amorphous silicon TFT
23. Study of hydrogenated amorphous silicon nitride films prepared by RF magnetron sputtering
24. Laser-induced structural changes in magnetron-sputtered hydrogenated microcrystalline silicon films
25. Properties of hydrogenated amorphous SiN films prepared by r.f. magnetron sputtering with emphasis on the non-stoichiometric region
26. Thermally and light-induced instabilities in phosphorus-doped hydrogenated amorphous silicon.
27. Light-induced changes of gap-state profile in phosphorus-doped hydrogenated amorphous silicon.
28. Properties of tin oxide films prepared by reactive electron beam evaporation
29. A Simple Modification of the Magnetron Sputtering Method for Deposition of Hydrogenated Amorphous Silicon Films with Improved Optoelectronic Properties
30. Properties of Tellurium Doped Vacuum Evaporated CdS Thin Films
31. Light-induced changes in magnetron-sputtered hydrogenated amorphous silicon films
32. Characterization of tin doped indium oxide films prepared by electron beam evaporation
33. Properties of Vacuum-Evaporated CdS Thin Films
34. Effect of Light Soaking Temperature on the Metastable Defect Distribution in Magnetron Sputtered Hydrogenated Amorphous Silicon Films
35. Some properties of indium- and antimony-doped vacuum-evaporated CdS thin films
36. The properties of bismuth-doped vacuum-evaporated CdS films
37. Properties of electron-beam-evaporated tin oxide films
38. Thermoelectric power in boron-doped hydrogenated amorphous-silicon and silicon-carbide thin films
39. Effect of Deposition Temperature on the Properties of Magnetron Sputtered Hydrogenated Amorphous Silicon Films
40. Influence of different deposition parameters on the properties of hydrogenated amorphous silicon films prepared by magnetron sputtering
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