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1. Integrating high-k dielectrics: etched polysilicon or metal gates?

Author

Schram, Tom, Beckx, Stephan, De Gendt, Stefan, Vertommen, Johan, and Lee, Steve

Subjects
*DIELECTRICS, *SILICON, *ELECTRODES, *ELECTRIC capacity
Abstract

Assesses the compatibility of dielectric layers with conventional polysilicon gate electrodes. Use of standard processing equipment; Power capacity; Level of performance.

Published
2003

2. Low Loss Nanophotonic Waveguides and Ring Resonators in Silicon-on-Insulator.

Author

Baets, Roel, Bogaerts, Wim, Taillaert, Dirk, Dumon, Pieter, Bienstman, Peter, Van Thourhout, Dries, Van Campenhout, Joris, Wiaux, Vincent, Wouters, Johan, and Beckx, Stephan

Subjects
*WAVEGUIDES, *NANOPHOTONIC integrated circuits, *PHOTONS, *RESONATORS, *PHYSICS, *PHYSICAL sciences
Abstract

High index contrast, wavelength-scale structures are the key to ultra-compact integration of photonic integrated circuits. We discuss the general properties of these nanophotonic components and the rationale for using them. We studied the fabrication of these structures in the Silicon-on-insulator material system using CMOS processing methods and find this technology to be suitable for commercial implementation of nanophotonic IC’s. We review photonic wires as one of the paths towards achieving denser integration and discuss the measurement results of waveguides and ring resonators. To tackle the coupling to fiber and the polarization dependency problem, we studied and fabricated vertical fiber couplers. © 2004 American Institute of Physics [ABSTRACT FROM AUTHOR]

Published
2004
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