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Your search keyword '"Beloto, A.F."' showing total 38 results
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38 results on '"Beloto, A.F."'

5. Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation

Author

Ueda, M., Berni, L.A., Gomes, G.F., Beloto, A.F., Abramof, E., and Reuther, H.

Subjects
Electric discharges through gases -- Research, Ion implantation -- Methods, Plasma etching -- Methods, Physics
Abstract

The use of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation processing has been studied. The characteristics of the discharge source include medium densities, low temperatures, stable continuous DC operation and can be built inexpensively. A tridimensional implantation was realized when the plasma potential is held below 70 V. The plasma density of the discharge source has also been found to be linearly dependent on the potential.

Published
1999

22. X-ray investigation of nanostructured stain-etched porous silicon

Author

Abramof, P.G., Beloto, A.F., Ueta, A.Y., and Ferreira, N.G.

Subjects
Silicon -- Properties, Nanotechnology -- Research, Porosity -- Analysis, Physics
Abstract

An investigation was conducted on the structure of porous silicon layers by diverse x-ray methods. A series of samples with etching times was produced by chemical etch using an Hf/HNO3-based solution assisted with NaNO2.

Published
2006

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